Abstract A method of fabricating self aligned static induction transistors. The method comprises fabricating an N silicon on N - silicon substrate having an active area. A guard ring is formed around the active area. An N + polysilicon layer is formed that comprises source and gate regions. An oxide layer is formed on the N + polysilicon layer. A second polysilicon layer is formed on the oxide layer. A second oxide layer is formed on the second polysilicon layer which is then masked by a self aligning mask. Trenches are etched into the substrate using the self aligning mask and gate regions are formed at the bottom of the trenches. A first layer of metal (gate metal) is deposited to make contact with the gate regions. A layer of photoresist is deposited and planarized, and the first layer of metal is overetched below the top surface of the trench. Plasma nitride is deposited and planarized, and a polysilicon mask is deposited over the planarized layer of plasma nitride. The polysilicon mask is etched to expose the gate metal disposed on the field. A second layer of metal is deposited to make contact with the source and gate regions. A passivation layer is formed, and interconnection pads are formed that connect the first and second layers of metal. The present method employs a single minimum geometry trench mask. The key features of the transistor are defined by the trench mask and related processing parameters. Because of the self alignment achieved by the present invention, the number of channels per unit area is higher, which results in higher transconductance. In addition, some of the parasitic capacitance is eliminated by the present invention, resulting in faster operational speed. The variable sidewall trench oxide thickness allows fabrication of static induction transistors with higher or lower breakdown voltages according to the thickness that is chosen, and for a more graded P gate junction.
A method of making a self aligned static induction transistor, said method comprising the steps of: fabricating an N silicon on N- silicon substrate; forming an active area on the substrate; forming a guard ring surrounding the active area; forming an N + polysilicon layer on the substrate that comprises source and gate regions of the transistor; forming an N + layer adjacent the substrate; forming an oxide layer on top of the N + polysilicon layer; forming a second polysilicon layer on the oxide layer; forming a second oxide layer on top of the second polysilicon layer; forming a self aligning mask on top of the second oxide layer; etching trenches into the substrate using the self aligning mask; forming gate regions at the bottom of the trenches; depositing a first layer of metal on top of the transistor to make contact with the gate regions; depositing and planarizing a layer of photoresist on the surface of the transistor; overetching the first layer of metal to a predetermined depth below the top surface of the trench; removing the layer of photoresist; depositing and planarizing a layer of plasma nitride on the surface of the transistor; forming a polysilicon mask over the planarized layer of plasma nitride; etching the top surface of the transistor to expose the first layer of metal disposed over field regions of the transistor; depositing a second layer of metal on top of the transistor to make contact with the source and gate regions; depositing a passivation layer on top of the transistor; and forming interconnection pads that connect the first and second layers of metal.
Claim 2
Independent Claim
270 words
A method of making a self aligned static induction transistor, said method comprising the steps of: fabricating an N silicon on N- silicon substrate; forming an active area on the substrate; forming a guard ring surrounding the active area; forming an N + polysilicon layer on the substrate that comprises source and gate regions of the transistor; forming an N + layer adjacent the substrate; forming an oxide layer on top of the N + polysilicon layer; forming a second polysilicon layer on the oxide layer; forming a second oxide layer on top of the second polysilicon layer; forming a self aligning mask on top of the second oxide layer; etching trenches into the substrate using the self aligning mask; forming gate regions at the bottom of the trenches; depositing a first layer of metal on top of the transistor to make contact with the gate regions; depositing and planarizing a layer of photoresist on the surface of the transistor; overetching the first layer of metal to a predetermined depth below the top surface of the trench; removing the layer of photoresist; depositing and planarizing a layer of plasma nitride on the surface of the transistor; forming a polysilicon mask over the planarized layer of plasma nitride; etching the top surface of the transistor to expose the first layer of metal disposed over field regions of the transistor; depositing a second layer of metal on top of the transistor to make contact with the source and gate regions; depositing a passivation layer on top of the transistor; and forming interconnection pads that connect the first and second layers of metal.
Claim 3
Dependent Claim
30 words
The method of claim 1 wherein the step of etching trenches comprises the step of anisotropically etching the trenches into the substrate to produce relatively vertical walls of the trenches.
Claim 4
Dependent Claim
48 words
The method of claim 1 wherein the step of forming an N + layer adjacent the substrate comprises the steps of: depositing a layer of silicon nitride on the N + polysilicon; and diffusing N + dopant ions through the N + polysilicon layer and into the substrate.
Claim 5
Dependent Claim
55 words
The method of claim 1 wherein the step of forming gate regions at the bottom of the trenches comprises the steps of: growing gate oxide in the trenches; forming a P-grade layer adjacent the bottom of the trenches; and depositing P + dopant ions are implanted into the P-grade layer to form the gate regions.
Claim 6
Dependent Claim
33 words
The method of claim 4 wherein the step of depositing P + dopant ions comprises the steps of: implanting P + dopant ions into the P-grade layer; and annealing the implanted P-grade layer.
Claim 7
Dependent Claim
52 words
The method of claim 1 wherein the step of etching the trenches comprises providing for variable sidewall trench oxide thickness to provide for higher or lower breakdown voltages according to the thickness, and wherein a thicker layer of thermal oxide along the sidewalls allows for a more graded P + gate junction.
Claim 8
Dependent Claim
30 words
The method of claim 1 wherein the step of overetching the first layer of metal comprises overetching the first layer of metal by a factor of 100 to 300 percent.