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US5240497A
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Alkaline free electroless deposition
Assignee: Cornell Research Foundation Inc
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Filing: 1991-10-08
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Granted: 1993-08-31
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Expires: 2011-10-08
Abstract
Abstract Alkali-free layers of pure metals such as copper, nickel and cobalt were deposited on noble metal or noble metal sensitized substrates by electroless deposition using pure quaternary ammonium hydroxides or quaternary phosphonium hydroxides to generate the hydroxyl ion (OH-) needed to produce electrons for the metal reduction. Using the new alkaline-free electroless compositions, uniform, continuous and reproducible metal layers were selectively deposited with excellent electrical properties. With the improved compositions and process, nanosize copper lines having widths in the range of 100 to 500 nm were prepared.
Inventors
- 👤 Yosef Y. Shacham
- 👤 Roman Bielski
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 14:47
CPC Classifications
C; C23; C23C; C23C18/00; C23C18/16; C23C18/31; C23C18/32; C23C18/34; C23C18/38; C23C18/40; H; H10; H10P; H10P14/00; H10P14/40; H10P14/46; H05; H05K; H05K3/00; H05K3/22; H05K3/24; H05K3/244
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
176 words
An electroless deposition composition, free of alkali metal and suitable for depositing a metal layer on a noble metal or noble metal sensitized substrate, comprising: a) a source of metal ions; said metal selected from the group consisting of copper, cobalt, nickel and silver; b) a quaternary onium hydroxide or alkoxide capable of dissociating into a quaternary onium cation and hydroxyl or alkoxyl ion; c) a reducing agent present in an amount sufficient to react with said hydroxyl or alkoxyl ion to generate electrons to react with said metal ions to deposit a layer of metal on the noble metal substrate, d) a source of cyanide ions; said quaternary onium compound having the formula: ##STR2## wherein M represents nitrogen or phosphorus, and R 1 , R 2 , R 3 , R 4 are independently C 1- C 20 alkyl or cycloalkyl radicals, or C 6- C 20 aryl radicals, aralkyl radicals, and alkaryl radicals; and R 5 is H or one of R 1 , R 2 , R 3 , and R 4 .
Claim 2
Dependent Claim
176 words
An electroless deposition composition, free of alkali metal and suitable for depositing a metal layer on a noble metal or noble metal sensitized substrate, comprising: a) a source of metal ions; said metal selected from the group consisting of copper, cobalt, nickel and silver; b) a quaternary onium hydroxide or alkoxide capable of dissociating into a quaternary onium cation and hydroxyl or alkoxyl ion; c) a reducing agent present in an amount sufficient to react with said hydroxyl or alkoxyl ion to generate electrons to react with said metal ions to deposit a layer of metal on the noble metal substrate, d) a source of cyanide ions; said quaternary onium compound having the formula: ##STR2## wherein M represents nitrogen or phosphorus, and R 1 , R 2 , R 3 , R 4 are independently C 1- C 20 alkyl or cycloalkyl radicals, or C 6- C 20 aryl radicals, aralkyl radicals, and alkaryl radicals; and R 5 is H or one of R 1 , R 2 , R 3 , and R 4 .
Claim 3
Dependent Claim
20 words
The composition of claim 1 wherein the noble metal is selected from the group consisting of palladium, gold and platinum.
Claim 4
Dependent Claim
20 words
The composition of claim 2 wherein the deposited metal is copper and the onium compound is a quaternary ammonium hydroxide.
Claim 5
Dependent Claim
19 words
The composition of claim 2 wherein the deposited metal is copper and the onium compound is a phosphonium compound.
Claim 6
Dependent Claim
22 words
The composition of claim 1 wherein the deposited metal is copper and the source of cyanide ions is a quaternary ammonium cyanide.
Claim 7
Dependent Claim
15 words
The composition of claim 1 wherein the quaternary onium hydroxide or alkoxide is N-benzyltrimethylammonium hydroxide.
Claim 8
Dependent Claim
84 words
An electroless deposition composition, free of alkali metal and suitable for depositing a metal layer on a noble metal or noble metal sensitized substrate, comprising: a) a source of metal ions; said metal selected from the group consisting of copper, cobalt, nickel and silver; b) N-benzyltrimethylammonium hydroxide; c) a reducing agent present in an amount sufficient to react with hydroxyl from said N-benzyltrimethylammonium hydroxide to generate electrons to react with said metal ions to deposit a layer of metal on the noble metal substrate.
Claim 9
Dependent Claim
84 words
An electroless deposition composition, free of alkali metal and suitable for depositing a metal layer on a noble metal or noble metal sensitized substrate, comprising: a) a source of metal ions; said metal selected from the group consisting of copper, cobalt, nickel and silver; b) N-benzyltrimethylammonium hydroxide; c) a reducing agent present in an amount sufficient to react with hydroxyl from said N-benzyltrimethylammonium hydroxide to generate electrons to react with said metal ions to deposit a layer of metal on the noble metal substrate.
Claim 10
Dependent Claim
165 words
An electroless deposition composition, free of alkali metal and suitable for depositing a metal layer on a noble metal or noble metal sensitized substrate, comprising: a) a source of metal ions; said metal selected from the group consisting of copper, cobalt, nickel and silver; b) a phosphonium hydroxide or alkoxide capable of dissociating into a phosphonium cation and hydroxyl or alkoxyl ion; c) a reducing agent present in an amount sufficient to react with said hydroxyl or alkoxyl ion to generate electrons to react with said metal ions to deposit a layer of metal on the noble metal substrate, said phosphonium compound having the formula: ##STR3## wherein M represents phosphorus, and R 1 , R 2 , R 3 , R 4 are independently C 1- C 20 alkyl or cycloalkyl radicals, or C 6- C 20 aryl radicals, aralkyl radicals, and alkaryl radicals; and R 5 is H or one of R 1 , R 2 , R 3 , and R 4 .
Claim 11
Dependent Claim
165 words
An electroless deposition composition, free of alkali metal and suitable for depositing a metal layer on a noble metal or noble metal sensitized substrate, comprising: a) a source of metal ions; said metal selected from the group consisting of copper, cobalt, nickel and silver; b) a phosphonium hydroxide or alkoxide capable of dissociating into a phosphonium cation and hydroxyl or alkoxyl ion; c) a reducing agent present in an amount sufficient to react with said hydroxyl or alkoxyl ion to generate electrons to react with said metal ions to deposit a layer of metal on the noble metal substrate, said phosphonium compound having the formula: ##STR3## wherein M represents phosphorus, and R 1 , R 2 , R 3 , R 4 are independently C 1- C 20 alkyl or cycloalkyl radicals, or C 6- C 20 aryl radicals, aralkyl radicals, and alkaryl radicals; and R 5 is H or one of R 1 , R 2 , R 3 , and R 4 .
References Cited (Backward Citations)
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