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US5232674A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of improving surface morphology of laser irradiated surface

Assignee: Sharp Corp
•
Filing: 1992-06-10
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Granted: 1993-08-03
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Expires: 2012-06-10
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Abstract

Abstract A method of improving surface morphology of a laser irradiated surface includes a first step of irradiating a pulse laser beam one or a plurality of times on a region of a conductor layer which is formed on an under layer so as to melt the entire conductor layer, and a second step of irradiating a pulse laser beam on the irradiated region of the conductor layer at least once after the first step with an energy density such that only a surface portion of the conductor layer melts in substantially the entire irradiated region.

Inventors

  • 👤 Ryoichi Mukai
  • 👤 Michiko Takei

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-05 09:56
CPC Classifications
H; H10; H10P; H10P95/00; H10P95/04; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/056; H10W20/059; H10W20/062

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 134 words
A method of improving surface morphology of a laser irradiated surface comprising the steps of: first irradiating a pulse laser beam at least one time on a region of a conductor layer which is formed on an underlayer with a first energy density so as to melt the entire conductor layer, thereby causing portions of a surface of said conductor layer to be non-planarized, and secondly irradiating a pulse laser beam on the irradiated region of the conductor layer at least once after said first irradiating with a second energy density such that only a surface portion of the conductor layer melts in substantially the entire irradiated region, wherein said conductor layer is planarized, thereby improving the surface morphology of said conductor layer, the second energy density being lower than the first energy density.
Claim 2
Independent Claim 134 words
A method of improving surface morphology of a laser irradiated surface comprising the steps of: first irradiating a pulse laser beam at least one time on a region of a conductor layer which is formed on an underlayer with a first energy density so as to melt the entire conductor layer, thereby causing portions of a surface of said conductor layer to be non-planarized, and secondly irradiating a pulse laser beam on the irradiated region of the conductor layer at least once after said first irradiating with a second energy density such that only a surface portion of the conductor layer melts in substantially the entire irradiated region, wherein said conductor layer is planarized, thereby improving the surface morphology of said conductor layer, the second energy density being lower than the first energy density.
Claim 3
Dependent Claim 33 words
The method as claimed in claim 1, wherein said first irradiating of the pulse laser is performed on a plurality of areas within the region with an overlap between two mutually adjacent areas.
Claim 4
Dependent Claim 34 words
The method as claimed in claim 1, wherein said second irradiating of the pulse laser is performed on a plurality of areas within the irradiated region with an overlap between two mutually adjacent areas.
Claim 5
Dependent Claim 83 words
The method as claimed in claim 1, wherein said first irradiating of the pulse laser is performed on a plurality of first areas within the region with an overlap between two mutually adjacent first areas, and said second irradiating of the pulse laser is performed on a plurality of second areas within the irradiated region with an overlap between two mutually adjacent areas, the second area having a central portion which overlaps a peripheral portion of at least one of said first area.
Claim 6
Dependent Claim 85 words
The method as claimed in claim 1, wherein said first irradiating of the pulse laser on a region of the conductor layer includes the step of irradiating the pulse laser on a region of the conductor layer made of aluminum and silicon at an energy density in a range of 3 to 10 J/cm 2 , and said second irradiating of the pulse laser includes the step of irradiating the pulse laser at an energy density in range of 1 to 2 J/cm 2 .
Claim 7
Dependent Claim 54 words
The method as claimed in claim 1, wherein said first irradiating of the pulse laser on a region of the conductor layer includes the step of irradiating the pulse laser on a region of the conductor layer made of a material selected from a group consisting of Al, Cu, Mo, W and alloys thereof.
Claim 8
Dependent Claim 21 words
The method as claimed in claim 1, wherein said first and second irradiations of the pulse laser are done only once.
Claim 9
Dependent Claim 73 words
The method as claimed in claim 1, wherein said first irradiating of the pulse laser is done on a plurality of first areas within the region with an overlap between two mutually adjacent first areas, and said second irradiating of the pulse laser is done on a plurality of second areas within the irradiated region with an overlap between two mutually adjacent second areas, said second area being greater than said first area.
Claim 10
Dependent Claim 71 words
The method as claimed in claim 1, wherein said first irradiating of the pulse laser is done on a plurality of areas within the region such that an area irradiated during one first irradiation is not adjacent to an area irradiated during an immediately successive first irradiation, a resulting irradiation of all of the plurality of areas during said first irradiating having an overlap of irradiations between two mutually adjacent areas.
Claim 11
Dependent Claim 39 words
The method as claimed in claim 9, wherein said first irradiating of the pulse laser is done on the area within the region so that a time interval between two successive first irradiations is approximately 0.01 second or less.
Claim 12
Dependent Claim 46 words
The method as claimed in claim 9, wherein said first irradiating of the pulse laser is done on the areas within the region so that a time interval between when one area is irradiated and when an adjacent area is irradiated is 0.1 second or greater.
Claim 13
Dependent Claim 86 words
The method as claimed in claim 9, wherein said first irradiating of the pulse laser on a region of the conductor layer includes the step of irradiating the pulse layer on a region of the conductor layer made of aluminum and silicon at an energy density in a range of 3 to 10 J/cm 2 , and said second irradiating of the pulse laser includes the step of irradiating the pulse laser at an energy density in a range of 1 to 2 J/cm 2 .
Claim 14
Dependent Claim 55 words
The method as claimed in claim 9, wherein said first irradiating of the pulse laser on a region of the conductor layer includes the step of irradiating the pulse laser on a region of the conductor layer made of a material selected from a group consisting of Al, Ti, Cu, Mo, W and alloys thereof.

References Cited (Backward Citations)

JPS5567132A Cited
JPS61260621A Cited
US4800179A Cited
US4920070A Cited
US4758533A Cited
JPH01145832A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-08-02 1997-02-01 1997-08-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-08-02 2001-02-01 2001-08-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-08-02 2005-02-01 2005-08-03 $7700.00 Window Closed / Lapsed

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