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EP0252478A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Co-base alloy sputter target and process of manufacturing thereof

Assignee: Ulvac Inc
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Filing: 1987-07-06
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Granted: —
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Expires: 2007-07-06
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Abstract

Abstract This invention relates to a Co-base alloy sputter target comprising an f.c.c. phase and an h.c.p. phase and a value of an X-ray diffraction peak intensity ratio of I fcc(200) /I hcp(101) thereof is smaller than that of the I fcc(200) /I hcp(101) of a Co-base alloy obtained when a base alloy comprising an f.c.c. single-phase is cooled to a normal temperature from a high temperature at which it is in molten condition. This invention Co-base alloy sputter target is manufactur­ed by applying a cold-working treatment to a Co-base alloy produced by cooling a Co-base alloy material comprising an f.c.c. single-phase from a high temperature.

Inventors

  • 👤 Kyuzo Nakamura
  • 👤 Yoshifumi Ota
  • 👤 Taiki Yamada
  • 👤 Michio Ishikawa
  • 👤 Noriaki Umenosato-Ryo Tani
  • 👤 Yasushi Umenosato-Ryo Higuchi

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-10-31 03:29
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; C23C14/3414; C22; C22F; C22F1/00; C22F1/10

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 88 words
A Co-base alloy sputter target comprising an f.c.c. phase and an h.c.p. phase, characterized in that a value of an intensity ratio of an f.c.c. (200) peak to an h.c.p. (101) peak of an X-ray diffraction, that is, an X-ray diffraction peak ratio I fcc(200) /I hcp(101) , thereof is smaller than that of the X-ray diffraction peak ratio I fcc(200) /I hcp(101) of a Co-base alloy obtained when a Co-base alloy material comprising an f.c.c. single phase at a high temperature is cooled to a normal temperature.
Claim 2
Dependent Claim 88 words
A Co-base alloy sputter target comprising an f.c.c. phase and an h.c.p. phase, characterized in that a value of an intensity ratio of an f.c.c. (200) peak to an h.c.p. (101) peak of an X-ray diffraction, that is, an X-ray diffraction peak ratio I fcc(200) /I hcp(101) , thereof is smaller than that of the X-ray diffraction peak ratio I fcc(200) /I hcp(101) of a Co-base alloy obtained when a Co-base alloy material comprising an f.c.c. single phase at a high temperature is cooled to a normal temperature.
Claim 3
Dependent Claim 55 words
A process of manufacturing a Co-base alloy sputter target characterized in that a Co-base alloy comprising an f.c.c. single phase at a high temperature is cooled from a high temperature, so that there takes places a Martensite transformation, and the resultant Co-base alloy comprising largely the f.c.c. phase and partially an h.c.p. phase is cold-worked.
Claim 4
Dependent Claim 55 words
A process of manufacturing a Co-base alloy sputter target characterized in that a Co-base alloy comprising an f.c.c. single phase at a high temperature is cooled from a high temperature, so that there takes places a Martensite transformation, and the resultant Co-base alloy comprising largely the f.c.c. phase and partially an h.c.p. phase is cold-worked.

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