Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
100 words
A CCD image sensor having an N type photodetecting region, an N type VCCD region and an N type HCCD region, comprising: (a) a P type layer formed underneath and surrounding said N type VCCD region; (b) an N type layer formed underneath and surrounding said P type layer; (c) a P type well formed underneath and surrounding said N type layer and extending between the N type layer and the N type photodetecting region to electrically isolate the N type layer from the N type photodetecting region; and (d) an N type substrate formed under said P type well.
Claim 2
Dependent Claim
100 words
A CCD image sensor having an N type photodetecting region, an N type VCCD region and an N type HCCD region, comprising: (a) a P type layer formed underneath and surrounding said N type VCCD region; (b) an N type layer formed underneath and surrounding said P type layer; (c) a P type well formed underneath and surrounding said N type layer and extending between the N type layer and the N type photodetecting region to electrically isolate the N type layer from the N type photodetecting region; and (d) an N type substrate formed under said P type well.
Claim 3
Dependent Claim
20 words
A CCD image sensor according to claim 1, wherein said substrate is adapted and arranged for receiving a shutter voltage.
Claim 4
Dependent Claim
25 words
A CCD image sensor as set forth in claim 1, wherein said N type layer includes an electrode formed thereon, for receiving a shutter voltage.
Claim 5
Dependent Claim
27 words
A CCD image sensor as set forth in claim 1, wherein said P type layer has a charge concentration higher than that of said P type well.
Claim 6
Dependent Claim
43 words
A CCD image sensor as set forth in claim 1, wherein said N type layer has a charge concentration lower than those of said N type photodetecting region and said N type VCCD region and higher than that of said N type substrate.
Claim 7
Dependent Claim
126 words
In a CCD image sensor having an N type photodetecting region, an N type VCCD region and an N type HCCD region, comprising: (a) a P type ion layer formed underneath and surrounding an N type VCCD region; (b) a P type well formed underneath and surrounding said P type layer; and (c) an N type substrate formed under said P type well; the improvement comprising: (d) an N type layer additionally interposed between said P type layer and said P type well, such that said N type layer is formed underneath and surrounding said P type layer, is separated from the N type photodetecting region by the P type well, and is electrically isolated from the N type photodetecting region by the P type well.
Claim 8
Dependent Claim
126 words
In a CCD image sensor having an N type photodetecting region, an N type VCCD region and an N type HCCD region, comprising: (a) a P type ion layer formed underneath and surrounding an N type VCCD region; (b) a P type well formed underneath and surrounding said P type layer; and (c) an N type substrate formed under said P type well; the improvement comprising: (d) an N type layer additionally interposed between said P type layer and said P type well, such that said N type layer is formed underneath and surrounding said P type layer, is separated from the N type photodetecting region by the P type well, and is electrically isolated from the N type photodetecting region by the P type well.
Claim 9
Dependent Claim
20 words
A CCD image sensor according to claim 6, wherein said substrate is adapted and arranged for receiving a shutter voltage.
Claim 10
Dependent Claim
23 words
A CCD image sensor according to claim 6, wherein said N type layer includes an electrode formed therein, for receiving a shutter voltage.
Claim 11
Dependent Claim
25 words
A CCD image sensor according to claim 6, wherein the P type layer has a charge concentration higher than that of the P type well.
Claim 12
Dependent Claim
41 words
A CCD image sensor according to claim 6, wherein said N type layer has a charge concentration lower than those of said N type photodetecting region and said N type VCCD region and higher than that of said N type substrate.
Claim 13
Dependent Claim
88 words
A CCD image sensor having an N type photodetecting region, an N type VCCD region and an N type HCCD region, comprising: (a) a P type layer formed underneath and surrounding said N type VCCD region; (b) an N type layer formed underneath and surrounding said P type layer, said N type layer including an electrode formed thereon, for receiving a shutter voltage; (c) a P type well formed underneath and surrounding said N type layer; and (d) an N type substrate formed under said P type well.
Claim 14
Dependent Claim
88 words
A CCD image sensor having an N type photodetecting region, an N type VCCD region and an N type HCCD region, comprising: (a) a P type layer formed underneath and surrounding said N type VCCD region; (b) an N type layer formed underneath and surrounding said P type layer, said N type layer including an electrode formed thereon, for receiving a shutter voltage; (c) a P type well formed underneath and surrounding said N type layer; and (d) an N type substrate formed under said P type well.
Claim 15
Dependent Claim
112 words
In a CCD image sensor having an N type photodetecting region, an N type VCCD region and an N type HCCD region, comprising: (a) a P type ion layer formed underneath and surrounding an N type VCCD region; (b) a P type well formed underneath and surrounding said P type layer; and (c) an N type substrate formed under said P type well; the improvement comprising: (d) an N type layer additionally interposed between said P type layer and said P type well, such that said N type layer is formed underneath and surrounding said P type layer, said N type layer including an electrode formed therein, for receiving a shutter voltage.
Claim 16
Dependent Claim
112 words
In a CCD image sensor having an N type photodetecting region, an N type VCCD region and an N type HCCD region, comprising: (a) a P type ion layer formed underneath and surrounding an N type VCCD region; (b) a P type well formed underneath and surrounding said P type layer; and (c) an N type substrate formed under said P type well; the improvement comprising: (d) an N type layer additionally interposed between said P type layer and said P type well, such that said N type layer is formed underneath and surrounding said P type layer, said N type layer including an electrode formed therein, for receiving a shutter voltage.