Water vapor, reaction rate and deposition rate control of tin oxide film by CVD on glass

Claim 1

A process for producing a coated glass having a surface resistance of less than about 40 ohms/square at a thickness less than about 250 nm, an IR reflectivity of greater than about 70%, visible transmittance of greater than about 80% and solar transmittance of greater than about 70%, comprising utilizing a chemical vapor deposition process wherein a coating solution is introduced into a carrier gas stream, said solution comprising a substantially solvent free mixture of an organotin chloride and a reactive fluorine compound soluble in or miscible with said organotin chloride, said organotin is represented by the formula RSnCl.sub.3 where R is halogen or a C 1 to C 4 straight or branched chain alkyl, phenyl or R'CH 2 CH 2 --; R' is R"OOC or CH 3 OC--; R" is a C 1 to C 4 alkyl; or by the formula R'".sub.2 SnCl.sub.2 II where R'" is a C 1 to C 4 straight or branched chain alkyl; or by the formula R"SnCl.sub.n (O.sub.2 R").sub.3-n ; III where R" is a C 1 to C 4 alkyl or substituted alkyl; n is 1 or 2; the reactive fluorine compound is an organic compound having at least one fluorine atom located alpha or beta to a functional group, wherein the functional group is selected from the group consisting of carboxylic acid, ester, aldehyde, anhydride, nitrile, ketone, ether, amine, acid halide, alcohol, halogen, amide and hydrogen; said mixture having a vaporization temperature below about 200° C. and a decoposition temperature substantially above the vaporization temperature of the mixture and below about 650° C.; and the gas stream contains sufficient water vapor such that the relative humidity of the gas stream at 18° C. is about 6% to about 100%.