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US5158823A
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Second harmonic wave generating device
Assignee: IBIDE Co Ltd A Corp OF JAPAN
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Filing: 1991-06-24
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Granted: 1992-10-27
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Expires: 2011-06-24
Abstract
Abstract A second harmonic wave generating device comprises a LiTaO 3 thin film formed on a LiNbO 3 substrate and a LiNbO 3 thin film waveguide layer formed in the LiTaO 3 thin film. The thickness (T(μm)) of the LiNbO 3 thin film waveguide layer, an ordinary refractive index (η oS1 ) of the LiTaO 3 thin film at a fundamental wavelength (λ(μm)), an ordinary refractive index (η oF1 ) of the LiNbO 3 thin film waveguide layer at the fundamental wavelength (λ(μm)), an extraordinary refractive index (η eS2 ) of the LiTaO 3 thin film at a second harmonic wavelength (λ/2, (μm)) and an extraordinary refractive index (η eF2 ) of the LiNbO 3 thin film waveguide layer at the second harmonic wavelength (λ/2, (μm)) are individually within the following specific values: λ=0.68 to 0.94 μm T=0.1 to 20 μm η oF1 =2.22 to 2.38 η oS1 =2.10 to 2.25 η eF2 =2.24 to 2.42 η eS2 =2.22 to 2.38.
Inventors
- 👤 Ryo Enomoto
- 👤 Masaya Yamada
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 13:58
CPC Classifications
G; G02; G02F; G02F1/00; G02F1/35; G02F1/37; G02F1/377; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24942; Y10T428/2495; Y10T428/24967; Y10T428/24975
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
163 words
A second harmonic wave generating device comprising a LiTaO 3 thin film formed on a LiNbO 3 substrate and a LiNbO 3 thin film waveguide layer formed on said LiTaO 3 thin film, a fundamental laser wavelength (λμm), a thickness (Tμm) of said LiNbO 3 thin film waveguide layer, an ordinary refractive index (n OS1 ) of said LiTaO 3 thin film at the fundamental wavelength (λμm), an ordinary refractive index (n OF1 ) of said LiNbO 3 thin film waveguide layer at the fundamental wavelength (λμm), an extraordinary refractive index (n eS2 ) of said LiTaO 3 thin film at a second harmonic wavelength (λμm/2), and an extraordinary refractive index (n eF2 ) of said LiNbO 3 thin film waveguide layer at the second harmonic wavelength (λμm/2) being individually within the following specific values: λ=0.68 to 0.94 μm T=0.1 to 20 μm n OF1 =2.22 to 2.38 n OS1 =2.10 to 2.25 n eF2 =2.24 to 2.42 n eS2 =2.22 to 2.38.
Claim 2
Dependent Claim
163 words
A second harmonic wave generating device comprising a LiTaO 3 thin film formed on a LiNbO 3 substrate and a LiNbO 3 thin film waveguide layer formed on said LiTaO 3 thin film, a fundamental laser wavelength (λμm), a thickness (Tμm) of said LiNbO 3 thin film waveguide layer, an ordinary refractive index (n OS1 ) of said LiTaO 3 thin film at the fundamental wavelength (λμm), an ordinary refractive index (n OF1 ) of said LiNbO 3 thin film waveguide layer at the fundamental wavelength (λμm), an extraordinary refractive index (n eS2 ) of said LiTaO 3 thin film at a second harmonic wavelength (λμm/2), and an extraordinary refractive index (n eF2 ) of said LiNbO 3 thin film waveguide layer at the second harmonic wavelength (λμm/2) being individually within the following specific values: λ=0.68 to 0.94 μm T=0.1 to 20 μm n OF1 =2.22 to 2.38 n OS1 =2.10 to 2.25 n eF2 =2.24 to 2.42 n eS2 =2.22 to 2.38.
Claim 3
Dependent Claim
88 words
The second harmonic wave generating device of claim 1 wherein the thickness (Tμm) of said LiNbO 3 thin film waveguide layer, the ordinary refractive index (n OF1 ) of said LiNbO 3 thin film waveguide layer at the fundamental wavelength (λμm), the extraordinary refractive index (n eS2 ) of said LiTaO 3 thin film at the second harmonic wavelength (λμm/2), and the extraordinary refractive index (n eF2 ) of said LiNbO 3 thin film waveguide layer at the second harmonic wavelength (λμm/2) are represented by Equation (α) ##EQU8##
Claim 4
Dependent Claim
32 words
The second harmonic wave generating device of claim 1 wherein incident angle (θ) of said fundamental wave to the optical axis (Z-axis) of said thin film waveguide layer is 0°±15° or 90°±15°.
Claim 5
Dependent Claim
19 words
The second harmonic wave generating device of claim 1 wherein said LiNbO 3 substrate is an optical-grade single crystal.
Claim 6
Dependent Claim
19 words
The second harmonic wave generating device of claim 1 wherein said fundamental wavelength (λμm) is 0.78 to 0.86 μm.
Claim 7
Dependent Claim
25 words
The second harmonic wave generating device of claim 1 wherein said LiNbO 3 thin film waveguide layer has a thickness of 0.4 to 8 μm.
Claim 8
Dependent Claim
23 words
The second harmonic wave generating device of claim 1 wherein said LiTaO 3 thin film has a thickness of 0.2 to 30 μm.
Claim 9
Dependent Claim
33 words
The second harmonic wave generating device of claim 1 wherein said LiNbO 3 waveguide layer contains at least one element selected from the group consisting of Na, Cr, Mg, Ni, Ti, and V.
Claim 10
Dependent Claim
33 words
The second harmonic wave generating device of claim 1 wherein said LiTaO 3 thin film contains at least one element selected from the group consisting of Na, Cr, Mg, Ni, Ti, and V.
Claim 11
Dependent Claim
21 words
The second harmonic wave generating device of claim 1 of a channel type having a width of 1 to 10 μm.
Claim 12
Dependent Claim
19 words
The second harmonic wave generating device of claim 1 further comprising a wavelength-selective filter formed at the output side.
Claim 13
Dependent Claim
24 words
The second harmonic wave generating device of claim 11 wherein said wavelength-selective filter is formed directly on a second harmonic wave outputting end surface.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1995-10-27 | 1996-04-27 | 1996-10-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-10-27 | 2000-04-27 | 2000-10-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-10-27 | 2004-04-27 | 2004-10-27 | $7700.00 | Window Closed / Lapsed |