US5311047A
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Amorphous SI/SIC heterojunction color-sensitive phototransistor
Assignee: National Science and Technology Council
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Filing: 1988-11-16
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Granted: 1994-05-10
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Expires: 2008-11-16
Abstract
Abstract An amorphous Si/SiC heterojunction color-sensitive phototransistor was successfully fabricated by plasma-enhanced chemical vapor deposition. The structure is glass/ITO/a-Si(n + -i-p + )/a-SiC(i-n + )/Al. The device is a bulk barrier transistor with a wide-bandgap amorphous SiC emitter. The phototransistor revealed a very high optical gain of 40 and a response speed of 10 us at an input light power of 5 uW and a collector current of 0.12 mA at a voltage of 14 V. The peak response occurs at 610 nm under 1 V bias and changes to 420 and 540 nm under 7- and 13-V biases, respectively.
Inventors
- 👤 Chun-Yen Chang
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 04:09
CPC Classifications
H; H10; H10F; H10F30/00; H10F30/20; H10F30/21; H10F30/24; H10F30/245
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
70 words
An amorphous Si/SiC heterojunction color-sensitive majority carrier bulk barrier phototransistor, comprising in order the following layers: a glass substrate; a collector electrode formed by an ITO coating on the glass substrate; an amorphous silicon n + collector layer; an undoped amorphous silicon collector layer; a p + amorphous silicon base layer; an amorphous undoped silicon carbide emitter layer; an amorphous n + silicon carbide emitter layer; and an emitter electrode.
Claim 2
Dependent Claim
70 words
An amorphous Si/SiC heterojunction color-sensitive majority carrier bulk barrier phototransistor, comprising in order the following layers: a glass substrate; a collector electrode formed by an ITO coating on the glass substrate; an amorphous silicon n + collector layer; an undoped amorphous silicon collector layer; a p + amorphous silicon base layer; an amorphous undoped silicon carbide emitter layer; an amorphous n + silicon carbide emitter layer; and an emitter electrode.
Claim 3
Dependent Claim
78 words
A color-sensitive phototransistor as recited in claim 1, wherein the undoped emitter layer has a thickness of between 100 and 500 Å, the undoped collector layer has a thickness of between 2000 and 7000 Å and the n + silicon carbide emitter and n + collector layers have thickness of 120 Å and 100 Å, respectively, and wherein there are no free carriers at any bias in the undoped emitter and collector layers and in the base layer.
Claim 4
Dependent Claim
90 words
A color-sensitive phototransistor as recited in claim 1, wherein the collector electrode is positively biased with respect to the emitter electrode such that, when light is introduced through the glass substrate, an optical gain is 40 at 5 microwatts of incident optical power, a 0.121 milliamp collector current, and a 14 volt collector-emitter bias voltage, and wherein a maximum said optical gain occurs at a wavelength of 610 nm at a bias of 1 V, and at a wavelength of 420 nm when the bias is change to 7 V.
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USPTO Annuity & Maintenance Windows
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| 3.5 Years (Year 4) | 1997-05-09 | 1997-11-08 | 1998-05-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-05-09 | 2001-11-08 | 2002-05-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-05-09 | 2005-11-08 | 2006-05-10 | $7700.00 | Window Closed / Lapsed |