US5188979A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for forming a nitride layer using preheated ammonia
Assignee: NXP USA Inc
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Filing: 1991-08-26
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Granted: 1993-02-23
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Expires: 2011-08-26
Abstract
Abstract A process for forming a titanium nitride barrier layer in semiconductor devices using preheated ammonia reduces susceptibility to junction spiking. In one form of the invention, a substrate having an overlying layer of titanium is heated to a predetermined temperature in a reaction chamber. An ammonia gas is preheated to temperature not less than 600° C. and is introduced into the reaction chamber. The preheated ammonia gas and the titanium layer react to form a quality titanium nitride (TiN) layer which is highly resistant to the junction spiking phenomenon. Nitride layers of other Group IVB or Group VB elements of the periodic table may also be formed using the present invention.
Inventors
- 👤 Stanley M. Filipiak
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 08:03
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/032; H10W20/047; H10W20/048; H10P; H10P14/00; H10P14/40; H10P14/418; H10P14/60; H10P14/63; H10P14/6302; H10P14/6316
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
90 words
A method for fabricating a semiconductor device having a titanium nitride barrier layer using preheated ammonia, comprising the steps of: providing a substrate; depositing a layer of titanium on the substrate; placing the substrate in a reaction chamber; heating the substrate in the reaction chamber to a specified temperature; introducing an ammonia gas which is preheated to a temperature not less than 600° C. into the reaction chamber; and reacting the preheated ammonia gas with the layer of titanium on the heated substrate to form a titanium nitride barrier layer.
Claim 2
Independent Claim
90 words
A method for fabricating a semiconductor device having a titanium nitride barrier layer using preheated ammonia, comprising the steps of: providing a substrate; depositing a layer of titanium on the substrate; placing the substrate in a reaction chamber; heating the substrate in the reaction chamber to a specified temperature; introducing an ammonia gas which is preheated to a temperature not less than 600° C. into the reaction chamber; and reacting the preheated ammonia gas with the layer of titanium on the heated substrate to form a titanium nitride barrier layer.
Claim 3
Dependent Claim
29 words
The method of claim 1 wherein the step of introducing an ammonia gas comprises introducing an ammonia gas which is preheated to a temperature not less than 700° C.
Claim 4
Dependent Claim
40 words
The method of claim 1 wherein the step of reacting the preheated ammonia gas with the layer of titanium comprises reacting the preheated ammonia gas with the layer of titanium for a period of time not greater than 2 minutes.
Claim 5
Dependent Claim
24 words
The method of claim 1 wherein the step of heating the substrate comprises heating the substrate to a temperature not less than 600° C.
Claim 6
Independent Claim
87 words
A method for forming a nitride film, comprising the steps of: providing a substrate having an overlying layer of material selected from the group consisting of titanium, hafnium, zirconium, vanadium, niobium, and tantalum formed thereon; placing the substrate in a reaction chamber; heating the substrate in the reaction chamber to a specified temperature; introducing an ammonia gas which is preheated to a temperature not less than 600° C. into the reaction chamber; and reacting the preheated ammonia gas with the layer of material to form a nitride.
Claim 7
Independent Claim
87 words
A method for forming a nitride film, comprising the steps of: providing a substrate having an overlying layer of material selected from the group consisting of titanium, hafnium, zirconium, vanadium, niobium, and tantalum formed thereon; placing the substrate in a reaction chamber; heating the substrate in the reaction chamber to a specified temperature; introducing an ammonia gas which is preheated to a temperature not less than 600° C. into the reaction chamber; and reacting the preheated ammonia gas with the layer of material to form a nitride.
Claim 8
Dependent Claim
29 words
The method of claim 5 wherein the step of introducing an ammonia gas comprises introducing an ammonia gas which is preheated to a temperature not less than 700° C.
Claim 9
Dependent Claim
24 words
The method of claim 5 wherein the step of heating the substrate comprises heating the substrate to a temperature not less than 600° C.
Claim 10
Independent Claim
144 words
A method for fabricating a semiconductor device having a titanium nitride barrier layer using preheated ammonia, comprising the steps of: providing a silicon wafer; depositing a layer of titanium overlying the silicon wafer; heating the silicon wafer and the overlying layer of titanium to a temperature in excess of 600° C. in a reaction chamber; heating an ammonia gas in a vessel separate from the reaction chamber to a temperature greater than 700° C.; introducing the heated ammonia gas into the reaction chamber; reacting the heated ammonia gas and the overlying layer of titanium on the silicon wafer for a period of time not greater than two minutes to form a layer of titanium nitride on the overlying layer of titanium; and depositing a layer of material selected from the group consisting of aluminum and an aluminum alloy over the layer of titanium nitride.
Claim 11
Independent Claim
144 words
A method for fabricating a semiconductor device having a titanium nitride barrier layer using preheated ammonia, comprising the steps of: providing a silicon wafer; depositing a layer of titanium overlying the silicon wafer; heating the silicon wafer and the overlying layer of titanium to a temperature in excess of 600° C. in a reaction chamber; heating an ammonia gas in a vessel separate from the reaction chamber to a temperature greater than 700° C.; introducing the heated ammonia gas into the reaction chamber; reacting the heated ammonia gas and the overlying layer of titanium on the silicon wafer for a period of time not greater than two minutes to form a layer of titanium nitride on the overlying layer of titanium; and depositing a layer of material selected from the group consisting of aluminum and an aluminum alloy over the layer of titanium nitride.
Claim 12
Dependent Claim
55 words
The method of claim 8 wherein the step of depositing a layer of material selected from the group consisting of aluminum and an aluminum alloy comprises depositing a layer of material selected from the group consisting of aluminum and an aluminum alloy over, and at least partially in contact with, the layer of titanium nitride.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-02-23 | 1996-08-24 | 1997-02-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-02-23 | 2000-08-24 | 2001-02-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-02-23 | 2004-08-24 | 2005-02-23 | $7700.00 | Window Closed / Lapsed |