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US5212352A Expired / Lapsed US ⏱️ 0.0 years remaining

Self-aligned tungsten-filled via

Assignee: Texas Instruments Inc
•
Filing: 1990-12-26
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Granted: 1993-05-18
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Expires: 2010-12-26
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Abstract

Abstract Via patterns (16, 18) are applied to a first interlevel oxide layer (58) down to a metal layer (52) to define a plurality of orifices. These orifices (61, 63) are filled with tungsten by selective chemical vapor deposition. A first level conductor pattern (10, 12, 14) is then used to etch away the first insulator layer (58) and portions of plugs (62, 64) that are outside the first level conductor pattern. This first level conductor pattern is also used for a subsequent first level metal etch. The entire structure is then covered with a self-planarizing oxide layer (82), which is subsequently etched back to expose the top surfaces (66, 68) of tungsten plugs (62, 64).

Inventors

  • 👤 Jeffrey E. Brighton
  • 👤 Douglas P. Verret

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 23:05
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/071; H10W20/081; H10W20/082

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 150 words
An apparatus, comprising: an elongate conductor formed on a support layer, sides of said conductor extending outwardly from said support layer; an outer surface of said conductor having a lateral boundary defined by said sides; a first insulator layer formed only on said outer surface, an area of said outer surface not covered by said first insulator layer, said first insulator layer defining first and second edges of said area, third and fourth edges of said area defined by said outer surface lateral boundary; a second insulator layer formed to cover all of said sides that adjoin said area; a bottom of a via formed by said area, sidewalls of said via formed by said first and second insulator layers; and conductive material selectively formed in said via to fill said via, an outer surface of said conductive material substantially coplanar with an outer surface of said first insulator layer.
Claim 2
Independent Claim 150 words
An apparatus, comprising: an elongate conductor formed on a support layer, sides of said conductor extending outwardly from said support layer; an outer surface of said conductor having a lateral boundary defined by said sides; a first insulator layer formed only on said outer surface, an area of said outer surface not covered by said first insulator layer, said first insulator layer defining first and second edges of said area, third and fourth edges of said area defined by said outer surface lateral boundary; a second insulator layer formed to cover all of said sides that adjoin said area; a bottom of a via formed by said area, sidewalls of said via formed by said first and second insulator layers; and conductive material selectively formed in said via to fill said via, an outer surface of said conductive material substantially coplanar with an outer surface of said first insulator layer.
Claim 3
Dependent Claim 11 words
The apparatus of claim 1, wherein said conductive material comprises tungsten.
Claim 4
Dependent Claim 25 words
The apparatus of claim 1, wherein said sides are substantially parallel to each other and said outer surface is substantially parallel to said support layer.
Claim 5
Dependent Claim 10 words
The apparatus of claim 1, wherein said conductor comprises metal.
Claim 6
Dependent Claim 40 words
The apparatus of claim 4, wherein said conductor is formed by a first layer adjacent said support layer, said first layer comprised of titanium-tungsten alloy, a second layer of said conductor formed on said first layer and comprised of aluminum.
Claim 7
Dependent Claim 22 words
The apparatus of claim 5, wherein said conductor further comprises a third layer formed on said second layer and comprising titanium-tungsten alloy.
Claim 8
Dependent Claim 17 words
The apparatus of claim 1, wherein said first and second insulator layers are comprised of silicon dioxide.

References Cited (Backward Citations)

US3652333A Cited
US3726002A Cited
US4424251A Cited
US4604496A Cited
US4977439A Cited
US5051796A Cited
US4927983A Cited
US5006673A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-05-17 1996-11-16 1997-05-18 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-05-17 2000-11-16 2001-05-18 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-05-17 2004-11-16 2005-05-18 $7700.00 Window Closed / Lapsed

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