US5099557A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Removal of surface contaminants by irradiation from a high-energy source
Assignee: Cauldron LP
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Filing: 1990-11-09
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Granted: 1992-03-31
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Expires: 2010-11-09
Abstract
Abstract A method and apparatus for removing surface contaminants from the surface of a substrate by high-energy irradiation is provided. The invention enables removal of surface contaminants without altering of the substrate's underlying molecular structure. The source of high-energy irradiation may comprise a pulsed laser.
Inventors
- 👤 Audrey C. Engelsberg
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 15:34
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/10; H10P70/12; B; B08; B08B; B08B7/00; B08B7/0035; B08B7/0042; B08B7/0057; B23; B23K; B23K26/00; B23K26/12; B23K26/127; B23K26/14; B23K26/1435; B23K26/1437; B23K26/1462; G; G03; G03F; G03F7/00; G03F7/70; G03F7/70383; G03F7/704; G03F7/708; G03F7/70858; G03F7/70866; G03F7/70908; G03F7/70925; H10P14/00; H10P14/40; H10P14/412; H10P34/00; H10P34/40; H10P34/42; H10P52/00; H10P52/40; H10P52/403; H10P72/00; H10P72/04; H10P72/0402; H10P72/0406; H10P95/00; H10W; H10W20/00; H10W20/01; H10W20/071; H10W20/092
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
107 words
An apparatus for removing adsorbed surface contaminants from the surface of a substrate while preserving the substrate treatment surface, comprising: means for supplying a gas inert to the substrate treatment surface; gas flow means for constantly flowing said gas across the substrate treatment surface; laser pulse generating means for generating pulses of laser energy against the substrate treatment surface over which said gas constantly flows, said laser pulse generating means generating laser pulses having an energy density between the energy required to break bonds between adsorbed surface contaminants and the treatment surface, and the energy required to alter the molecular crystal structure of the substrate treatment surface.
Claim 2
Independent Claim
107 words
An apparatus for removing adsorbed surface contaminants from the surface of a substrate while preserving the substrate treatment surface, comprising: means for supplying a gas inert to the substrate treatment surface; gas flow means for constantly flowing said gas across the substrate treatment surface; laser pulse generating means for generating pulses of laser energy against the substrate treatment surface over which said gas constantly flows, said laser pulse generating means generating laser pulses having an energy density between the energy required to break bonds between adsorbed surface contaminants and the treatment surface, and the energy required to alter the molecular crystal structure of the substrate treatment surface.
Claim 3
Dependent Claim
16 words
The apparatus of claim 1 wherein said laser pulse generating means has an ultraviolet energy source.
Claim 4
Dependent Claim
16 words
The apparatus of claim 1 wherein said laser pulse generating means is a KrF excimer laser.
Claim 5
Dependent Claim
48 words
The apparatus of claim 1 wherein said gas flow means comprises: an enclosure in which the substrate being treated can be placed, said enclosure having an inlet port and an outlet port, and means for introducing said continuous flow of gas to said enclosure through said inlet port.
Claim 6
Dependent Claim
20 words
The apparatus of claim 1 wherein said gas inert to the surface of said substrate is a chemically inert gas.
Claim 7
Dependent Claim
12 words
The apparatus of claim 5 wherein said chemically inert gas is argon.
Claim 8
Dependent Claim
44 words
The apparatus of claim 1 further comprising gas analyzer means for analyzing the gas constantly flowing across the substrate treatment surface during laser energy generation against said treatment surface, said gas analyzer means being for determining the composition of contaminants removed from said surface.
Claim 9
Dependent Claim
55 words
The apparatus of claim 4 further comprising gas analyzer means for analyzing the gas constantly flowing across the substrate treatment surface during laser energy generation against said treatment surface, said gas analyzer means being for determining the composition of contaminants removed from said surface, said gas analyzer means being connected to said enclosure outlet port.
Claim 10
Dependent Claim
31 words
The apparatus of claim 4 wherein said gas flow means further comprises: a gas flow meter for monitoring the continuous flow of gas introduced to said enclosure through said inlet port.
Claim 11
Dependent Claim
45 words
The apparatus of claim 4 wherein said means for introducing said continuous flow of gas to said enclosure comprises means for introducing a constant flow of about 10 1/hr of said gas inert to the substrate treatment surface across said substrate placed in said enclosure.
References Cited (Backward Citations)
US3364087A
Cited
US3464534A
Cited
US3503804A
Cited
US4160166A
Cited
US4181538A
Cited
JPS567439A
Cited
US4305973A
Cited
JPS5623748A
Cited
US4292093A
Cited
US4393311A
Cited
JPS5776846A
Cited
JPS57102229A
Cited
JPS57187936A
Cited
US4568632A
Cited
JPS59215728A
Cited
JPS6037736A
Cited
US4668304A
Cited
US4731516A
Cited
US4680616A
Cited
US4782029A
Cited
US4687539A
Cited
EP0268301A2
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-03-31 | 1995-09-30 | 1996-03-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-03-31 | 1999-09-30 | 2000-03-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-03-31 | 2003-09-30 | 2004-03-31 | $7700.00 | Window Closed / Lapsed |