US5083032A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Electron beam exposure apparatus
Assignee: Toshiba Corp
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Filing: 1991-02-21
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Granted: 1992-01-21
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Expires: 2011-02-21
Abstract
Abstract Stored in the magnetic disk are the lithography data for lithographing a mask pattern and the correction data for correcting the lithography data. The CPU reads the lithography data and correction data from the magnetic disk and compares addresses from the different sources. When the two separate addresses coincide, the electro-optic system lithographs the mask pattern based on the correction data, whereas when the two addresses disagree with each other, it lithographs the mask pattern according to the lithography data.
Inventors
- 👤 Toshiyuki Suzuki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 12:12
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/304; H01J37/302; H01J37/3023; H01J37/3026
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
174 words
An electron beam exposure apparatus comprising: memory means for storing lithography data used to lithograph a mask pattern, said lithography data containing addresses specifying lithography position and data corresponding to a beam current for lithographing the mask pattern; supply means for supplying correction data for correcting said lithography data, said correction data containing X-Y coordinates of addresses specifying the correction position of the mask pattern and data corresponding to a beam current for correcting the mask pattern; exposure means for emitting electron beam on to the mask according to the lithography data; detecting means for detecting X-Y coordinates of the pattern on the mask exposed by said exposure means; comparator mean for comparing the X-Y coordinates of the pattern addresses contained in said correction data and the X-Y coordinates detected by said detecting means; and control means for controlling the magnitude of beam current in said exposure means based on the data corresponding to the beam current contained in said correction data when said comparator detects the coincidence of the two separate X-Y coordinates.
Claim 2
Dependent Claim
174 words
An electron beam exposure apparatus comprising: memory means for storing lithography data used to lithograph a mask pattern, said lithography data containing addresses specifying lithography position and data corresponding to a beam current for lithographing the mask pattern; supply means for supplying correction data for correcting said lithography data, said correction data containing X-Y coordinates of addresses specifying the correction position of the mask pattern and data corresponding to a beam current for correcting the mask pattern; exposure means for emitting electron beam on to the mask according to the lithography data; detecting means for detecting X-Y coordinates of the pattern on the mask exposed by said exposure means; comparator mean for comparing the X-Y coordinates of the pattern addresses contained in said correction data and the X-Y coordinates detected by said detecting means; and control means for controlling the magnitude of beam current in said exposure means based on the data corresponding to the beam current contained in said correction data when said comparator detects the coincidence of the two separate X-Y coordinates.
Claim 3
Dependent Claim
30 words
An apparatus according to claim 1, wherein said correction data further contains patterning addresses for lithographing a new pattern and data corresponding to a beam current for lithographing this pattern.
Claim 4
Dependent Claim
14 words
An apparatus according to claim 1, wherein said supply means constitute a magnetic disk.
Claim 5
Dependent Claim
13 words
An apparatus according to claim 1, wherein said supply means constitute a keyboard.
Claim 6
Dependent Claim
167 words
An electron beam exposure apparatus comprising: memory means for storing lithography data used to lithograph a mask pattern, said lithography data containing addresses specifying the lithography position and data corresponding to a beam current for lithographing a mask pattern; supply means for supplying correction data used to correct said lithography data, said correction data containing addresses specifying the correction position of the mask pattern and data corresponding to a beam current for correcting the mask pattern; first control means for comparing the addresses contained in said lithography data with the addresses contained in said correction data; second control means for controlling the magnitude of beam current based on said data contained in said correction data when said first control means detects the coincidence of the two separate addresses, but based on said data contained in said lithography data when the coincidence is not reached; and exposure means for lithographing a pattern using an electron beam produced according to the beam current controlled by said second control means.
Claim 7
Dependent Claim
167 words
An electron beam exposure apparatus comprising: memory means for storing lithography data used to lithograph a mask pattern, said lithography data containing addresses specifying the lithography position and data corresponding to a beam current for lithographing a mask pattern; supply means for supplying correction data used to correct said lithography data, said correction data containing addresses specifying the correction position of the mask pattern and data corresponding to a beam current for correcting the mask pattern; first control means for comparing the addresses contained in said lithography data with the addresses contained in said correction data; second control means for controlling the magnitude of beam current based on said data contained in said correction data when said first control means detects the coincidence of the two separate addresses, but based on said data contained in said lithography data when the coincidence is not reached; and exposure means for lithographing a pattern using an electron beam produced according to the beam current controlled by said second control means.
Claim 8
Dependent Claim
31 words
An apparatus according to claim 5, wherein said correction data further contains patterning addresses used to lithograph a new pattern and data corresponding to a beam current for lithographing this pattern.
Claim 9
Dependent Claim
23 words
An apparatus according to claim 5, wherein said correction data contains either pattern-narrowing data or pattern-shortening data each contained in said lithography data.
Claim 10
Dependent Claim
14 words
An apparatus according to claim 5, wherein said supply means constitute a magnetic disk.
Claim 11
Dependent Claim
13 words
An apparatus according to claim 5, wherein said supply means constitute a keyboard.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-01-20 | 1995-07-22 | 1996-01-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-01-20 | 1999-07-22 | 2000-01-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-01-20 | 2003-07-22 | 2004-01-21 | $7700.00 | Window Closed / Lapsed |