Abstract A dry etching method enabling etching of a layer of a copper (Cu) based material at a wafer heating temperature lower than heretofore, and a practically useful method for detecting the end point of etching. If the Cu layer is etched using an etching gas including a compound containing chlorine (Cl) and oxygen (O) as component elements or an etching gas including a compound containing Cl and a compound containing O as component elements, respectively, the Cu layer is removed not only in the form of copper chloride CuCl x but in the form of copper oxychloride CuCl x O y , where x is 1 to 2 and y is 1 to 8. Since CuCl x O y has a vapor pressure lower than that of CuCl x , a conventional etching reaction product, it is unnecessary to heat the wafer to higher temperatures as in the conventional practice, while there is no risk of a copper oxide film being formed on the surface of the Cu layer. The end point of etching may be detected by detecting a decrease in emission peak intensities in the molecular spectrum of CuCl appearing the specific wavelengths, such as 402 nm or 433 nm.
A dry etching method comprising reactive ion etching a layer of substantially pure copper material using an etching gas including a compound containing Cl and O as component elements or an etching gas including a compound containing Cl as a component element and a compound containing O as a component element, said etching processing producing volatile CuCl x O y as a reaction product.
Claim 2
Dependent Claim
64 words
A dry etching method comprising reactive ion etching a layer of substantially pure copper material using an etching gas including a compound containing Cl and O as component elements or an etching gas including a compound containing Cl as a component element and a compound containing O as a component element, said etching processing producing volatile CuCl x O y as a reaction product.
Claim 3
Dependent Claim
53 words
A dry etching method comprising etching a layer of a copper-based material with an etch gas including a compound containing Cl and O as component elements, said compound being at least one compound selected from the group consisting of ClO 2 , Cl 2 O, Cl 2 O 7 and HClO 4 .
Claim 4
Dependent Claim
53 words
A dry etching method comprising etching a layer of a copper-based material with an etch gas including a compound containing Cl and O as component elements, said compound being at least one compound selected from the group consisting of ClO 2 , Cl 2 O, Cl 2 O 7 and HClO 4 .
Claim 5
Dependent Claim
46 words
A dry etching method as claimed in claim 1 characterized in that said compound containing Cl and O as component elements is at least one compound selected from the group consisting of ClO 2 , Cl 2 O, Cl 2 O 7 and HClO 4 .