Abstract Described herein is a method for forming a barrier metal structure in a minute contact hole in such a way as to ensure good coverage by the metal. The method of the invention comprises the steps of: opening a contact hole in an insulation film layer on a substrate in a diameter larger than an originally intended target value; forming a barrier metal layer over the entire surfaces of the insulation film layer; forming an oxidation film layer over the entire surfaces of the barrier metal layer until the diameter of the contact hole reaches the original target value; etching the oxidation film layer by anisotropic etching; and embedding a metal in the contact hole. Further, after forming a metal plug, the barrier metal layer may be selectively etched back in such a way as to leave a barrier metal layer only at the bottom of the contact hole.
A method for forming a barrier metal structure in a contact hole, comprising the steps of: opening a contact hole in an insulation film layer on a substrate in a diameter larger than an originally intended value; forming a barrier metal layer over the entire surfaces of said insulation film layer; forming an oxidation film layer over the entire surfaces of said barrier metal layer until the diameter of said contact hole reaches said target value; etching said oxidation film layer by anisotropic etching; and embedding a metal in said contact hole.
Claim 2
Independent Claim
92 words
A method for forming a barrier metal structure in a contact hole, comprising the steps of: opening a contact hole in an insulation film layer on a substrate in a diameter larger than an originally intended value; forming a barrier metal layer over the entire surfaces of said insulation film layer; forming an oxidation film layer over the entire surfaces of said barrier metal layer until the diameter of said contact hole reaches said target value; etching said oxidation film layer by anisotropic etching; and embedding a metal in said contact hole.
Claim 3
Dependent Claim
37 words
A method as defined in claim 1, further comprising the step of selectively etching said barrier metal layer in such a manner as to leave a barrier metal layer only at the bottom of said contact hole.