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Back-to-back diodes

Assignee: RCA Corp
•
Filing: 1984-11-14
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Granted: 1986-07-15
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Expires: 2004-11-14
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Abstract

Abstract A back-to-back diode includes a substrate having five superimposed layers of hydrogenated amorphous silicon thereon. The first and fifth layers are of one conductivity type, the second and fourth layers are intrinsic, and the third layer is of the opposite conductivity type. The layers are all of the substantially the same thickness. A conductive layer contact is provided between the substrate and the first layer and a conductive layer contact is provided on the fifth layer. The intrinsic layers may include carbon alloyed with the hydrogenated amorphous silicon.

Inventors

  • 👤 Joseph Dresner

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 03:56
CPC Classifications
H; H10; H10D; H10D8/00; H10D8/50; H10D62/00; H10D62/40; H10D62/402; H10D62/80; H10D62/83

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 88 words
A semiconductor back-to-back diode comprising a substrate, a first layer of hydrogenated amorphous silicon of one conductivity type on said substrate, a second layer of intrinsic hydrogenated amorphous silicon on said first layer, a third layer of hydrogenated amorphous silicon of the opposite conductivity type on said second layer, a fourth layer of intrinsic hydrogenated amorphous silicon on said third layer, and a fifth layer of hydrogenated amorphous silicon of the one conductivity type on said fourth layer, each of said layers being of substantially the same thickness.
Claim 2
Dependent Claim 88 words
A semiconductor back-to-back diode comprising a substrate, a first layer of hydrogenated amorphous silicon of one conductivity type on said substrate, a second layer of intrinsic hydrogenated amorphous silicon on said first layer, a third layer of hydrogenated amorphous silicon of the opposite conductivity type on said second layer, a fourth layer of intrinsic hydrogenated amorphous silicon on said third layer, and a fifth layer of hydrogenated amorphous silicon of the one conductivity type on said fourth layer, each of said layers being of substantially the same thickness.
Claim 3
Dependent Claim 28 words
A back-to-back diode in accordance with claim 1 wherein the first and fifth layers are of P type conductivity and the third layer is of N type conductivity
Claim 4
Dependent Claim 28 words
A back-to-back diode in accordance with claim 1 wherein the first and fifth layers are of N type conductivity and the third layer is of P type conductivity.
Claim 5
Dependent Claim 33 words
A back-to-back diode in accordance with claim 1 wherein the thickness of each of the intrinsic layers is determined by V=2.64+0.0106L where V is the voltage and L is the thickness in angstroms.
Claim 6
Dependent Claim 20 words
A back-to-back diode in accordance with claim 1 wherein the intrinsic layers include carbon alloyed with the hydrogenated amorphous silicon.
Claim 7
Dependent Claim 20 words
A back-to-back diode in accordance with claim 5 wherein the carbon content is no greater than about 11 atomic percent.
Claim 8
Dependent Claim 33 words
A back-to-back diode in accordance with claim 6 wherein the thickness of each of the intrinsic layers is determined by V=2.52+0.016L where V is the voltage and L is the thickness in angstroms.
Claim 9
Dependent Claim 27 words
A back-to-back diode in accordance with claim 1 including a conductive layer between the substrate and the first layer and a conductive layer on the fifth layer.

References Cited (Backward Citations)

US4064521A Cited
US4109271A Cited
US4385200A Cited
US4410902A Cited
US4531142A Cited
US4409424A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1989-07-14 1990-01-13 1990-07-15 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1993-07-14 1994-01-13 1994-07-15 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1997-07-14 1998-01-13 1998-07-15 $7700.00 Window Closed / Lapsed

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