Abstract A conductivity modulation type MOSFET including a first region of a first conductivity type having a low impurity concentration, second regions of a second conductivity type selectively formed on the surface region of one side of the first region, third regions of the first conductivity type selectively formed on the surface region of the second regions, gate electrodes each formed above the surface region of the second region located between the first region and the third region, a plurality of gate insulating films interlayered between the gate electrodes and the surface region of the second regions, an emitter electrode in contact with both the second regions and the third regions, a fourth region of the second conductivity type having a high impurity concentration, formed adjoining to another side of the first region, fifth regions of the second conductivity type, selectively formed surrounding the fourth region, having a lower impurity concentration than that of the fourth region, and a collector electrode being in contact with both the fourth region and the fifth regions.
A method of producing a conductivity modulation type MOFSET comprising the steps of: growing a first epitaxial layer having a first conductivity on a silicon substrate having a second conductivity, the first epitaxial layer having a first impurity concentration and the silicon substrate having a second impurity concentration; forming a diffusion protecting film over the first epitaxial layer; forming windows selectively in the diffusion protecting film by an etching process; diffusing an impurity of the first conductivity into the first epitaxial layer through the windows to form a plurality of regions containing a third impurity concentration, the third impurity concentration of the plurality of regions being higher than the first impurity concentration of the first epitaxial layer and the second impurity concentration of the silicon substrate; growing a second epitaxial layer of the first conductivity on the first epitaxial layer, the second epitaxial layer having a fourth impurity concentration, the fourth impurity concentration being lower than the first impurity concentration of the first epitaxial layer; and applying an IGBT manufacturing process.
Claim 2
Independent Claim
171 words
A method of producing a conductivity modulation type MOFSET comprising the steps of: growing a first epitaxial layer having a first conductivity on a silicon substrate having a second conductivity, the first epitaxial layer having a first impurity concentration and the silicon substrate having a second impurity concentration; forming a diffusion protecting film over the first epitaxial layer; forming windows selectively in the diffusion protecting film by an etching process; diffusing an impurity of the first conductivity into the first epitaxial layer through the windows to form a plurality of regions containing a third impurity concentration, the third impurity concentration of the plurality of regions being higher than the first impurity concentration of the first epitaxial layer and the second impurity concentration of the silicon substrate; growing a second epitaxial layer of the first conductivity on the first epitaxial layer, the second epitaxial layer having a fourth impurity concentration, the fourth impurity concentration being lower than the first impurity concentration of the first epitaxial layer; and applying an IGBT manufacturing process.