Patent US2072312A successfully refreshed from Google Patents.
Patent US5169494A successfully refreshed from Google Patents.
US5169494A
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US
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Fine pattern forming method
Assignee: Panasonic Holdings Corp
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Filing: 1991-08-08
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Granted: 1992-12-08
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Expires: 2011-08-08
Abstract
Abstract The present invention provides a method of forming a fine pattern comprising the steps of forming on a semiconductor substrate an organic polymer film and heat treating it, forming on the organic polymer film an inorganic film and heat treating it, forming on the inorganic film an electron beam resist film and heat treating it, drawing a pattern on the resist film, developing it to form a resist pattern, and etching the inorganic film and the organic polymer film using the resist pattern as a mask, wherein the improvement comprises using one substance selected from the group consisting of a polyphenylene sulfide, a derivative thereof, and a polymer represented by the formula (I): ##STR1## where n is a positive integer, for forming at least one of the organic polymer film and the electron beam resist film. According to the present invention, it is possible to prevent charging by incident electrons, thereby keeping free of field butting and reduction of overlay accuracy, and to form an accurate and vertical fine resist pattern.
Inventors
- 👤 Kazuhiko Hashimoto
- 👤 Taichi Koizumi
- 👤 Kenji Kawakita
- 👤 Noboru Nomura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 04:56
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/094; G03F7/039
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
169 words
A method of forming a fine pattern comprising the steps of forming on a semiconductor substrate an organic polymer film and heat treating it, forming on the organic polymer film an inorganic film and heat treating it, forming on the inorganic film an electron beam resist film and heat treating it, drawing a pattern on the resist film, developing it to form a resist pattern, and etching the inorganic film and the organic polymer film using the resist pattern as a mask, wherein the improvement comprises using one conducting polymer selected from the group consisting of (A) homopolymers of polyphenylene sulfide and its derivatives, including poly-p-phenylene sulfides and derivatives thereof represented by formula (II); ##STR9## and poly-m-phenylene sulfides and derivatives thereof represented by formula (III), ##STR10## and (B) polymers represented by the formula (I): ##STR11## where R 1 and R 2 independently represent hydrogen or an alkyl group, and n is a positive integer, as at least one of the organic polymer film and the electron beam resist film.
Claim 2
Independent Claim
169 words
A method of forming a fine pattern comprising the steps of forming on a semiconductor substrate an organic polymer film and heat treating it, forming on the organic polymer film an inorganic film and heat treating it, forming on the inorganic film an electron beam resist film and heat treating it, drawing a pattern on the resist film, developing it to form a resist pattern, and etching the inorganic film and the organic polymer film using the resist pattern as a mask, wherein the improvement comprises using one conducting polymer selected from the group consisting of (A) homopolymers of polyphenylene sulfide and its derivatives, including poly-p-phenylene sulfides and derivatives thereof represented by formula (II); ##STR9## and poly-m-phenylene sulfides and derivatives thereof represented by formula (III), ##STR10## and (B) polymers represented by the formula (I): ##STR11## where R 1 and R 2 independently represent hydrogen or an alkyl group, and n is a positive integer, as at least one of the organic polymer film and the electron beam resist film.
Claim 3
Dependent Claim
36 words
A method of forming a fine pattern according to claim 1, wherein the at least one of the organic polymer film and the electron beam resist film is composed of polyphenylene sulfide or a derivative thereof.
Claim 4
Dependent Claim
51 words
A method of forming a fine pattern according to claim 2, wherein the polyphenylene sulfide or the derivative thereof is poly-p-phenylene sulfide or a derivative thereof represented by the formula (II): ##STR12## where R 1 and R 2 independently represent hydrogen or an alkyl group, and n is a positive integer.
Claim 5
Dependent Claim
51 words
A method of forming a fine pattern according to claim 2, wherein the polyphenylene sulfide or the derivative thereof is poly-m-phenylene sulfide or a derivative thereof represented by the formula (III): ##STR13## where R 1 and R 2 independently represent hydrogen or an alkyl group, and n is a positive integer.
Claim 6
Dependent Claim
26 words
A method of forming a fine pattern according to claim 3, wherein the electron beam resist film is composed of poly-p-phenylene sulfide or a derivative thereof.
Claim 7
Dependent Claim
26 words
A method of forming a fine pattern according to claim 4, wherein the electron beam resist film is composed of poly-m-phenylene sulfide or a derivative thereof.
Claim 8
Dependent Claim
27 words
A method of forming a fine pattern according to claim 1, wherein the electron beam resist film is composed of a polymer represented by the formula (I).
Claim 9
Dependent Claim
26 words
A method of forming a fine pattern according to claim 4, wherein the organic polymer film is composed of a polyphenylene sulfide or a derivative thereof.
Claim 10
Dependent Claim
26 words
A method of forming a fine pattern according to claim 1, wherein the organic polymer film is composed of a polymer represented by the formula (I).
Claim 11
Dependent Claim
43 words
A method of forming a fine pattern according to claim 1, wherein the organic polymer film is composed of a polyphenylene sulfide, a derivative thereof or a polymer represented by the formula (I), and it is doped with ions after a heat treatment.
Claim 12
Dependent Claim
44 words
A method of forming a fine pattern according to claim 1, wherein the electron beam resist film is composed of a polyphenylene sulfide, a derivative thereof or a polymer represented by the formula (I), and it is doped with ions after a heat treatment.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1995-12-08 | 1996-06-08 | 1996-12-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-12-08 | 2000-06-08 | 2000-12-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-12-08 | 2004-06-08 | 2004-12-08 | $7700.00 | Window Closed / Lapsed |