Patent US6833161B2 successfully refreshed from Google Patents.
US5288329A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Chemical vapor deposition apparatus of in-line type
Assignee: Ulvac Inc
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Filing: 1990-11-20
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Granted: 1994-02-22
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Expires: 2010-11-20
Abstract
Abstract An in-line type chemical vapor deposition apparatus having an etching device for cleaning at least substrate holders, which is provided downstream of the substrate unloading station in which the processed substrates are removed from the substrate holders at atmosphere pressure. The etching device comprises a plasma etching means in which the substrate holders are positioned on an anode side or a dry-etching means in which the substrate holders are positioned on a cathode side, thereby reducing the down time of the apparatus without any influence of an exfoliation of an adhered film from the substrate holders or other portions.
Inventors
- 👤 Kyuzo Nakamura
- 👤 Michio Ishikawa
- 👤 Kazuyuki Ito
- 👤 Noriaki Tani
- 👤 Masanori Hashimoto
- 👤 Yoshifumi Ota
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:55
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/54; C23C16/02; C23C16/0227; C23C16/0245
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
156 words
An in-line type CVD apparatus comprising a substrate loading chamber in which a substrate to be treated is mounted on a substrate holder under an atmosphere pressure, a preparatory chamber being evacuated in which the substrate is pre-treated, a processing chamber in which a desired film is formed on the substrate, a substrate withdrawing chamber, a substrate unloading chamber in which the processed substrate is dismounted from the substrate holder, an etching chamber provided subsequent to the substrate unloading chamber for etching at least the substrate holder without the processed substrate in a vacuum condition, said etching chamber being provided with an RF cathode member which is movable together with said substrate holder, the substrate unloading chamber being connected to the substrate loading chamber via the etching chamber, a plurality of gate valves each of which is provided between the adjacent chamber, and means for transporting at least the substrate holder sequentially through the respective chambers.
Claim 2
Dependent Claim
156 words
An in-line type CVD apparatus comprising a substrate loading chamber in which a substrate to be treated is mounted on a substrate holder under an atmosphere pressure, a preparatory chamber being evacuated in which the substrate is pre-treated, a processing chamber in which a desired film is formed on the substrate, a substrate withdrawing chamber, a substrate unloading chamber in which the processed substrate is dismounted from the substrate holder, an etching chamber provided subsequent to the substrate unloading chamber for etching at least the substrate holder without the processed substrate in a vacuum condition, said etching chamber being provided with an RF cathode member which is movable together with said substrate holder, the substrate unloading chamber being connected to the substrate loading chamber via the etching chamber, a plurality of gate valves each of which is provided between the adjacent chamber, and means for transporting at least the substrate holder sequentially through the respective chambers.
Claim 3
Dependent Claim
23 words
An apparatus according to claim 1, wherein said transporting means comprises a plurality of upper and lower roller trains provided in each chamber.
Claim 4
Dependent Claim
24 words
An apparatus according to claim 1, wherein said each upper and lower roller train supports vertically the substrate holder and the RF cathode member.
Claim 5
Dependent Claim
196 words
An in-line type CVD apparatus comprising: a substrate loading chamber in which a substrate to be treated is mounted on a substrate holder under atmospheric pressure; a preparatory chamber connected to said substrate loading chamber and being evacuated in which the substrate is pre-treated; a processing chamber being connected to said preparatory chamber in which a desired film is formed on the substrate; a substrate withdrawing chamber connected to said processing chamber; a substrate unloading chamber connected to said substrate withdrawing chamber in which the processed substrate is dismounted from the substrate holder; an etching chamber provided subsequent to the substrate unloading chamber for etching at least the substrate holder without the processed substrate under vacuum, said etching chamber being provided with an RF cathode member; means for carrying the etching substrate holder from said etching chamber to said substrate loading chamber; a plurality of gate valves each of which is provided between the adjacent chambers; the respective chambers being in-line arranged for forming a closed loop system; and means for transporting at least the substrate holder sequentially through the respective chambers, and including a plurality of upper and lower roller trains provided in each chamber.
Claim 6
Dependent Claim
196 words
An in-line type CVD apparatus comprising: a substrate loading chamber in which a substrate to be treated is mounted on a substrate holder under atmospheric pressure; a preparatory chamber connected to said substrate loading chamber and being evacuated in which the substrate is pre-treated; a processing chamber being connected to said preparatory chamber in which a desired film is formed on the substrate; a substrate withdrawing chamber connected to said processing chamber; a substrate unloading chamber connected to said substrate withdrawing chamber in which the processed substrate is dismounted from the substrate holder; an etching chamber provided subsequent to the substrate unloading chamber for etching at least the substrate holder without the processed substrate under vacuum, said etching chamber being provided with an RF cathode member; means for carrying the etching substrate holder from said etching chamber to said substrate loading chamber; a plurality of gate valves each of which is provided between the adjacent chambers; the respective chambers being in-line arranged for forming a closed loop system; and means for transporting at least the substrate holder sequentially through the respective chambers, and including a plurality of upper and lower roller trains provided in each chamber.
Claim 7
Dependent Claim
23 words
An apparatus according to claim 1, wherein said upper and lower roller train supports vertically the substrate holder and the RF cathode member.
Claim 8
Dependent Claim
28 words
An apparatus according to claim 4, wherein said etching chamber is arranged to perform plasma etching in which the substrate holder to be etched behaves as an anode.
Claim 9
Dependent Claim
25 words
An apparatus according to claim 4, wherein said etching chamber is arranged to perform a dry-etching of the RF cathode member and the substrate holder.
Claim 10
Dependent Claim
23 words
An apparatus according to claim 4, wherein said etching chamber is provided with means for applying RF voltage to said RF cathode member.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-02-21 | 1997-08-23 | 1998-02-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-02-21 | 2001-08-23 | 2002-02-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-02-21 | 2005-08-23 | 2006-02-22 | $7700.00 | Window Closed / Lapsed |