US5143750A
Expired / Lapsed
US
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Method of manufacturing chemically adsorbed film
Assignee: Panasonic Holdings Corp
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Filing: 1991-12-19
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Granted: 1992-09-01
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Expires: 2011-12-19
Abstract
Abstract According to the invention, a chemically adsorbing material is reacted with a substrate surface having active hydrogen groups by dipping the substrate into a solution of the chemically adsorbing material simultaneous and applying ultrasonic waves to the solution. In this way, a high concentration monomolecular and/or polymer film substantially free from pin holes can be formed in a short period of time. That is, while the ultrasonic waves are applied, a chemical adsorbing material having an end functional chlorosilyl group is adsorbed onto the substrate surface, thereby forming a chemically adsorbed monomolecular and/or polymer film. The frequency of the ultrasonic waves are suitably in a range of 25 to 50 kHz. In addition, after formation of the adsorbed film, the substrate is washed for making monomolecular film by dipping it in a washing solution while applying ultrasonic waves. In this way, non-reacted chemical adsorbing material remaining on the substrate can be efficiently washed away.
Inventors
- 👤 Yoshikazu Yamagata
- 👤 Norihisa Mino
- 👤 Kazufumi Ogawa
- 👤 Mamoru Soga
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 20:26
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/68; H10P14/683; B; B05; B05D; B05D1/00; B05D1/18; B05D1/185; B82; B82Y; B82Y30/00; B82Y40/00; C; C03; C03C; C03C17/00; C03C17/28; C03C17/30; C04; C04B; C04B41/00; C04B41/009; C04B41/45; C04B41/4505; C04B41/46; C04B41/49; C04B41/4905; C04B41/4922; C04B41/80; C04B41/81; C04B41/82; C04B41/84; C09; C09D; C09D4/00; H10P14/63; H10P14/6326; H10P14/6342; H10P14/65; H10P14/6516; H10P14/6528; H10P14/69; H10P14/692; H10P14/6921; H10P14/6922
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
110 words
A method of forming a chemically adsorbed monomolecular film on the surface of a substrate, wherein the surface of the substrate contains active hydrogen groups, the method comprising: (A) preparing a chemical adsorbing material solution by dissolving a chemical adsorbing material in a non-aqueous organic solvent, said chemical adsorbing material having end functional molecular groups capable of reacting with the active hydrogen groups on the substrate surface; (B) dipping the substrate in said chemical adsorbing material solution and applying ultrasonic waves, thereby causing adsorption of the chemical adsorbing material to the substrate surface; and (C) washing non-reacted chemical adsorbing material away from the substrate surface using a non-aqueous organic solution.
Claim 2
Independent Claim
110 words
A method of forming a chemically adsorbed monomolecular film on the surface of a substrate, wherein the surface of the substrate contains active hydrogen groups, the method comprising: (A) preparing a chemical adsorbing material solution by dissolving a chemical adsorbing material in a non-aqueous organic solvent, said chemical adsorbing material having end functional molecular groups capable of reacting with the active hydrogen groups on the substrate surface; (B) dipping the substrate in said chemical adsorbing material solution and applying ultrasonic waves, thereby causing adsorption of the chemical adsorbing material to the substrate surface; and (C) washing non-reacted chemical adsorbing material away from the substrate surface using a non-aqueous organic solution.
Claim 3
Dependent Claim
34 words
The method of manufacturing a chemically adsorbed monomolecular film according to claim 1, wherein an ultrasonic waves are applied to said organic solution during the step of washing away said non-reacted chemically adsorbing material.
Claim 4
Dependent Claim
31 words
The method of manufacturing a chemically adsorbed monomolecular film according to claim 1 or 2, wherein the frequency of said ultrasonic waves are in a range of 1 to 1,000 kHz.
Claim 5
Dependent Claim
79 words
The method of manufacturing a chemically adsorbed monomolecular film according to claim 1, wherein said molecular groups of said chemical adsorbing material comprise at least one member selected from the group consisting of a halogenated silyl (--SiX) group, a halogenated titanyl (--TiX) group, a halogenated stannyl (--SnX) group, a lower-alkoxysilyl (--SiOR) group, a lower-alkoxytitanyl (--TiOR) group and a lower-alkoxystannyl (--SnOR) group, where X represents chlorine, bromine, fluorine or iodine and R represents a C 1 -C 6 alkly group.
