Method for removal of photoresist over metal which also removes or inactivates corrosion-forming materials remaining from one or more previous metal etch steps

Claim 2

A dry process for removing, from an integrated circuit structure, photoresist remaining after one or more metal etch steps which process also removes or sufficiently inactivates chlorine-containing etch residues remaining from said previous one or more metal etch steps to provide at least 24 hours resistance to corrosion prior to removal of said inactivated chlorine-containing etch residues by wet processing, which dry process comprises: a) flowing, into a vacuum stripping chamber maintained at a pressure of from about 0.5 Torr to about 3 Torr and containing said integrated circuit structure, NH 3 gas for a period of at least about 30 seconds at a rate equivalent to flowing from about 1000 sccm to about 5000 sccm of said NH 3 gas into a 5 liter chamber; b) maintaining a plasma associated with said vacuum stripping chamber while said NH 3 gas is flowing into said stripping chamber; c) then flowing NH 3 and O 2 gases into said vacuum chamber at a rate equivalent to a flow of from about 0 sccm to about 100 sccm of NH 3 and from about 1000 sccm to about 5000 sccm of O 2 into a 5 liter chamber for an additional period of at least about 30 seconds; to thereby remove sad photoresist and also remove or sufficiently inactivate said chlorine-containing residues to provide said 24 hors of corrosion protection prior to wet processing to remove any remaining chlorine-containing residues.

Claim 3

The process of claim 1 wherein said plasma is maintained at a power level of from about 1200 watts to about 1500 watts during said process.

Claim 4

The process of claim 2 wherein said plasma is generated in a microwave plasma generator upstream of said stripping chamber and said gases flow through said plasma generator before entering said stripping chamber.

Claim 5

The process of claim 3 wherein said wafer is maintained at a temperature of from about 100° C. to about 400° C. during said process.

Claim 6

A dry process for removing, from an integrated circuit structure in a vacuum stripping chamber, photoresist remaining after a metal etch, which process also removes or inactivates chlorine-containing etch residues remaining from said previous metal etch, comprising: a) flowing through a microwave plasma generator, into said vacuum stripping chamber containing said integrated circuit structure, NH 3 gas for a period of at least about 30 seconds at a rate equivalent to flowing from about 1000 sccm to about 5000 sccm of said NH 3 gas into a 5 liter chamber; b) maintaining said integrated circuit structure within said vacuum stripping chamber at a temperature of from about 100° C. to about 400° C. during said process; c) maintaining said plasma in said microwave plasma generator during said process at a power level of from about 1200 watts to about 1500 watts; d) then flowing NH 3 and O 2 gases through said plasma generator into said vacuum chamber at a rate equivalent to a flow of from about 0 sccm to about 100 sccm of NH 3 and from about 1000 sccm to about 5000 sccm of O 2 into a 5 liter chamber for an additional time period of at least about 30 seconds; to thereby remove said photoresist and also remove or sufficiently inactivate said chlorine-containing residues to provide corrosion protection prior to subsequent wet processing within 24 hours to remove any remaining chlorine-containing residues.

Claim 7

A dry process for removing, from an integrated circuit structure in a vacuum stripping chamber, photoresist remaining after a metal etch, which process also removes or inactivates chlorine-containing etch residues remaining from said previous metal etch, comprising: a) flowing through a microwave plasma generator, into said vacuum stripping chamber containing said integrated circuit structure, NH 3 gas for a period of at least about 30 seconds at a rate equivalent to flowing from about 1000 sccm to about 5000 sccm of said NH 3 gas into a 5 liter chamber; b) maintaining said integrated circuit structure within said vacuum stripping chamber at a temperature of from about 100° C. to about 400° C. during said process; c) maintaining said plasma in said microwave plasma generator during said process at a power level of from about 1200 watts to about 1500 watts; d) then flowing NH 3 and O 2 gases through said plasma generator into said vacuum chamber at a rate equivalent to a flow of from about 0 sccm to about 100 sccm of NH 3 and from about 1000 sccm to about 5000 sccm of O 2 into a 5 liter chamber for an additional time period of at least about 30 seconds; to thereby remove said photoresist and also remove or sufficiently inactivate said chlorine-containing residues to provide corrosion protection prior to subsequent wet processing within 24 hours to remove any remaining chlorine-containing residues.

