US5296122A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for forming thin film
Assignee: Terumo Corp
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Filing: 1992-02-18
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Granted: 1994-03-22
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Expires: 2012-02-18
Abstract
Abstract In the manufacture of a substrate with a hydrophobic film used for a reference electrode of an ion sensor or the like, a hydrophobic film is formed on a substrate by irradiating a target consisting of a hydrophobic compound with a neutral atom beam and thereby effecting sputtering. The apparatus for effecting the sputtering comprises a target base disposed in a vacuum chamber, an atom beam gun for irradiating a target on the target base with a neutral beam, a substrate base and a shutter for controlling the passage of sputtered particles. A thin film that is manufactured is suitable for an ion sensor, such as an ISFET or the like or an enzyme sensor.
Inventors
- 👤 Teruaki Katsube
- 👤 Shuichiro Yamaguchi
- 👤 Naoto Uchida
- 👤 Takeshi Shimomura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 02:18
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/46; C23C14/06; C23C14/12; G; G01; G01N; G01N27/00; G01N27/26; G01N27/403; G01N27/414; G01N27/4145
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
142 words
An apparatus constructed and arranged for manufacturing a thin film by depositing sputtered particles on a predetermined surface of a substrate comprising: a vacuum chamber; a first front chamber formed adjacent to said vacuum chamber; a first on-off means for on-off operating the passage between said front chamber and vacuum chamber; a target base disposed in said vacuum chamber and for holding a target having at least a hydrophobic organic substance; a first moving mechanism for moving said target base between said vacuum chamber and first front chamber; a neutral beam generation means for irradiating said target supported by said target base with a neutral beam including ions with more than 95% thereof neutralized; a substrate base for supporting said substrate; and shutter means disposed between said substrate base and target base for controlling the passage and blocking of said sputtered particles.
Claim 2
Independent Claim
142 words
An apparatus constructed and arranged for manufacturing a thin film by depositing sputtered particles on a predetermined surface of a substrate comprising: a vacuum chamber; a first front chamber formed adjacent to said vacuum chamber; a first on-off means for on-off operating the passage between said front chamber and vacuum chamber; a target base disposed in said vacuum chamber and for holding a target having at least a hydrophobic organic substance; a first moving mechanism for moving said target base between said vacuum chamber and first front chamber; a neutral beam generation means for irradiating said target supported by said target base with a neutral beam including ions with more than 95% thereof neutralized; a substrate base for supporting said substrate; and shutter means disposed between said substrate base and target base for controlling the passage and blocking of said sputtered particles.
Claim 3
Dependent Claim
41 words
The apparatus according to claim 1, which comprises a plurality of sputtering means each including said neutral beam generation means, target base and shutter means such that sputtered particles generated by each said sputtering means are collected on said substrate base.
Claim 4
Dependent Claim
44 words
The apparatus according to claim 1, which comprises a plurality of neutral beam generating means, said target being irradiated as common target by neutral beams shot from said individual neutral beam generation means to provide for improvement of the uniformity of film thickness distribution.
Claim 5
Dependent Claim
38 words
The apparatus according to claim 1, which further comprises a substrate base drive mechanism for rotating, linearly moving, angularly moving, and/or scanning said substrate base, thereby providing for uniform film thickness in a predetermined surface of said substrate.
Claim 6
Dependent Claim
18 words
The apparatus according to claim 4, wherein said substrate base is provided with a substrate temperature control means.
Claim 7
Dependent Claim
38 words
The apparatus according to claim 1, which further comprises a target base drive mechanism for rotating, linearly moving, angularly moving, and/or scanning said target base, thereby providing for uniform film thickness in a predetermined surface of said substrate.
Claim 8
Dependent Claim
52 words
The apparatus according to claim 1, which further comprises a second front chamber formed adjacent to said vacuum chamber, second on-off means for on-off operating the passage between said second front chamber and vacuum chamber, and second moving mechanism for moving said substrate base between said vacuum chamber and second front chamber.
Claim 9
Dependent Claim
25 words
The apparatus according to claim 1, which further comprises on-off means for on-off controlling the communication between said neutral beam generation means and vacuum chamber.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-03-21 | 1997-09-20 | 1998-03-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-03-21 | 2001-09-20 | 2002-03-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-03-21 | 2005-09-20 | 2006-03-22 | $7700.00 | Window Closed / Lapsed |