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US4877504A Expired / Lapsed US ⏱️ 0.0 years remaining

Methods for fabricating electro-optically active niobium dioxide (NbO2)

Assignee: Honeywell Inc
•
Filing: 1987-08-19
•
Granted: 1989-10-31
•
Expires: 2007-08-19
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Abstract

Abstract A reactive ion-beam sputtering technique for fabricating NbO 2 crystalline thin films suitable for use in these electro-optic devices.

Inventors

  • 👤 James C. Lee

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 17:36
CPC Classifications
G; G02; G02F; G02F1/00; G02F1/01; G02F1/17; C; C23; C23C; C23C14/00; C23C14/0021; C23C14/0036; C23C14/06; C23C14/08; C23C14/083; C23C14/22; C23C14/34; C23C14/46

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 151 words
A method of forming an electro-optically switchable niobium dioxide (NbO 2 ) crystalline thin film on a solid substrate by reactive ion-beam sputtering in a hermetic chamber, comprising: placing a niobium (Nb) target in said chamber; grounding said target; placing said substrate in said chamber; providing an oxidizing background atmosphere in said chamber; evacuating said chamber to a pressure sufficient for said sputtering process; heating said substrate to a temperature sufficient to allow said crystalline thin film to form on said substrate; generating an ion-beam from a source; directing said ion-beam onto said target so that Nb atoms are sputtered from said target; controlling the spread of said ion-beam as said beam travels from said source to said target; and positioning said substrate so that the majority of said Nb atoms sputtered from said target strike said substrate, thereby forming said electro-optically switchable thin film of NbO 2 on said substrate.
Claim 2
Independent Claim 151 words
A method of forming an electro-optically switchable niobium dioxide (NbO 2 ) crystalline thin film on a solid substrate by reactive ion-beam sputtering in a hermetic chamber, comprising: placing a niobium (Nb) target in said chamber; grounding said target; placing said substrate in said chamber; providing an oxidizing background atmosphere in said chamber; evacuating said chamber to a pressure sufficient for said sputtering process; heating said substrate to a temperature sufficient to allow said crystalline thin film to form on said substrate; generating an ion-beam from a source; directing said ion-beam onto said target so that Nb atoms are sputtered from said target; controlling the spread of said ion-beam as said beam travels from said source to said target; and positioning said substrate so that the majority of said Nb atoms sputtered from said target strike said substrate, thereby forming said electro-optically switchable thin film of NbO 2 on said substrate.
Claim 3
Dependent Claim 19 words
The method of claim 1 wherein said pressure sufficient for said sputtering process is less than 10 -3 T.
Claim 4
Dependent Claim 14 words
The method of claim 1 wherein said substrate is heated to approximately 600° C.
Claim 5
Dependent Claim 19 words
The method of claim 1 wherein said controlling the spread of said ion-beam includes injecting electrons into said ion-beam.
Claim 6
Dependent Claim 13 words
The method of claim 1 wherein said ion-beam is comprised of argon ions.
Claim 7
Dependent Claim 16 words
The method of claim 1 wherein said oxidizing atmosphere is comprised of O 2 and argon.
Claim 8
Dependent Claim 22 words
The method of claim 1 wherein the current density of said ion beam at said target is approximately 1 mA/cm 2 .
Claim 9
Dependent Claim 22 words
The method of claim 1 further including depositing an NbO 2 layer on said substrate at a rate of approximately 1 Å/sec.
Claim 10
Dependent Claim 16 words
The method of claim 1 wherein said ion-beam has an energy of approximately 1200 electron volts.
Claim 11
Dependent Claim 15 words
The method of claim 1 wherein the target to substrate distance is approximately 15 cm.

References Cited (Backward Citations)

US3962062A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-10-30 1993-05-01 1993-10-31 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-10-30 1997-05-01 1997-10-31 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-10-30 2001-05-01 2001-10-31 $7700.00 Window Closed / Lapsed

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