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Patent US5108983A successfully refreshed from Google Patents.
US5108983A
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Method for the rapid deposition with low vapor pressure reactants by chemical vapor deposition
Assignee: Georgia Tech Research Corp
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Filing: 1989-11-21
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Granted: 1992-04-28
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Expires: 2009-11-21
Abstract
Abstract A method for applying coatings to substrates using chemical vapor deposition with low vapor pressure reagents is disclosed which comprises the steps of: (a) placing a substrate in a furnace means; (b) directly introducing powder reagents by a powder feeder means into said furnace means; and (c) vaporizing and reacting said reagents within said furnace means resulting in the deposition from the vapor phase of a coating on said substrate, wherein said coating can be an oxide superconductor.
Inventors
- 👤 Walter J. Lackey, Jr.
- 👤 E. Kent Barefield
- 👤 William B. Carter
- 👤 John A. Hanigofsky
- 👤 David N. Hill
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 04:42
CPC Classifications
B; B05; B05D; B05D1/00; B05D1/60; C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/40; C23C16/408; C23C16/44; C23C16/448; C23C16/4481; C23C16/4485; C23C16/4486; H; H10; H10N; H10N60/00; H10N60/01; H10N60/0268; H10N60/0296; H10N60/0576; H10N60/0632; Y; Y10; Y10S; Y10S505/00; Y10S505/70; Y10S505/701; Y10S505/702; Y10S505/704; Y10S505/725; Y10S505/73; Y10S505/734; Y10S505/737
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
104 words
A method for applying coatings to substrates using chemical vapor deposition in which low vapor pressure reagents are used comprising the steps of: (a) providing a substrate; (b) selecting a quantity of one or more powder reagents; (c) providing a furnace means; (d) providing a powder feeder means for introducing said reagent of reagents into said furnace means; (e) placing said substrate within said furnace means; (f) introducing said powder reagent or reagents into said furnace means; and (g) vaporizing and reacting said reagent or reagents within said furnace means resulting in the deposition from the vapor phase of a coating on said substrate.
Claim 2
Independent Claim
104 words
A method for applying coatings to substrates using chemical vapor deposition in which low vapor pressure reagents are used comprising the steps of: (a) providing a substrate; (b) selecting a quantity of one or more powder reagents; (c) providing a furnace means; (d) providing a powder feeder means for introducing said reagent of reagents into said furnace means; (e) placing said substrate within said furnace means; (f) introducing said powder reagent or reagents into said furnace means; and (g) vaporizing and reacting said reagent or reagents within said furnace means resulting in the deposition from the vapor phase of a coating on said substrate.
Claim 3
Dependent Claim
63 words
A method for coating substrates as described in claim 1 wherein said substrate is selected from the group consisting of single crystal magnesium oxide, single crystal aluminum oxide, single crystal strontium titanate, single crystal zirconia, polycrystalline zirconia, zirconia tape, planar polycrystalline aluminum oxide, aluminum oxide fiber, silica fiber, mullite-like fiber, and aluminum oxide, zirconium oxide and metal tapes wire, cavities, and multi-filament tows.
Claim 4
Dependent Claim
27 words
The method for coating substrates as described in claim 1, wherein said reagents are selected from the group consisting of beta-diketonates, fluorinated beta-diketonates, acetylacetonate, acetate, and halides.
Claim 5
Dependent Claim
20 words
The method for coating substrates as described in claim 1, wherein said furnace means is a chemical vapor deposition reactor.
Claim 6
Dependent Claim
40 words
The method for coating substrates as described in claim 1, further comprising the step of entraining said reagents in a carrier gas which transports said reagents into said furnace means; wherein said entrainment step occurs immediately prior to step (f).
Claim 7
Dependent Claim
22 words
A method for coating substrates as claimed in claim 1, said coating further including constituents from the gas introduced with said reagents.
Claim 8
Dependent Claim
25 words
The method for coating substrates as described in claim 1, wherein said solid powder consists of particles having a diameter of less than 44 microns.
Claim 9
Dependent Claim
27 words
The method for coating substrates as described in claim 2, wherein said substrate is selected from the group consisting of planar, fiber, tape, cavity and electronic substrates.
Claim 10
Dependent Claim
98 words
The method for coating substrates as described in claim 3, wherein said coating is selected from the group consisting of YBa 2 Cu 3 O x , Sr 2 CuO 6 , Ca 2 CuO 6 , Bi 2 Sr 2 Ca 2 Cu 3 O 10 , Tl 2 (Ca,Ba) 2 CuO 6 , Bi 2 CuO 6 , Tl 2 Ca 2 CuO 6 , Tl 2 Ba 2 CuO 6 , other oxide superconductors containing Bi, Sr, Ca, Tl or other rare earth metals, yttria, magnesia, barium titanate, rare earth oxides, carbides, nitrides, and borides.
Claim 11
Dependent Claim
19 words
The method for coating substrates as described in claim 4, wherein said furnace is oriented in a horizontal position.
Claim 12
Dependent Claim
19 words
The method for coating substrates as described in claim 4, wherein said furnace is oriented in a vertical position.
Claim 13
Dependent Claim
25 words
The method for coating substrates as described in claim 5, wherein said carrier gas is selected from the group consisting of oxygen and inert gases.
Claim 14
Independent Claim
111 words
A method for applying coatings to substrates using chemical vapor deposition comprising the steps of: (a) selecting a quantity of one or more low vapor pressure powdered reagents; (b) providing a furnace means; (c) placing said substrate within said furnace means; (d) providing a powder means for introducing said powdered reagent or reagents into said furnace, said feeder means including an entraining means for entraining said powdered reagent or reagents in a carrier gas, and introducing said powdered reagent and reagents into said furnace means; and (e) reacting said powdered reagent or reagents within said furnace means resulting in the deposition from the vapor phase of a coating on said substrate.
Claim 15
Independent Claim
111 words
A method for applying coatings to substrates using chemical vapor deposition comprising the steps of: (a) selecting a quantity of one or more low vapor pressure powdered reagents; (b) providing a furnace means; (c) placing said substrate within said furnace means; (d) providing a powder means for introducing said powdered reagent or reagents into said furnace, said feeder means including an entraining means for entraining said powdered reagent or reagents in a carrier gas, and introducing said powdered reagent and reagents into said furnace means; and (e) reacting said powdered reagent or reagents within said furnace means resulting in the deposition from the vapor phase of a coating on said substrate.
Claim 16
Dependent Claim
16 words
The method for coating substrates as described in claim 13, wherein said carrier gas is oxygen.
Claim 17
Dependent Claim
38 words
The method for coating substrates as described in claim 13 further comprising the step of introducing oxygen to said furnace means prior to step (e), wherein said carrier gas is selected from the group consisting of inert gases.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-04-28 | 1995-10-28 | 1996-04-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-04-28 | 1999-10-28 | 2000-04-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-04-28 | 2003-10-28 | 2004-04-28 | $7700.00 | Window Closed / Lapsed |