Patent US5228940A successfully refreshed from Google Patents.
US5228940A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Fine pattern forming apparatus
Assignee: Mitsubishi Electric Corp
•
Filing: 1992-04-10
•
Granted: 1993-07-20
•
Expires: 2012-04-10
Abstract
Abstract A fine pattern forming apparatus includes a stage and an opposed electrode at least one of which is made of a magnetic material. A magnetic field is applied to this stage or opposed electrode to provide a predetermined gap between the stage and the opposed electrode for a fine pattern formation. In consequence, optimum etching conditions (including etching uniformity, etch rate and etching direction) can be assured without generating dust. As a result, damage caused by the plasma can be reduced, and the etch rate can be increased.
Inventors
- 👤 Masahiro Yoneda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:58
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32532; H01J37/3255; H01J37/32568; H01J2237/00; H01J2237/02; H01J2237/022; H01J2237/20
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
89 words
A fine pattern forming apparatus, comprising: a vacuum chamber; reactive gas supplying means for supplying a reactive gas into said vacuum chamber; a stage disposed within said vacuum chamber for supporting a sample and serving as an electrode, at least part of said stage being made of a magnetic material; an opposed electrode disposed in opposed relation to said stage; magnetic field generating means for magnetically levitating said stage to provide a predetermined gap between said stage and said opposed electrode; and evacuation means for evacuating said vacuum chamber.
Claim 2
Dependent Claim
89 words
A fine pattern forming apparatus, comprising: a vacuum chamber; reactive gas supplying means for supplying a reactive gas into said vacuum chamber; a stage disposed within said vacuum chamber for supporting a sample and serving as an electrode, at least part of said stage being made of a magnetic material; an opposed electrode disposed in opposed relation to said stage; magnetic field generating means for magnetically levitating said stage to provide a predetermined gap between said stage and said opposed electrode; and evacuation means for evacuating said vacuum chamber.
Claim 3
Dependent Claim
16 words
A fine pattern forming apparatus according to claim 1 wherein said sample is a semiconductor substrate.
Claim 4
Dependent Claim
16 words
A fine pattern forming apparatus according to claim 1 wherein said sample is a magnetic tape.
Claim 5
Dependent Claim
16 words
A fine pattern forming apparatus according to claim 1 wherein said sample is a magnetic disk.
Claim 6
Dependent Claim
16 words
A fine pattern forming apparatus according to claim 1 wherein said sample is an optical disk.
Claim 7
Dependent Claim
17 words
A fine pattern forming apparatus according to claim 1 wherein said sample is a metal shaped substance.
Claim 8
Dependent Claim
16 words
A fine pattern forming apparatus according to claim 1 wherein said sample is a machine component.
Claim 9
Dependent Claim
31 words
A fine pattern forming apparatus according to claim 1 wherein said sample includes a substrate and a film disposed on said substrate in which a fine pattern is to be formed.
Claim 10
Dependent Claim
41 words
A fine pattern forming apparatus according to claim 8 wherein said film in which a fine pattern is to be formed is selected from the group consisting of a silicon oxide film, a silicon nitride film, and a silicon oxynitride film.
Claim 11
Dependent Claim
36 words
A fine pattern forming apparatus according to claim 8 wherein said film in which a fine pattern is to be formed is selected from the group consisting of a polycrystalline and a single crystal silicon film.
Claim 12
Dependent Claim
64 words
A fine pattern forming apparatus according to claim 8 wherein said film in which a fine pattern is to be formed is selected from the group consisting of tungsten, tantalum, molybdenum, zirconium, titanium, hafnium, chromium, platinum, iron, zinc, tin, a silicide of any of the foregoing elements, a nitride of any of the foregoing elements, and a carbide of any of the foregoing elements.
Claim 13
Dependent Claim
41 words
A fine pattern forming apparatus according to claim 8 wherein said film in which a fine pattern is to be formed is selected from the group consisting of aluminum copper, gold, silver, and alloys mainly composed of any of these metals.
Claim 14
Dependent Claim
32 words
A fine pattern forming apparatus according to claim 8 wherein said film in which a fine pattern is to be formed is an organic polymer such as a novolak resin and polyimide.
Claim 15
Dependent Claim
31 words
A fine pattern forming apparatus according to claim 8 wherein said film in which a fine pattern is to be formed is a ferroelectric substance such as PZT (lead, zinc, tin).
Claim 16
Dependent Claim
21 words
The fine pattern forming apparatus according to claim 1 wherein said magnetic field generating means comprises an external magnetic field coil.
Claim 17
Dependent Claim
91 words
A fine pattern forming apparatus comprising: a vacuum chamber; reactive gas supplying means for supplying a reactive gas into said vacuum chamber; a stage disposed within said vacuum chamber for supporting a sample and serving as an electrode; an opposed electrode disposed in opposed relation to said stage, at least part of said opposed electrode being made of a magnetic material; magnetic field generating means for levitating said opposed electrode magnetically to provide a predetermined gap between said stage and said opposed electrode; and evacuation means for evacuating said vacuum chamber.
Claim 18
Dependent Claim
91 words
A fine pattern forming apparatus comprising: a vacuum chamber; reactive gas supplying means for supplying a reactive gas into said vacuum chamber; a stage disposed within said vacuum chamber for supporting a sample and serving as an electrode; an opposed electrode disposed in opposed relation to said stage, at least part of said opposed electrode being made of a magnetic material; magnetic field generating means for levitating said opposed electrode magnetically to provide a predetermined gap between said stage and said opposed electrode; and evacuation means for evacuating said vacuum chamber.
Claim 19
Dependent Claim
21 words
The fine pattern forming apparatus according to claim 16 wherein said magnetic field generating means comprises an external magnetic field coil.
References Cited (Backward Citations)
US4351805A
Cited
JPS5817018A
Cited
JPS5994422A
Cited
EP0132538A1
Cited
US4563240A
Cited
JPS6062460A
Cited
JPS60195938A
Cited
JPS6187884A
Cited
JPS61227169A
Cited
JPS6257214A
Cited
JPS63219137A
Cited
JPH01107539A
Cited
JPH01184839A
Cited
JPH01279783A
Cited
DE3914065A1
Cited
DE3935189A1
Cited
DE4128780A1
Cited
DE4128779A1
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-07-19 | 1997-01-18 | 1997-07-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-07-19 | 2001-01-18 | 2001-07-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-07-19 | 2005-01-18 | 2005-07-20 | $7700.00 | Window Closed / Lapsed |