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US5252131A Expired / Lapsed US ⏱️ 0.0 years remaining

Apparatus for gas source molecular beam epitaxy

Assignee: Air Water Inc
•
Filing: 1992-04-07
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Granted: 1993-10-12
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Expires: 2012-04-07
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Abstract

Abstract This invention relates to an apparatus wherein a vacuum chamber is divided into two spaces, the substrate heating space and the crystal growth space, so that the degree of vacuum in the substrate heating space is set lower than the pressure for the Si growth and the degree of vacuum in the crystal space is set corresponding to the pressure for Si growth to thereby grow Si based semiconductor with excellent reproducibility over a long period. Moreover, heat efficiency toward the substrate is heightened by enclosing the upside and the circumference of the heating means with the heat shielding body to cut energy cost.

Inventors

  • 👤 Hiromi Kiyama
  • 👤 Kenji Okumura
  • 👤 Hidehiko Oku

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 02:31
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/20; C; C30; C30B; C30B25/00; C30B25/02; C30B25/14; C23; C23C; C23C16/00; C23C16/44; C23C16/48; C23C16/481; C30B25/10; C30B29/00; C30B29/02; C30B29/04

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 139 words
An apparatus for gas source molecular beam epitaxy comprising: a vacuum chamber capable of being set at high vacuum, a substrate installed inside of the vacuum chamber, means for heating the substrate by radiant heat from one side of the installed substrate, means for supplying gas for formation of a crystal film on the opposite side of the substrate, a separator set around the substrate which divides the interior of the vacuum chamber into two spaces, a first space for heating the substrate and a second space for crystal formation, means for separate evacuation of said first and second spaces a heat shielding body for substantially enclosing the heating means and having an opening facing said one side of said substrate, and means for moving the heat shielding body toward or away from the substrate to regulate heating thereof.
Claim 2
Independent Claim 139 words
An apparatus for gas source molecular beam epitaxy comprising: a vacuum chamber capable of being set at high vacuum, a substrate installed inside of the vacuum chamber, means for heating the substrate by radiant heat from one side of the installed substrate, means for supplying gas for formation of a crystal film on the opposite side of the substrate, a separator set around the substrate which divides the interior of the vacuum chamber into two spaces, a first space for heating the substrate and a second space for crystal formation, means for separate evacuation of said first and second spaces a heat shielding body for substantially enclosing the heating means and having an opening facing said one side of said substrate, and means for moving the heat shielding body toward or away from the substrate to regulate heating thereof.
Claim 3
Dependent Claim 37 words
An apparatus for gas source molecular beam epitaxy as defined in claim 1, wherein said separator includes an inner carbon part contacting said substrate and an outer quartz part contacting the inner wall of said vacuum chamber.
Claim 4
Dependent Claim 45 words
An apparatus for gas source molecular beam epitaxy as defined in claim 2, wherein the carbon part of the separator is grounded with said wall of the vacuum chamber, and a carbon plate is attached to the bottom of the quartz part of the separator.
Claim 5
Dependent Claim 35 words
An apparatus for gas source molecular beam epitaxy as defined in claim 1, further comprising: injection means for injecting a gas for cooling toward the substrate at the same time of completion of film formation.

References Cited (Backward Citations)

US4492852A Cited
US4838201A Cited
US4989543A Cited
US5107791A Cited
JPH01278715A Cited
US5033407A Cited
US4979465A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-10-11 1997-04-12 1997-10-12 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-10-11 2001-04-12 2001-10-12 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-10-11 2005-04-12 2005-10-12 $7700.00 Window Closed / Lapsed

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