Claim 6
Dependent Claim
29 words
The method of manufacturing a chemically adsorbed monomolecular film according to claim 1, wherein said chemical adsorbing material comprises an end functional chlorosilyl (--SiCl) group and a fluorine group.
Claim 7
Dependent Claim
37 words
The method of manufacturing a chemically adsorbed monomolecular film according to claim 1, wherein the concentration of said chemical adsorbing material in said non-aqueous organic solvent is in a range of 10 -4 to 10 -` mol/l.
Claim 8
Dependent Claim
30 words
The method of manufacturing a chemically adsorbed monomolecular film according to claim 1, wherein the substrate comprises material selected from the group consisting of glass, metals, ceramics, plastics and semiconductors.
Claim 9
Dependent Claim
22 words
The method of manufacturing a chemically adsorbed monomolecular film according to claim 1, wherein the substrate is an oxidation treated plastic substrate.
Claim 10
Independent Claim
127 words
A method of forming a chemically adsorbed polymer film on the surface of a substrate, wherein the surface of the substrate contains active hydrogen groups, the method comprising: (a) preparing a chemical adsorbing material solution by dissolving a chemical adsorbing material in a non-aqueous organic solvent, said chemical adsorbing material having end functional molecular groups capable of reacting with the active hydrogen groups on the substrate surface; (b) dipping the substrate in said chemical adsorbing material solution and applying ultrasonic waves, thereby causing adsorption of the chemical adsorbing material to the substrate surface; (c) forming on the substrate adsorbed precursor film constituted by a compound containing a silanol group by reacting the chlorosilane groups with water after the dipping step; and (d) drying said adsorbed precursor film.
Claim 11
Independent Claim
127 words
A method of forming a chemically adsorbed polymer film on the surface of a substrate, wherein the surface of the substrate contains active hydrogen groups, the method comprising: (a) preparing a chemical adsorbing material solution by dissolving a chemical adsorbing material in a non-aqueous organic solvent, said chemical adsorbing material having end functional molecular groups capable of reacting with the active hydrogen groups on the substrate surface; (b) dipping the substrate in said chemical adsorbing material solution and applying ultrasonic waves, thereby causing adsorption of the chemical adsorbing material to the substrate surface; (c) forming on the substrate adsorbed precursor film constituted by a compound containing a silanol group by reacting the chlorosilane groups with water after the dipping step; and (d) drying said adsorbed precursor film.
Claim 12
Dependent Claim
29 words
The method of manufacturing a chemically adsorbed polymer film according to claim 9, wherein the frequency of said ultrasonic waves are in a range of 1 to 1,000 kHz.
Claim 13
Dependent Claim
79 words
The method of manufacturing a chemically adsorbed polymer film according to claim 9, wherein said molecular groups of said chemical adsorbing material comprise at least one member selected from the group consisting of a halogenated silyl (--SiX) group, a halogenated titanyl (--TiX) group, a halogenated stannyl (--SnX) group, a lower-alkoxysilyl (--SiOR) group, a lower-alkoxytitanyl (--TiOR) group and a lower-alkoxystannyl (--SnOR) group, where X represents chlorine, bromine, fluorine or iodine and R represents a C 1 -C 6 alkyl group.
Claim 14
Dependent Claim
29 words
The method of manufacturing a chemically adsorbed polymer film according to claim 9, wherein said chemical adsorbing material comprises an end functional chlorosilyl (--SiCl) group and a fluorine group.
Claim 15
Dependent Claim
37 words
The method of manufacturing a chemically adsorbed polymer film according to claim 9, wherein the concentration of said chemical adsorbing material in said non-aqueous organic solvent is in a range of 10 -4 to 10 -1 mol/l.
Claim 16
Dependent Claim
30 words
The method of manufacturing a chemically adsorbed polymer film according to claim 9, wherein the substrate comprises material selected from the group consisting of glass, metals, ceramics, plastics and semiconductors.
Claim 17
Dependent Claim
22 words
The method of manufacturing a chemically adsorbed polymer film according to claim 9, wherein the substrate is an oxidation treated plastic substrate.
References Cited (Backward Citations)
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