Abstract This invention relates to a Co-base alloy sputter target comprising an f.c.c. phase and an h.c.p. phase and a value of an X-ray diffraction peak intensity ratio of I fcc(200) /I hcp(101) thereof is smaller than that of the I fcc(200) /I hcp(101) of a Co-base alloy obtained when a base alloy comprising an f.c.c. single-phase is cooled to a normal temperature from a high temperature at which it is in molten condition. This invention Co-base alloy sputter target is manufactured by applying a cold-working treatment to a Co-base alloy produced by cooling a Co-base alloy material comprising an f.c.c. single-phase from a high temperature.
A Co-base alloy sputter target comprising an f.c.c. phase and an h.c.p. phase, characterized in that a value of an intensity ratio of an f.c.c. (200) peak to an h.c.p. (101) peak of an X-ray diffraction, that is, an X-ray diffraction peak ratio I fcc(200) /I hcp(101) , thereof is smaller than that of the X-ray diffraction peak ratio I fcc(200) /I hcp(101) of a Co-base alloy obtained when a Co-base alloy material comprising an f.c.c. single phase at a high temperature is cooled to a normal temperature.
Claim 2
Dependent Claim
88 words
A Co-base alloy sputter target comprising an f.c.c. phase and an h.c.p. phase, characterized in that a value of an intensity ratio of an f.c.c. (200) peak to an h.c.p. (101) peak of an X-ray diffraction, that is, an X-ray diffraction peak ratio I fcc(200) /I hcp(101) , thereof is smaller than that of the X-ray diffraction peak ratio I fcc(200) /I hcp(101) of a Co-base alloy obtained when a Co-base alloy material comprising an f.c.c. single phase at a high temperature is cooled to a normal temperature.
Claim 3
Dependent Claim
55 words
A process of manufacturing a Co-base alloy sputter target characterized in that a Co-base alloy comprising an f.c.c. single phase at a high temperature is cooled from a high temperature, so that there takes places a Martensite transformation, and the resultant Co-base alloy comprising largely the f.c.c. phase and partially an h.c.p. phase is cold-worked.
Claim 4
Dependent Claim
55 words
A process of manufacturing a Co-base alloy sputter target characterized in that a Co-base alloy comprising an f.c.c. single phase at a high temperature is cooled from a high temperature, so that there takes places a Martensite transformation, and the resultant Co-base alloy comprising largely the f.c.c. phase and partially an h.c.p. phase is cold-worked.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.