Abstract An apparatus for forming a deposited film of large area comprised of a plurality of constituents, in which two film-forming raw material gases are respectively activated by a decomposing energy in respective activation chambers. The thus activated gases are introduced respectively for mixing via respective gas introducing ports into a film-forming chamber wherein the activated gases are caused to react with each other near the surface of a substrate disposed in the film-forming chamber, thereby forming said deposited film on the substrate. Each of the gas introducing ports has a rectangular or elliptic shape with the length of the longer axis being at least twice that of the shorter axis, and the gas introducing ports are disposed in parallel with each other at a distance less than the length of the shorter axis thereof. A rod-like microwave transmission antenna, a filament made of a metallic material capable of exhibiting a catalytic effect or a pair of plate-like electrodes for generating RF electric field are disposed in each of the activation chambers as the means for generating the decomposing energy.
An apparatus for forming a functional deposited film on the surface of a substrate by way of plasma reaction among activated gases formed separately from at least two film-forming raw material gases, said apparatus comprising: (a) a film-forming chamber having a substrate holder provided with means for heating said substrate disposed on the surface of said substrate holder; and (b) at least two activation chambers, each said activation chamber being provided with (i) means for supplying a film-forming raw material gas thereinto; (ii) means for decomposing said film-forming raw material gas; (iii) a filament made of a metallic material capable of exhibiting a catalytic effect to activate said film-forming raw material gas into a plasma state upon application of an electric power thereto, the activated gases being transported in a direction perpendicular to the direction of the longer axis of said filament; and (iv) a gas introduction port for introducing the activated gaseous material into said film-forming chamber, each said gas introduction port having (iv-a) an opening near t he surface of said substrate; (iv-b) a rectangular or elliptic shape with the length of the longer axis being at least twice the length of the shorter axis and (iv-c) a position parallel to each other at a distance less than the length of the shorter axis.
Claim 2
Independent Claim
216 words
An apparatus for forming a functional deposited film on the surface of a substrate by way of plasma reaction among activated gases formed separately from at least two film-forming raw material gases, said apparatus comprising: (a) a film-forming chamber having a substrate holder provided with means for heating said substrate disposed on the surface of said substrate holder; and (b) at least two activation chambers, each said activation chamber being provided with (i) means for supplying a film-forming raw material gas thereinto; (ii) means for decomposing said film-forming raw material gas; (iii) a filament made of a metallic material capable of exhibiting a catalytic effect to activate said film-forming raw material gas into a plasma state upon application of an electric power thereto, the activated gases being transported in a direction perpendicular to the direction of the longer axis of said filament; and (iv) a gas introduction port for introducing the activated gaseous material into said film-forming chamber, each said gas introduction port having (iv-a) an opening near t he surface of said substrate; (iv-b) a rectangular or elliptic shape with the length of the longer axis being at least twice the length of the shorter axis and (iv-c) a position parallel to each other at a distance less than the length of the shorter axis.
Claim 3
Dependent Claim
29 words
The apparatus according to claim 1, further comprising means for moving said substrate in a direction perpendicular to the longer axis of each of the said gas introduction port.