Single ended ultra-high vacuum chemical vapor deposition (uhv/cvd) reactor

Claim 1

An ultra-high vacuum chemical vapor deposition reactor, comprising, a hollow reactor tube made of quartz having an opening of a given diameter at one end and an opening having a diameter which is substantially smaller than said given diameter at the other end, which is the gas inlet end, a first metal tube in communication with said reactor tube at said one end, there being a first ultra-high vacuum seal intermediate said reactor tube and said first metal tube, said seal being of a given circumference, corresponding to said given diameter of said reactor tube at said one end, a metal gas inlet tube extending from said reactor tube at said gas inlet end, there being a second ultra-high vacuum seal between said reactor tube and the metal gas inlet tube, which second seal has a circumference which corresponds to the diameter of the reactor tube at said gas inlet end, said circumference of said second seal being substantially smaller than said given circumference of said first seal, a load chamber in communication with said first metal tube for supplying objects on which a substance is to be deposited, a valve means being disposed between said first metal tube and said load chamber, and ultra-high vacuum pumping means located only downstream of said reactor tube and communicating with said first metal tube between said reactor tube and said load chamber for pumping gas which enters through said gas inlet tube through said reactor tube.