Super tough monolithic silicon nitride

Claim 2

A monolithic silicon nitride ceramic, said ceramic having been densified and heat treated in the presence of about 6.5 to 18 wt % refractory sintering aids, the balance of said ceramic being silicon nitride and incidental impurities, said densification and heat treatment having been carried out in at least two steps, wherein: (a) at least a first of said steps is carried out at a temperature between 1750° C. and 2000° C. and for a time ranging from about 1 to 10 hrs. in order to prepare an intermediate ceramic with a density of at least 90% of theoretical; (b) at least a succeeding one of said steps is carried out at a temperature higher than 2000° C. for a time ranging from about 1 to 10 hrs. in order to heat treat the intermediate ceramic; and (c) each of said steps is carried out under nitrogen pressure sufficiently high to avoid decomposition of silicon nitride to thereby provide a ceramic having a density greater than 95% of theoretical density, a Chevron Notch fracture toughness of at least 9.0 MPa·m 1/2 at room temperature, and R-curve behavior.

Claim 3

A ceramic as recited by claim 1, having a 4-point bend strength Weibull modulus of at least 15.

Claim 4

A ceramic as recited in claim 1, having a damage tolerance characterized by the equation B=d (log S)/d(log P) where S is the 4 point bend strength measured after indentation, P is the Vickers indentation load and B is greater than -0.3.

Claim 5

A ceramic as recited by claim 1, having a thermal conductivity of at least 45 W.m -1 .K -1 at ambient temperature.

Claim 6

A ceramic as recited in claim 1, said ceramic having been densified and heat treated in the presence of a refractory sintering aid, the major component of which is an oxide, nitride, or oxnitride compound of two or more of the elements Y, La, Ce, Pr, Nd, Sm, Sd, Tb, Dy, Ho, Er and Yb and the minor component of which is an oxide or oxynitride compound of one or more of the elements Mg, Sr, Ba, Al or Si.

Claim 7

A ceramic as recited in claim 5, wherein said sintering aid is present in an amount of at least 8.0 w %.

Claim 8

A ceramic as recited by claim 5, wherein said major component is present in an amount ranging from 5 to 14 w % and said minor component is present in an amount ranging from 0 to less than 4 w %.

Claim 9

A monolithic silicon nitride ceramic as recited by claim 1, having a Chevron Notch fracture toughness ranging from about 10 to 18 MPa·m 1/2 .

Claim 10

A monolithic silicon nitride ceramic, said ceramic having been densified and heat treated in the presence of about 6.5 to 18 wt % refractory sintering aid having as a major component 5 to 14 w % oxide, nitride or oxynitride compound of at least two of the elements Y, La, Ce, Pr, Nd, Sm, Gd, Tb, Dy, Ho, Er and Yb and as a minor component 0 to less than 4 w % of an oxide or oxynitride compound of at least one of the elements Mg, Sr, Ba, Al and Si, the balance of said ceramic being silicon nitride and incidental impurities, said densification and heat treatment having been carried out in at least two steps, wherein: (a) at least a first of said steps is carried out at a temperature between 1750° C. and 2000° C. and for a time ranging from about 1 to 10 hrs. in order to prepare an intermediate ceramic with a density of at least 90% of theoretical; (b) at least a succeeding one of said steps is carried out at a temperature higher than 2000° C. for a time ranging from about 1 to 10 hrs. in order to heat treat the intermediate ceramic; and (c) each of said steps is carried out under nitrogen pressure sufficiently high to avoid decomposition of silicon nitride to thereby provide a ceramic having a density greater than 95% of theoretical density, a Chevron Notch fracture toughness of at least 9.0 MPa·m 1/2 at room temperature, and R-curve behavior.

Claim 11

A monolithic silicon nitride ceramic, said ceramic having been densified and heat treated in the presence of about 6.5 to 18 wt % refractory sintering aid having as a major component 5 to 14 w % oxide, nitride or oxynitride compound of at least two of the elements Y, La, Ce, Pr, Nd, Sm, Gd, Tb, Dy, Ho, Er and Yb and as a minor component 0 to less than 4 w % of an oxide or oxynitride compound of at least one of the elements Mg, Sr, Ba, Al and Si, the balance of said ceramic being silicon nitride and incidental impurities, said densification and heat treatment having been carried out in at least two steps, wherein: (a) at least a first of said steps is carried out at a temperature between 1750° C. and 2000° C. and for a time ranging from about 1 to 10 hrs. in order to prepare an intermediate ceramic with a density of at least 90% of theoretical; (b) at least a succeeding one of said steps is carried out at a temperature higher than 2000° C. for a time ranging from about 1 to 10 hrs. in order to heat treat the intermediate ceramic; and (c) each of said steps is carried out under nitrogen pressure sufficiently high to avoid decomposition of silicon nitride to thereby provide a ceramic having a density greater than 95% of theoretical density, a Chevron Notch fracture toughness of at least 9.0 MPa·m 1/2 at room temperature, and R-curve behavior.