US5282946A
Expired / Lapsed
US
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Platinum-cobalt alloy sputtering target and method for manufacturing same
Assignee: Mitsubishi Materials Corp
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Filing: 1992-06-25
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Granted: 1994-02-01
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Expires: 2012-06-25
Abstract
Abstract A sputtering target of platinum-cobalt alloy is disclosed which contains 10 to 55% by weight of platinum; 1 to 15% by weight of a first additional element selected from the group consisting of nickel and tantalum; no more than 1.5% by weight of a second additional element selected from the group consisting of boron, titanium, lanthanum, cerium, neodymium, beryllium, calcium, zirconium, and silicon; no more than 20% by weight of chromium; and balance cobalt. A method for manufacturing the sputtering target is also disclosed. In the method, a platinum-cobalt alloy containing specific ingredients in predetermined amounts is first prepared. Then, the platinum-cobalt alloy is subjected to hot plastic working with a thickness reduction of no less than 30%. Subsequently, the alloy thus hot worked is subjected to a cold plastic working with a thickness reduction of no less than 5% at a temperature less than the recrystallization temperature of the alloy.
Inventors
- 👤 Makoto Kinoshita
- 👤 Jun Tamura
- 👤 Masaki Morikawa
- 👤 Kunio Kishida
- 👤 Toshinori Ishii
- 👤 Akifumi Mishima
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 01:03
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C22; C22C; C22C19/00; C22C19/07; C22C5/00; C22C5/04; C23C14/3407; C23C14/3414
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
88 words
A sputtering target of platinum-cobalt alloy consisting essentially of 10 to 55% by weight of platinum; 1 to 15% by weight of a first additional element selected from the group consisting of nickel and tantalum; no more than 1.5% by weight of a second additional element selected from the group consisting of boron, titanium, lanthanum, cerium, neodymium, beryllium, calcium, zirconium, and silicon; no more than 20% by weight of chromium; and the balance cobalt, wherein said alloy has an average grain size of no greater than 20 μm.
Claim 2
Dependent Claim
88 words
A sputtering target of platinum-cobalt alloy consisting essentially of 10 to 55% by weight of platinum; 1 to 15% by weight of a first additional element selected from the group consisting of nickel and tantalum; no more than 1.5% by weight of a second additional element selected from the group consisting of boron, titanium, lanthanum, cerium, neodymium, beryllium, calcium, zirconium, and silicon; no more than 20% by weight of chromium; and the balance cobalt, wherein said alloy has an average grain size of no greater than 20 μm.
Claim 3
Dependent Claim
17 words
A sputtering target as recited in claim 1, having a magnetic permeability of no larger than 30.
Claim 4
Dependent Claim
36 words
A sputtering target as recited in claim 1, wherein the chromium constituent has a segregation of no greater than ±0.25% by weight, and the platinum constituent has a segregation of no greater than ±0.20% by weight.
Claim 5
Dependent Claim
40 words
A sputtering target as recited in claim 1, wherein said target comprises a plurality of sputtering target members, adjacent pairs of said sputtering target members being combined together with their respective end faces being mated and joined together by fusion.
Claim 6
Dependent Claim
50 words
A sputtering target as recited in claim 4, wherein said adjacent pairs of sputtering target members are configured so as to define a V-shaped groove therebetween, said sputtering target further comprising an additional fused target member of the same composition as said sputtering target members received in said V-shaped groove.
Claim 7
Dependent Claim
14 words
A target as claimed in claim 1, wherein said first additional element is tantalum.
Claim 8
Independent Claim
133 words
A method of manufacturing a sputtering target, comprising the steps of: (a) preparing a platinum-cobalt alloy consisting of 10 to 55% by weight of platinum, 1 to 15% by weight of a first additive selected from the group consisting of nickel and tantalum, no more than 1.5% by weight of a second additive selected from the group consisting of boron, titanium, lanthanum, cerium, neodymium, beryllium, calcium, zirconium, and silicon, no more than 20% by weight of chromium, and balance cobalt; (b) subsequently subjecting the platinum-cobalt alloy to a hot plastic working with a thickness reduction of no less than 30%; and (c) subsequently subjecting the hot worked alloy to a cold plastic working with a thickness reduction of no less than 5% at a temperature less than the recrystallization temperature of the alloy.
Claim 9
Independent Claim
133 words
A method of manufacturing a sputtering target, comprising the steps of: (a) preparing a platinum-cobalt alloy consisting of 10 to 55% by weight of platinum, 1 to 15% by weight of a first additive selected from the group consisting of nickel and tantalum, no more than 1.5% by weight of a second additive selected from the group consisting of boron, titanium, lanthanum, cerium, neodymium, beryllium, calcium, zirconium, and silicon, no more than 20% by weight of chromium, and balance cobalt; (b) subsequently subjecting the platinum-cobalt alloy to a hot plastic working with a thickness reduction of no less than 30%; and (c) subsequently subjecting the hot worked alloy to a cold plastic working with a thickness reduction of no less than 5% at a temperature less than the recrystallization temperature of the alloy.
Claim 10
Dependent Claim
26 words
A method of manufacturing a sputtering target as recited in claim 7, wherein said alloy preparation step (a) is carried out by a vacuum casting method.
Claim 11
Dependent Claim
43 words
A method of manufacturing a sputtering target as recited in claim 8, further comprising a containment step of inserting said alloy prepared in said alloy preparation step (a) into a container and evacuating said container, prior to said hot plastic working step (b).
Claim 12
Dependent Claim
35 words
A method of manufacturing a sputtering target as recited in claim 9, further comprising a step of annealing said container and cooling the same between said inserting step and said hot plastic working step (b).
Claim 13
Dependent Claim
25 words
A method of manufacturing a sputtering target as recited in claim 10, wherein said plastic workings in said steps (b) and (c) comprise rolling working.
Claim 14
Dependent Claim
51 words
A method of manufacturing a sputtering target as recited in claim 11, further comprising removing said container from the alloy after the completion of said cold rolling step and finish-working said plastic-worked product into a target material, and bonding said target material to a backing plate to produce the sputtering target.
Claim 15
Dependent Claim
49 words
A method as claimed in claim 11, wherein said rolling working in step (b) is carried out a temperature greater than the recrystallization temperature of the alloy, and wherein said rolling working in step (c) is carried out at a temperature less than the recrystallization temperature of the alloy.
Claim 16
Dependent Claim
10 words
A sputtering target produced by the method of claim 7.
Claim 17
Dependent Claim
28 words
A method of manufacturing a sputtering target as recited in claim 10, further comprising a step of hot isostatic pressing between said containment step and said annealing step.
Claim 18
Dependent Claim
24 words
A method as claimed in claim 10 wherein said alloy is annealed at 400° C. to 700° C. for from 30 to 120 minutes.
Claim 19
Dependent Claim
10 words
A sputtering target produced by the method of claim 13.
Claim 20
Dependent Claim
29 words
A method as claimed in claim 7, wherein said reduction in step (b) is from 30 to 40% and said reduction in step (c) is from 5 to 7%.
Claim 21
Dependent Claim
14 words
A method as claimed in claim 7, wherein said first additional element is tantalum.
References Cited (Backward Citations)
US4505798A
Cited
US4749459A
Cited
EP0252478A2
Cited
US4832810A
Cited
US5112468A
Cited
US5004652A
Cited
US5180640A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-01-31 | 1997-08-02 | 1998-02-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-01-31 | 2001-08-02 | 2002-02-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-01-31 | 2005-08-02 | 2006-02-01 | $7700.00 | Window Closed / Lapsed |