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US5168329A Expired / Lapsed US ⏱️ 0.0 years remaining

Microwave semiconductor device capable of controlling a threshold voltage

Assignee: Sumitomo Electric Industries Ltd
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Filing: 1991-10-28
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Granted: 1992-12-01
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Expires: 2011-10-28
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Abstract

Abstract A microwave semiconductor device of this invention is made by arranging a plurality of active regions of Schottky barrier FET on a single semiconductor substrate in a common gate width direction, and gate electrodes are linearly connected to each other. Side-gate electrodes each formed by an ohmic metal are arranged on the semiconductor substrate between adjacent active regions. In this portion, a gate wiring layer is arranged so as to cross over each side-gate electrode. With this arrangement, a sufficient side gate effect on the entire FET having gate electrodes connected to have a large length, can be obtained, and a threshold voltage can be controlled after manufacturing.

Inventors

  • 👤 Nobuo Shiga

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 13:42
CPC Classifications
H; H10; H10D; H10D62/00; H10D62/10; H10D62/17; H10D62/351; H10D62/357; H10D64/00; H10D64/20; H10D64/27; H10D64/311; H10D64/411

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 227 words
A semiconductor device having a Schottky barrier FET, said FET comprising: a semiconductor device substrate; a source region formed on said substrate, said source region comprising a plurality of first regions; a drain region formed on said substrate, said drain region comprising a plurality of second regions, said second regions corresponding with said first regions to form a plurality of active regions; a plurality of gate regions, each of said gate regions being disposed in one of said active regions between said first region of said source region and said second regions of said drain region forming said one of said active regions; a gate electrode comprising a plurality of sections and a plurality of coupling segments, each of said sections being formed on a different one of said gate regions, said gate regions being adjacent to each other, each of said sections being electrically coupled to each section on each adjacent gate region by one of said coupling segments; and a plurality of control electrodes for controlling a threshold voltage of said FET, a portion of each of said control electrodes being associated with only one of said active regions, said portion being formed on said substrate under one of said coupling segments at a predetermined distance away from said active region associated with said portion, each of said control electrodes extending outward from said substrate.
Claim 2
Dependent Claim 227 words
A semiconductor device having a Schottky barrier FET, said FET comprising: a semiconductor device substrate; a source region formed on said substrate, said source region comprising a plurality of first regions; a drain region formed on said substrate, said drain region comprising a plurality of second regions, said second regions corresponding with said first regions to form a plurality of active regions; a plurality of gate regions, each of said gate regions being disposed in one of said active regions between said first region of said source region and said second regions of said drain region forming said one of said active regions; a gate electrode comprising a plurality of sections and a plurality of coupling segments, each of said sections being formed on a different one of said gate regions, said gate regions being adjacent to each other, each of said sections being electrically coupled to each section on each adjacent gate region by one of said coupling segments; and a plurality of control electrodes for controlling a threshold voltage of said FET, a portion of each of said control electrodes being associated with only one of said active regions, said portion being formed on said substrate under one of said coupling segments at a predetermined distance away from said active region associated with said portion, each of said control electrodes extending outward from said substrate.
Claim 3
Dependent Claim 39 words
A semiconductor device according to claim 1 further comprising at least two supplying electrodes extending from at least two different positions of said gate electrode, said supplying electrodes being adapted to be electrically coupled to a common external electrode.
Claim 4
Dependent Claim 22 words
A semiconductor device according to claim 1, further comprising a control pad, said control electrodes being electrically coupled to said control pad.
Claim 5
Dependent Claim 16 words
A semiconductor device according to claim 1, wherein said semiconductor device is a microwave semiconductor device.
Claim 6
Dependent Claim 22 words
A semiconductor device according to claim 1, wherein each of said coupling segments of said gate electrode is an air bridge structure.

References Cited (Backward Citations)

FR2526584A1 Cited
US4549197A Cited
US4982247A Cited
JPS6362384A Cited
JPS6388844A Cited
JPS63211771A Cited
US4977434A Cited
US4974039A Cited
EP0427187A2 Cited
US5070376A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-12-01 1996-06-01 1996-12-01 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-12-01 2000-06-01 2000-12-01 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-12-01 2004-06-01 2004-12-01 $7700.00 Window Closed / Lapsed

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