Claim 8

The process of claim 5 wherein said wafer is maintained at a temperature of from about 200° C. to about 300° C. during said process.

Claim 9

A dry process for removing from an integrated circuit structure on a semiconductor wafer maintained at a temperature of from about 100° C. to about 400° C., in a vacuum, stripping chamber, photoresist remaining after one or more metal etch steps with a chlorine-containing etchant, including an aluminum etch step, which process also removes or inactivates chlorine-containing etch residues remaining from said previous aluminum etch to provide up to 24 hours of protection from corrosion prior to subsequent wet processing to remove any remaining chlorine-containing residues which comprises: a) flowing NH 3 gas into said vacuum stripping chamber at a rate equivalent to a flow of from about 1000 sccm to about 5000 sccm into a 5 liter chamber to expose said structure to NH 3 for a period of at least about 30 seconds while maintaining a plasma in said stripping chamber maintained at a power level of from about 500 to about 1500 watts, and generated in a microwave plasma generator upstream of said vacuum stripping chamber; b) shutting off the flow of NH 3 into said chamber; and c) then flowing O 2 gas into said vacuum stripping chamber at a rate equivalent to a flow of from about 1000 sccm to about 5000 sccm into a 5 liter chamber to expose said structure to O 2 gas for a period of at least about 30 seconds while maintaining said plasma in said stripping chamber; whereby said photoresist will be removed and said chlorine-containing etch residues will be removed or sufficiently inactivated to provide at least 24 hours resistance to corrosion by remaining aluminum portions on said integrated circuit structure to thereby permit a time interval of up to 24 hours prior to removal of any remaining chlorine-containing residues by wet processing of said wafer.

Claim 10

A dry process for removing from an integrated circuit structure on a semiconductor wafer maintained at a temperature of from about 100° C. to about 400° C., in a vacuum, stripping chamber, photoresist remaining after one or more metal etch steps with a chlorine-containing etchant, including an aluminum etch step, which process also removes or inactivates chlorine-containing etch residues remaining from said previous aluminum etch to provide up to 24 hours of protection from corrosion prior to subsequent wet processing to remove any remaining chlorine-containing residues which comprises: a) flowing NH 3 gas into said vacuum stripping chamber at a rate equivalent to a flow of from about 1000 sccm to about 5000 sccm into a 5 liter chamber to expose said structure to NH 3 for a period of at least about 30 seconds while maintaining a plasma in said stripping chamber maintained at a power level of from about 500 to about 1500 watts, and generated in a microwave plasma generator upstream of said vacuum stripping chamber; b) shutting off the flow of NH 3 into said chamber; and c) then flowing O 2 gas into said vacuum stripping chamber at a rate equivalent to a flow of from about 1000 sccm to about 5000 sccm into a 5 liter chamber to expose said structure to O 2 gas for a period of at least about 30 seconds while maintaining said plasma in said stripping chamber; whereby said photoresist will be removed and said chlorine-containing etch residues will be removed or sufficiently inactivated to provide at least 24 hours resistance to corrosion by remaining aluminum portions on said integrated circuit structure to thereby permit a time interval of up to 24 hours prior to removal of any remaining chlorine-containing residues by wet processing of said wafer.

Claim 11

The process of claim 7 wherein said wafer is maintained at a temperature of from about 200° C. to about 300° C. during said process.

Claim 12

The process of claim 7 wherein said wafer is heated to said temperature range at a rate of about 10 ° C. per second.

Claim 13

The process of claim 7 wherein said stripping chamber is maintained at a pressure of from about 0.5 Torr to about 3 Torr during said process.

Claim 14

The process of claim 7 wherein said one or more metal etch steps further comprise the etching of a titanium-tungsten layer with said chlorine-containing etchant resulting in the formation of low volatility tungsten chloride residues which are not removed during said one or more metal etch steps, and said process removes or inactivates said low volatility tungsten chloride residues.