Patent US5202204A successfully refreshed from Google Patents.
US5202204A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process of producing exposure mask
Assignee: Sony Corp
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Filing: 1990-06-11
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Granted: 1993-04-13
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Expires: 2010-06-11
Abstract
Abstract A process of producing an exposure mask by which the accuracy of a pattern of a mask film to be formed on a surface of a transparent substrate is improved and also the accuracy in registration between layers is improved. The process comprises the step of correcting, upon exposure for the formation of a mask pattern, the position of a mask pattern by a different correction amount in accordance with a ratio at which the area of the mask film which remains after etching occupies in the entire area of a transparent substrate on which the mask film is formed.
Inventors
- 👤 Hiroichi Kawahira
- 👤 Takehiko Gunji
- 👤 Satoru Nozawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 11:26
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/70783; H; H10; H10P; H10P95/00; G03F1/00; G03F1/50; Y; Y10; Y10S; Y10S430/00; Y10S430/143
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
97 words
A process of producing an exposure mask wherein a mask film is formed on a transparent substrate, and then, exposure processing and selective etching processing are performed for the mask film to form a mask pattern of the mask film, comprising the steps of: determining a ratio of an area of mask film which is to remain after etching to a total area of a mask substrate; and correcting, during exposure for formation of the mask pattern, a position of the mask pattern by a correction amount that depends on the ratio determined in the preceeding step.
Claim 2
Dependent Claim
97 words
A process of producing an exposure mask wherein a mask film is formed on a transparent substrate, and then, exposure processing and selective etching processing are performed for the mask film to form a mask pattern of the mask film, comprising the steps of: determining a ratio of an area of mask film which is to remain after etching to a total area of a mask substrate; and correcting, during exposure for formation of the mask pattern, a position of the mask pattern by a correction amount that depends on the ratio determined in the preceeding step.
Claim 3
Dependent Claim
69 words
A process according to claim 1, further comprising the steps of: obtaining in advance of said correcting step a plurality correction amounts for each of a plurality of different types of mask films, and selecting an amount of correction of the position of a mask pattern from among said plurality of correction amounts depending on which of said plurality of different types of mask films is to be used.
Claim 4
Dependent Claim
31 words
A process according to claim 1, wherein the amount of the correction of the position of a mask film includes expansion errors in particular perpendicular directions and an error in orthogonality.
Claim 5
Independent Claim
124 words
A device for the exposure of a transparent substrate having a mask film formed thereon, comprising: means for supporting thereon a transparent substrate on which a type of mask film is formed, an electron gun, storage means for storing therein data for the formation of a mask pattern of the mask film on the transparent substrate; means for controlling an electron beam emitted from said electron gun in accordance with data received from said storage means, and means for correcting the data stored in said storage means by an amount depending on said type of said mask film in accordance with a ratio of the area of the mask film of said type which remains after etching to the entire area of transparent substrate.
Claim 6
Independent Claim
124 words
A device for the exposure of a transparent substrate having a mask film formed thereon, comprising: means for supporting thereon a transparent substrate on which a type of mask film is formed, an electron gun, storage means for storing therein data for the formation of a mask pattern of the mask film on the transparent substrate; means for controlling an electron beam emitted from said electron gun in accordance with data received from said storage means, and means for correcting the data stored in said storage means by an amount depending on said type of said mask film in accordance with a ratio of the area of the mask film of said type which remains after etching to the entire area of transparent substrate.
Claim 7
Dependent Claim
51 words
A device according to claim 4, further comprising: a switch means, and wherein said storage means has a plurality of correction amounts stored therein individually for a plurality of different types of mask films, and one of the correction amounts is selected in response to an output of said switch means.
References Cited (Backward Citations)
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Cited
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Cited
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-04-12 | 1996-10-12 | 1997-04-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-04-12 | 2000-10-12 | 2001-04-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-04-12 | 2004-10-12 | 2005-04-13 | $7700.00 | Window Closed / Lapsed |