Patent US5298459A successfully refreshed from Google Patents.
US5298459A
Expired / Lapsed
US
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Method of manufacturing semiconductor device terminal having a gold bump electrode
Assignee: Seiko Epson Corp
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Filing: 1991-03-05
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Granted: 1994-03-29
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Expires: 2011-03-05
Abstract
Abstract A semiconductor device provided with an external connection terminal composed of a metal bump electrode. A first metal film is formed on the entire surface of the semiconductor device, a second metal film on the first metal film, and a third metal film on the second metal film. A resist film is selectively formed on the third metal film. A metal bump electrode is formed on the third metal film, at a portion at which the resist film is not present by electrolytic plating while using the third metal film as a conductive plating electrode and the resist film as a mask. The resist film is removed and the metal films are etched while using the metal bump electrode as a mask.
Inventors
- 👤 Shinichiro Arikawa
- 👤 Hiroaki Murakami
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 04:05
CPC Classifications
H; H10; H10W; H10W72/00; H10W72/20; H10W72/01; H10W72/012; H10W72/01251; H10W72/01255; H10W72/019; H10W72/01951; H10W72/01953; H10W72/221; H10W72/251; H10W72/252; H10W72/29; H10W72/90; H10W72/921; H10W72/923; H10W72/951; H10W72/952; Y; Y10; Y10S; Y10S148/00; Y10S148/131
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
164 words
A method of manufacturing an external connection terminal composed of a metal bump electrode on a semiconductor device, said method comprising the steps of: forming a first film of Ti metal on the entire surface of said semiconductor device; forming a second file of Pt metal on said first metal film; forming a third film of Au metal on said second metal film; selectively forming, on said third metal film, a resist film having an opening via which a portion of said third metal film is exposed; forming a bump electrode of Au metal on said exposed portion of said third metal film by electrolytic plating while using said third metal film as a conductive plating electrode and said resist film as a mask; removing said resist film; and etching said third metal film by wet etching and said second metal film by ion beam etching and said first metal film by ion beam etching while using said metal bump electrode as a mask.
Claim 2
Independent Claim
164 words
A method of manufacturing an external connection terminal composed of a metal bump electrode on a semiconductor device, said method comprising the steps of: forming a first film of Ti metal on the entire surface of said semiconductor device; forming a second file of Pt metal on said first metal film; forming a third film of Au metal on said second metal film; selectively forming, on said third metal film, a resist film having an opening via which a portion of said third metal film is exposed; forming a bump electrode of Au metal on said exposed portion of said third metal film by electrolytic plating while using said third metal film as a conductive plating electrode and said resist film as a mask; removing said resist film; and etching said third metal film by wet etching and said second metal film by ion beam etching and said first metal film by ion beam etching while using said metal bump electrode as a mask.
Claim 3
Independent Claim
160 words
A method of manufacturing an external connection terminal composed of a metal bump electrode on a semiconductor device, said method comprising the steps of: forming a first film of Ti metal on the entire surface of said semiconductor device; forming a second film of Pt metal on said first metal film; forming a third film of Au metal on said second metal film; selectively forming, on said third metal film, a resist film having an opening via which a portion of said third metal film is exposed; forming a bump electrode of Au metal on said exposed portion of said third metal film by electrolytic plating while using said third metal film as a conductive plating electrode and said resist film as a mask; removing said resist film; and etching said third metal film and said second metal film by ion beam etching and said first metal film by wet etching while using said metal bump electrode as a mask.
Claim 4
Independent Claim
160 words
A method of manufacturing an external connection terminal composed of a metal bump electrode on a semiconductor device, said method comprising the steps of: forming a first film of Ti metal on the entire surface of said semiconductor device; forming a second film of Pt metal on said first metal film; forming a third film of Au metal on said second metal film; selectively forming, on said third metal film, a resist film having an opening via which a portion of said third metal film is exposed; forming a bump electrode of Au metal on said exposed portion of said third metal film by electrolytic plating while using said third metal film as a conductive plating electrode and said resist film as a mask; removing said resist film; and etching said third metal film and said second metal film by ion beam etching and said first metal film by wet etching while using said metal bump electrode as a mask.
Claim 5
Independent Claim
162 words
A method of manufacturing an external connection terminal composed of a metal bump electrode on a semiconductor device, said method comprising the steps of: forming a first film of Ti metal on the entire surface of said semiconductor device; forming a second film of Pt metal on said first metal film; forming a third film of Au metal on said second metal film; selectively forming, on said third metal film; a resist film having an opening via which a portion of said third metal film is exposed; forming a bump electrode of Au metal on said exposed portion of said third metal film by electrolytic plating while using said third metal film as a conductive plating electrode and said resist film as a mask; removing said resist film; and etching said third metal film by wet etching, said second metal film by ion beam etching and said first metal film by wet etching while using said metal bump electrode as a mask.
Claim 6
Independent Claim
162 words
A method of manufacturing an external connection terminal composed of a metal bump electrode on a semiconductor device, said method comprising the steps of: forming a first film of Ti metal on the entire surface of said semiconductor device; forming a second film of Pt metal on said first metal film; forming a third film of Au metal on said second metal film; selectively forming, on said third metal film; a resist film having an opening via which a portion of said third metal film is exposed; forming a bump electrode of Au metal on said exposed portion of said third metal film by electrolytic plating while using said third metal film as a conductive plating electrode and said resist film as a mask; removing said resist film; and etching said third metal film by wet etching, said second metal film by ion beam etching and said first metal film by wet etching while using said metal bump electrode as a mask.
References Cited (Backward Citations)
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