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Patent US5264074A successfully refreshed from Google Patents.
US5264074A
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US
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Flattening method for interlayer insulating film
Assignee: Sony Corp
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Filing: 1992-05-15
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Granted: 1993-11-23
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Expires: 2012-05-15
Abstract
Abstract Disclosed herein is a flattening method for an interlayer insulating film in a semiconductor device. A substance for forming a solid flattening film is prepared in a liquid-phase state, and a film (e.g., water film) of the substance in the liquid-phase state having a substantially flat upper surface is formed on an uneven upper surface of the interlayer insulating film. Subsequently, the liquid film thus formed is solidified to be formed into the solid flattening film. Then, the solid flattening film and a part of the interlayer insulating film are etched back to obtain a flat upper surface of the interlayer insulating film. Accordingly, the upper surface of the interlayer insulating film can be flattened at low temperatures.
Inventors
- 👤 Masakazu Muroyama
- 👤 Yasushi Morita
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 16:51
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/071; H10W20/092; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/282; H10P50/283; H10P95/00; H10P95/06; H10P95/062; H10P95/064
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
97 words
A flattening method for an interlayer insulating film comprising: a first step of forming a flattening ice film on an uneven upper surface of said interlayer insulating film; and a second step of etching to remove said flattening ice film and a part of said interlayer insulating film to flatten said upper surface of said interlayer insulating film; the improvements comprising said first step comprises forming a water film having a substantially flat upper surface on said uneven upper surface of said interlayer insulating film, and then freezing said water film to form said flattening ice film.
Claim 2
Dependent Claim
97 words
A flattening method for an interlayer insulating film comprising: a first step of forming a flattening ice film on an uneven upper surface of said interlayer insulating film; and a second step of etching to remove said flattening ice film and a part of said interlayer insulating film to flatten said upper surface of said interlayer insulating film; the improvements comprising said first step comprises forming a water film having a substantially flat upper surface on said uneven upper surface of said interlayer insulating film, and then freezing said water film to form said flattening ice film.
Claim 3
Dependent Claim
29 words
The flattening method as defined in claim 1, wherein said water film is formed in an atmosphere that a liquid phase and a solid phase of said water coexist.
Claim 4
Dependent Claim
30 words
The flattening method as defined in claim 1, wherein said water film is formed by spraying steam onto said upper surface of said interlayer insulating film and condensing said steam.
Claim 5
Dependent Claim
31 words
The flattening method as defined in claim 2, wherein said atmosphere is set at temperatures ranging from -15° C. to 2° C. under pressures ranging from 610 Pa to 101 kPa.
Claim 6
Dependent Claim
132 words
A flattening method for an interlayer insulating film comprising: a first step of forming a solid flattening film on an uneven upper surface of said interlayer insulating film; and a second step of etching to remove said solid flattening film and a part of said interlayer insulating film to flatten said upper surface of said interlayer insulating film; the improvements comprising said first step comprising selecting a substance for forming said flattening film from substances having a melting point in a range of -30° C. to 30° C. and a boiling point ≦200° C., forming a liquid film of said substance having a substantially flat upper surface on said uneven upper surface of said interlayer insulating film, and then solidifying said liquid film of said substance to form said solid flattening film.
Claim 7
Dependent Claim
132 words
A flattening method for an interlayer insulating film comprising: a first step of forming a solid flattening film on an uneven upper surface of said interlayer insulating film; and a second step of etching to remove said solid flattening film and a part of said interlayer insulating film to flatten said upper surface of said interlayer insulating film; the improvements comprising said first step comprising selecting a substance for forming said flattening film from substances having a melting point in a range of -30° C. to 30° C. and a boiling point ≦200° C., forming a liquid film of said substance having a substantially flat upper surface on said uneven upper surface of said interlayer insulating film, and then solidifying said liquid film of said substance to form said solid flattening film.
Claim 8
Dependent Claim
22 words
The flattening method as defined in claim 5, wherein said substances include water, ethylene diamine, formic acid, β-aminoethyl alcohol, and ethylene glycol.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-11-22 | 1997-05-24 | 1997-11-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-11-22 | 2001-05-24 | 2001-11-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-11-22 | 2005-05-24 | 2005-11-23 | $7700.00 | Window Closed / Lapsed |