Patent US1661045A successfully refreshed from Google Patents.
Patent US4143977A successfully refreshed from Google Patents.
Patent US1782929A successfully refreshed from Google Patents.
Patent US5127989A successfully refreshed from Google Patents.
US5127989A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of forming a thin film pattern with a trapezoidal cross section
Assignee: Toshiba Corp
•
Filing: 1991-05-13
•
Granted: 1992-07-07
•
Expires: 2011-05-13
Abstract
Abstract The present invention provides a method of forming a thin film pattern with a trapezoidal cross section. In this method, a resist pattern with an inverted-trapezoidal cross section is formed on a thin film. Using the resist pattern with the inverted-trapezoidal cross section as a mask, the thin film is dry-etched. A resist pattern is left with the resist pattern used as a mask. The resist pattern has a trapezoidal cross section.
Inventors
- 👤 Hiroshi Haraguchi
- 👤 Hitoshi Tsuji
- 👤 Yasuto Otani
- 👤 Kuniaki Kumamaru
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 11:16
CPC Classifications
H; H10; H10D; H10D1/00; H10D1/40; H10D1/47; G; G03; G03F; G03F7/00; G03F7/20; G03F7/2022; G03F7/26; G03F7/38; H10D64/00; H10D64/01; H10D64/013; H10D64/01302; H10D64/01304; H10D64/01324; H10P; H10P50/00; H10P50/20; H10P50/26; H10P50/264; H10P50/266; H10P50/71; H10P50/73; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; H10P76/40
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
62 words
A method of forming a thin film pattern, comprising the steps of: forming a thin film on a major surface of a substrate; forming a resist pattern, which has an inverted-trapezoidal cross section, on the thin film; and dry-etching the thin film selectively, with the resist pattern having the inverted-trapezoidal cross section employed as a mask, thereby forming a thin film pattern.
Claim 2
Independent Claim
62 words
A method of forming a thin film pattern, comprising the steps of: forming a thin film on a major surface of a substrate; forming a resist pattern, which has an inverted-trapezoidal cross section, on the thin film; and dry-etching the thin film selectively, with the resist pattern having the inverted-trapezoidal cross section employed as a mask, thereby forming a thin film pattern.
Claim 3
Dependent Claim
13 words
The method according to claim 1, wherein the dry etching is isotropic etching.
Claim 4
Dependent Claim
12 words
The method according to claim 2, wherein the isotropic etching is RIE.
Claim 5
Dependent Claim
34 words
The method according to claim 3, wherein the RIE is performed with use of a parallel-plate reactor capable of independently controlling the temperature of an upper electrode and the temperature of a lower electrode.
Claim 6
Dependent Claim
125 words
The method according to claim 1, wherein the resist pattern having an inverted-trapezoidal cross section is obtained by the steps of: forming a resist film on the thin film; exposing the resist film selectively, and forming a photo-sensitized region in the resist film, the photo-sensitized region being soluble in a developing liquid; subjecting the resist film having the photo-sensitized region to heat treatment, thereby producing a substance in the photo-sensitized region, which substance is soluble in the developing liquid; exposing the total surface of the resist film and forming another photo-sensitized region, which is soluble in the developing liquid, in those regions of the resist film which are other than the photo-sensitized region; and removing said other photo-sensitized region by use of the developing liquid.
Claim 7
Dependent Claim
58 words
The method according to claim 5, wherein the resist film formed on the thin film is a novolak-based positive resist; and the step of subjecting the resist film having the photo-sensitized region to heat treatment, thereby producing a substance in the photo-sensitized region, which substance is soluble in the developing liquid, is carried out in an ammonia atmosphere.
Claim 8
Dependent Claim
15 words
The method according to claim 5, wherein the resist film is an image reverse resist.
Claim 9
Dependent Claim
18 words
The method according to claim 1, wherein the resist film formed on the thin film contains a dye.
Claim 10
Dependent Claim
13 words
The method according to claim 8, wherein said dye is an azo dye.
Claim 11
Dependent Claim
26 words
The method according to claim 1, wherein the cross-sectional shape of the thin film pattern is determined by controlling the cross-sectional shape of the resist pattern.
Claim 12
Dependent Claim
50 words
The method according to claim 10, wherein the cross-sectional shape of the resist pattern is determined by controlling the quantity of exposure light in the step of exposing the resist film selectively, and forming a photo-sensitized region in the resist film, which photo-sensitized region is soluble in a developing liquid.
Claim 13
Dependent Claim
32 words
The method according to claim 10, wherein the cross-sectional shape of the resist pattern is determined by adding a dye to the resist film and controlling the quantity of the added dye.
Claim 14
Dependent Claim
70 words
The method according to claim 1, wherein the cross-sectional shape of the thin film pattern is determined such that the dry etching is performed by RIE, the RIE is carried out by use of a parallel-plate reactor capable of independently controlling the temperature of an upper electrode and the temperature of a lower electrode, and a temperature difference, which is caused between the upper electrode and lower electrode, is controlled.
References Cited (Backward Citations)
EP0057738A2
Cited
US4378383A
Cited
DE3615519A1
Cited
US4764245A
Cited
US5007984A
Cited
US5007982A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-07-07 | 1996-01-06 | 1996-07-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-07-07 | 2000-01-06 | 2000-07-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-07-07 | 2004-01-06 | 2004-07-07 | $7700.00 | Window Closed / Lapsed |