US5096749A
Expired / Lapsed
US
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Method of producing a metallization layer structure
Assignee: Fujitsu Ltd
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Filing: 1990-09-27
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Granted: 1992-03-17
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Expires: 2010-09-27
Abstract
Abstract A metallization layer structure containing, in order, an aluminum nitride ceramic base layer, an aluminum titanium nitride layer, a titanium layer, a heat-resistant metallic layer and a metallic layer for facilitating soldering and brazing. The aluminum titanium nitride layer is formed at the interface between the aluminum nitride ceramic base layer and the titanium layer by subjecting a laminate containing, in order, an aluminum nitride ceramic base layer, a titanium layer, a heat-resistant metallic layer and a metallic layer for facilitating soldering and brazing to a heat treatment within the range of 350°-1000° C. for 40 minutes.
Inventors
- 👤 Shigeki Harada
- 👤 Masahiro Sugimoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 11:11
CPC Classifications
C; C04; C04B; C04B41/00; C04B41/009; H; H10; H10W; H10W20/00; H10W20/40; H10W20/41; H10W20/425; C04B41/45; C04B41/52; C04B41/80; C04B41/81; C04B41/89; H05; H05K; H05K1/00; H05K1/02; H05K1/03; H05K1/0306; H05K3/00; H05K3/38; H10W72/00; H10W72/50; H10W72/531; H10W72/536; H10W72/5363; H10W72/851; H10W72/874; H10W72/884; H10W90/00; H10W90/701; H10W90/731; H10W90/734; H10W90/751; H10W90/754; Y; Y10; Y10T; Y10T428/00; Y10T428/12; Y10T428/12014; Y10T428/12028; Y10T428/12049; Y10T428/12056; Y10T428/12493; Y10T428/12535; Y10T428/12576; Y10T428/31504; Y10T428/31536
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
86 words
A method of producing a laminated metallization layer structure on an aluminum nitride ceramic base comprising the steps of: laminating a titanium layer on an aluminum nitride ceramic base; laminating a heat-resistant metallic layer on the titanium layer; laminating a metallic layer on the heat-resistant metallic layer for facilitating soldering or brazing; and subjecting the laminated layers to a heat treatment at a temperature within a predetermined range sufficient to generate an aluminum titanium nitride layer between the aluminum nitride ceramic base and the titanium layer.
Claim 2
Independent Claim
86 words
A method of producing a laminated metallization layer structure on an aluminum nitride ceramic base comprising the steps of: laminating a titanium layer on an aluminum nitride ceramic base; laminating a heat-resistant metallic layer on the titanium layer; laminating a metallic layer on the heat-resistant metallic layer for facilitating soldering or brazing; and subjecting the laminated layers to a heat treatment at a temperature within a predetermined range sufficient to generate an aluminum titanium nitride layer between the aluminum nitride ceramic base and the titanium layer.
Claim 3
Dependent Claim
19 words
The method of claim 1, wherein the heat treatment is carried out in an atmosphere comprising a reducing gas.
Claim 4
Dependent Claim
13 words
The method of claim 2, wherein the reducing gas is a hydrogen gas.
Claim 5
Dependent Claim
34 words
The method of claim 1, wherein each of the steps of laminating the titanium layer, laminating the heat-resistant metallic layer and laminating the metallic layer is performed by one of vapor evaporation or sputtering.
Claim 6
Dependent Claim
29 words
The method of claim 1, wherein the heat-resistant metallic layer comprises a metal selected from the group consisting of tungsten and molybdenum, and wherein the metallic layer comprises nickel.
Claim 7
Dependent Claim
23 words
The method of claim 1, wherein the temperature used in the heat treatment step is within a range of 850° to 1000° C.
Claim 8
Independent Claim
120 words
A method of producing a laminated metallization layer structure on an aluminum nitride ceramic base comprising the steps of: laminating a titanium layer on an aluminum nitride ceramic base; laminating a heat-resistant metallic layer on the titanium layer; laminating a metallic layer on the heat-resistant metal layer for facilitating soldering or brazing; subjecting the laminated layers to a first heat treatment at a temperature lower than a temperature sufficient to generate an aluminum titanium nitride layer between the aluminum nitride ceramic base and the titanium layer; subjecting the patterned layers to a second heat treatment at a temperature within a range sufficient to generate the aluminum titanium nitride layer between the aluminum nitride ceramic base and the patterned titanium layer.
Claim 9
Independent Claim
120 words
A method of producing a laminated metallization layer structure on an aluminum nitride ceramic base comprising the steps of: laminating a titanium layer on an aluminum nitride ceramic base; laminating a heat-resistant metallic layer on the titanium layer; laminating a metallic layer on the heat-resistant metal layer for facilitating soldering or brazing; subjecting the laminated layers to a first heat treatment at a temperature lower than a temperature sufficient to generate an aluminum titanium nitride layer between the aluminum nitride ceramic base and the titanium layer; subjecting the patterned layers to a second heat treatment at a temperature within a range sufficient to generate the aluminum titanium nitride layer between the aluminum nitride ceramic base and the patterned titanium layer.
Claim 10
Dependent Claim
25 words
The method of claim 7, wherein the etching step uses an etching liquid comprising a mixed acid of a fluorine acid and a phosphoric acid.
Claim 11
Dependent Claim
19 words
The method of claim 7, wherein the heat treatment is carried out in an atmosphere comprising a reducing gas.
Claim 12
Dependent Claim
13 words
The method of claim 9, wherein the reducing gas is a hydrogen gas.
Claim 13
Dependent Claim
24 words
The method of claim 7, wherein the temperature used in the second heat treatment step is within a range of 850° to 1000° C.
Claim 14
Dependent Claim
24 words
The method of claim 7, wherein the temperature used in the first heat treatment step is within a range of 700° to 800° C.
References Cited (Backward Citations)
US2798577A
Cited
US2996401A
Cited
US3057445A
Cited
US3107756A
Cited
US4503130A
Cited
US4461799A
Cited
US4611745A
Cited
US4695517A
Cited
GB2187205A
Cited
US4761345A
Cited
US4770953A
Cited
US4818626A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-03-17 | 1995-09-16 | 1996-03-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-03-17 | 1999-09-16 | 2000-03-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-03-17 | 2003-09-16 | 2004-03-17 | $7700.00 | Window Closed / Lapsed |