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US5187553A Expired / Lapsed US ⏱️ 0.0 years remaining

Avalanche photodiode having a thin multilayer superlattice structure sandwiched between barrier and well layers to reduce energy loss

Assignee: NEC Corp
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Filing: 1991-04-18
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Granted: 1993-02-16
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Expires: 2011-04-18
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Abstract

Abstract An avalanche photodiode includes an avalanche multiplication layer consisting of a superlattice multilayer structure in which a repeated thin multilayer of short-width well layers and short-width barrier layers is sandwiched between a well layer and a barrier layer. The width of the short-width well and barrier layers is preferably up to 100 Å. In such a structure, an ionization rate of electrons in the avalanche multiplication layer increases, so that the avalanche photodiode has low-noise and high speed response performances.

Inventors

  • 👤 Kikuo Makita

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-08 02:16
CPC Classifications
B; B82; B82Y; B82Y20/00; H; H10; H10F; H10F30/00; H10F30/20; H10F30/21; H10F30/22; H10F30/225; H10F30/2255; H10F77/00; H10F77/10; H10F77/14; H10F77/146

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 100 words
AN avalanche photodiode, comprising: a first semiconductor layer for a light absorbing layer; a second semiconductor layer for an avalanche multiplication layer, said second semiconductor layer comprising a superlattice multilayer structure in which each element layer consisting of alternately provided short-width well and barrier layers is sandwiched between a well layer and a barrier layer, wherein both said short-width well and barrier layers have a thickness of up to 100 Å; and first and second electrodes coupled to said avalanche photodiode for applying a predetermined voltage across a region of said avalanche photodiode including said first and second semiconductor layers.
Claim 2
Dependent Claim 100 words
AN avalanche photodiode, comprising: a first semiconductor layer for a light absorbing layer; a second semiconductor layer for an avalanche multiplication layer, said second semiconductor layer comprising a superlattice multilayer structure in which each element layer consisting of alternately provided short-width well and barrier layers is sandwiched between a well layer and a barrier layer, wherein both said short-width well and barrier layers have a thickness of up to 100 Å; and first and second electrodes coupled to said avalanche photodiode for applying a predetermined voltage across a region of said avalanche photodiode including said first and second semiconductor layers.
Claim 3
Dependent Claim 34 words
An avalanche photodiode, according to claim 1, wherein: a thickness of said short-width well layer becomes larger as the distance from said well layer becomes smaller, and becomes smaller as said distance becomes larger.
Claim 4
Dependent Claim 24 words
An avalanche photodiode, according to claim 1, wherein: said short-width well layer consists of InGaAs , and said short-width barrier layer consists of InAlAs.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-02-16 1996-08-17 1997-02-16 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-02-16 2000-08-17 2001-02-16 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-02-16 2004-08-17 2005-02-16 $7700.00 Window Closed / Lapsed

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