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US5252133A Expired / Lapsed US ⏱️ 0.0 years remaining

Vertically oriented CVD apparatus including gas inlet tube having gas injection holes

Assignee: Toshiba Corp
•
Filing: 1991-12-18
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Granted: 1993-10-12
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Expires: 2011-12-18
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Abstract

Abstract A vertically oriented CVD apparatus comprises a reaction chamber, a boat means vertically placed in the reaction chamber to horizontally support a plurality of semiconductor substrates, and a gas inlet tube including a plurality of gas injection holes along a longitudinal axis thereof and extending along a longitudinal side of the boat means to introduce a reaction gas into the reaction chamber. In the structure, a direction of each of the gas injection holes is set at an angle θ with respect to a reference line given by a straight line connecting a center of the gas inlet tube to a center of one of the semiconductor wafers, the angle θ being defined by 0° < θ ≦ 90°.

Inventors

  • 👤 Shinji Miyazaki
  • 👤 Yuichi Mikata
  • 👤 Takahiko Moriya
  • 👤 Reiji Niino
  • 👤 Motohiko Nishimura

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-06 03:33
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45563; C23C16/45578; C30; C30B; C30B25/00; C30B25/02; C30B25/14

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 236 words
A vertically oriented CVD apparatus for depositing a silicon nitride film on a plurality of semiconductor wafers comprising: a reaction chamber including an inner tube having an opened distal end and an outer tube having an exhaust port at a lower portion thereof and covering the inner tube; a boat means, having a top, vertically placed in the inner tube to horizontally support the plurality of semiconductor wafers as a stack; and a gas inlet tube including a plurality of gas injection holes along a longitudinal axis thereof and extending along a longitudinal side of the boat means to introduce a reaction gas, adapted to deposit a silicon nitride film on each of the plurality of semiconductor wafers, into the reaction chamber; wherein the reaction gas is exhausted from the opened distal end of the inner tube through the exhaust port, and a direction of each of the gas injection holes is set at an angle θ with respect to a reference line given by a straight line connecting a center of the gas inlet tube to a center of one of the plurality of semiconductor wafers, the angle θ being defined by θ 0 ≦ θ ≦ 90° where θ 0 is an angle between a line tangent to an outer edge of the one of the plurality of semiconductor wafers and passing through the center of the gas inlet tube and the reference line.
Claim 2
Dependent Claim 236 words
A vertically oriented CVD apparatus for depositing a silicon nitride film on a plurality of semiconductor wafers comprising: a reaction chamber including an inner tube having an opened distal end and an outer tube having an exhaust port at a lower portion thereof and covering the inner tube; a boat means, having a top, vertically placed in the inner tube to horizontally support the plurality of semiconductor wafers as a stack; and a gas inlet tube including a plurality of gas injection holes along a longitudinal axis thereof and extending along a longitudinal side of the boat means to introduce a reaction gas, adapted to deposit a silicon nitride film on each of the plurality of semiconductor wafers, into the reaction chamber; wherein the reaction gas is exhausted from the opened distal end of the inner tube through the exhaust port, and a direction of each of the gas injection holes is set at an angle θ with respect to a reference line given by a straight line connecting a center of the gas inlet tube to a center of one of the plurality of semiconductor wafers, the angle θ being defined by θ 0 ≦ θ ≦ 90° where θ 0 is an angle between a line tangent to an outer edge of the one of the plurality of semiconductor wafers and passing through the center of the gas inlet tube and the reference line.
Claim 3
Dependent Claim 22 words
The vertically oriented CVD apparatus according to claim 1, wherein the gas inlet tube extends to the top of the boat means.
Claim 4
Dependent Claim 20 words
The vertically oriented CVD apparatus according to claim 1, wherein the gas inlet tube is closed at an end thereof.
Claim 5
Dependent Claim 29 words
The vertically oriented CVD apparatus according to claim 1, wherein the plurality of gas injection holes introduce the reaction gas into a uniformly heated zone of the reaction chamber.
Claim 6
Dependent Claim 22 words
The vertically oriented CVD apparatus according to claim 4, wherein the direction of the plurality of gas injection holes is the same.
Claim 7
Dependent Claim 21 words
The vertically oriented CVD apparatus according to claim 4, wherein the direction of the plurality of gas injection holes is different.
Claim 8
Dependent Claim 25 words
The vertically oreinted CVD apparatus according to claim 1, further including a heating means disposed outside the outer tube to provide a uniformly heated zone.
Claim 9
Dependent Claim 34 words
The vertically oriented CVD apparatus according to claim 1, wherein the gas inlet tube includes two gas inlet ports through which two raw gases are introduced into the reaction chamber as the reaction gas.
Claim 10
Dependent Claim 52 words
The vertically oriented CVD apparatus according to claim 1, wherein a distance l between an edge of said gas inlet tube and an edge of the one of the semiconductor wafers is 12 to 18 mm while a diameter d of each of the gas injection holes is 0.7 to 1.3 mm.
Claim 11
Dependent Claim 20 words
The vertically oriented CVD apparatus according to claim 1, wherein the angle θ is θ 0 ≦ θ ≦ 80°.

References Cited (Backward Citations)

GB2155959A Cited
EP0164928A2 Cited
US4745088A Cited
JPS62235728A Cited
JPS62263629A Cited
JPS6481216A Cited
US4992301A Cited
JPH01235235A Cited
JPH029116A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-10-11 1997-04-12 1997-10-12 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-10-11 2001-04-12 2001-10-12 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-10-11 2005-04-12 2005-10-12 $7700.00 Window Closed / Lapsed

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