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US5268260A
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Photoresist develop and strip solvent compositions and method for their use
Assignee: International Business Machines Corp
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Filing: 1991-10-22
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Granted: 1993-12-07
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Expires: 2011-10-22
Abstract
Abstract Simple, environmentally friendly developers and strippers are disclosed for free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and Vacrel photoresists. In all cases both the developers and the strippers include gamma butyrolactone, propylene carbonate and benzyl alcohol, optionally also including a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water.
Inventors
- 👤 Nageshwer R. Bantu
- 👤 Anilkumar C. Bhatt
- 👤 Ashwinkumar C. Bhatt
- 👤 Joseph A. Kotylo
- 👤 Gerald W. Jones
- 👤 Robert J. Owen
- 👤 Kostas Papathomas
- 👤 Anaya K. Vardya
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 21:23
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/30; G03F7/32; G03F7/325
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
137 words
A method of patterning a free-radical initiated, addition polymerizable acrylate monomer photoresist, comprising the steps of: a. providing the acrylate monomer photoresist film on a substrate; b. selectively exposing at least one predetermined area of the acrylate photoresist film to actinic radiation for a time sufficient to effect a contrast in the extent of crosslinking in the exposed and unexposed areas of the photoresist film; and c. developing the exposed acrylate photoresist film in a developing solvent consisting essentially of propylene carbonate and from about 0.1 to about 10 weight percent of an additive selected from the group consisting of methanol, ethanol, isopropyl alcohol, propylene glycol monomethyl acetate, formamide, nitromethane, propylene oxide, methyl ethyl ketone, and water at a temperature of about 15 degrees Centigrade to about 45 degrees Centigrade for about 0.5 to about 12 minutes.
Claim 2
Independent Claim
137 words
A method of patterning a free-radical initiated, addition polymerizable acrylate monomer photoresist, comprising the steps of: a. providing the acrylate monomer photoresist film on a substrate; b. selectively exposing at least one predetermined area of the acrylate photoresist film to actinic radiation for a time sufficient to effect a contrast in the extent of crosslinking in the exposed and unexposed areas of the photoresist film; and c. developing the exposed acrylate photoresist film in a developing solvent consisting essentially of propylene carbonate and from about 0.1 to about 10 weight percent of an additive selected from the group consisting of methanol, ethanol, isopropyl alcohol, propylene glycol monomethyl acetate, formamide, nitromethane, propylene oxide, methyl ethyl ketone, and water at a temperature of about 15 degrees Centigrade to about 45 degrees Centigrade for about 0.5 to about 12 minutes.
Claim 3
Independent Claim
139 words
A method of patterning a free-radical initiated, addition polymerizable acrylate monomer photoresist, comprising the steps of: a. providing the acrylate monomer photoresist film on a substrate; b. selectively exposing at least one predetermined area of the acrylate photoresist film to actinic radiation for a time sufficient to effect a contrast in the extent of crosslinking in the exposed and unexposed areas of the photoresist film; c. developing the exposed acrylate photoresist film in a developing solvent consisting essentially of propylene carbonate and from about 0.1 to about 10 weight percent of an additive selected from the group consisting of methanol, ethanol, isopropyl alcohol, propylene glycol monomethyl acetate, formamide, nitromethane, propylene oxide, methyl ethyl ketone, and water; and d. thereafter rinsing the photoresist coated substrate with water at a temperature of about 17 degrees Centigrade to about 60 degrees Centigrade.
Claim 4
Independent Claim
139 words
A method of patterning a free-radical initiated, addition polymerizable acrylate monomer photoresist, comprising the steps of: a. providing the acrylate monomer photoresist film on a substrate; b. selectively exposing at least one predetermined area of the acrylate photoresist film to actinic radiation for a time sufficient to effect a contrast in the extent of crosslinking in the exposed and unexposed areas of the photoresist film; c. developing the exposed acrylate photoresist film in a developing solvent consisting essentially of propylene carbonate and from about 0.1 to about 10 weight percent of an additive selected from the group consisting of methanol, ethanol, isopropyl alcohol, propylene glycol monomethyl acetate, formamide, nitromethane, propylene oxide, methyl ethyl ketone, and water; and d. thereafter rinsing the photoresist coated substrate with water at a temperature of about 17 degrees Centigrade to about 60 degrees Centigrade.
Claim 5
Independent Claim
159 words
A method of patterning a free-radical initiated, addition polymerizable acrylate monomer photoresist, comprising the steps of: a. providing the acrylate monomer photoresist film on a substrate; b. selectively exposing at least one predetermined area of the acrylate photoresist film to actinic radiation for a time sufficient to effect a contrast in the extent of crosslinking in the exposed and unexposed areas of the photoresist film; c. developing the exposed acrylate photoresist film in a developing solvent consisting essentially of propylene carbonate and from about 0.1 to about 10 weight percent of an additive selected from the group consisting of methanol, ethanol, isopropyl alcohol, propylene glycol monomethyl acetate, formamide, nitromethane, propylene oxide, methyl ethyl ketone, and water at a temperature of about 15 degrees Centigrade to about 45 degrees Centigrade for about 0.5 to about 12 minutes; and d. thereafter rinsing the photoresist coated substrate with water at a temperature of about 17 degrees Centigrade to about 60 degrees Centigrade.
Claim 6
Independent Claim
159 words
A method of patterning a free-radical initiated, addition polymerizable acrylate monomer photoresist, comprising the steps of: a. providing the acrylate monomer photoresist film on a substrate; b. selectively exposing at least one predetermined area of the acrylate photoresist film to actinic radiation for a time sufficient to effect a contrast in the extent of crosslinking in the exposed and unexposed areas of the photoresist film; c. developing the exposed acrylate photoresist film in a developing solvent consisting essentially of propylene carbonate and from about 0.1 to about 10 weight percent of an additive selected from the group consisting of methanol, ethanol, isopropyl alcohol, propylene glycol monomethyl acetate, formamide, nitromethane, propylene oxide, methyl ethyl ketone, and water at a temperature of about 15 degrees Centigrade to about 45 degrees Centigrade for about 0.5 to about 12 minutes; and d. thereafter rinsing the photoresist coated substrate with water at a temperature of about 17 degrees Centigrade to about 60 degrees Centigrade.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-12-06 | 1997-06-07 | 1997-12-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-12-06 | 2001-06-07 | 2001-12-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-12-06 | 2005-06-07 | 2005-12-07 | $7700.00 | Window Closed / Lapsed |