US5087857A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma generating apparatus and method using modulation system
Assignee: Samsung Electronics Co Ltd
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Filing: 1990-07-31
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Granted: 1992-02-11
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Expires: 2010-07-31
Abstract
Abstract The present invention provides a plasma generating method by using a modulation system in order to improve inner uniformity of plasma in plasma generating apparatus using the ECR plasma apparatus of another ECR system for performing an etching or deposition process. Unlike conventional fixed current systems, the embodiment disclosed transfers a high density ion portion to radiation form, thereby improving the uniformity of etching velocity or depositing velocity in wafers.
Inventors
- 👤 Tae-Hyuk Ahn
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 21:01
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; H01J37/32211; H01J37/32357; H01J37/32431; H01J37/32623; H01J37/3266; H01J37/32678
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
60 words
A method for modulating a plasma generating apparatus comprising: modulating a voltage waveform of input electrical energy applied to a coil surrounding an electron cyclotron resonance plasma chamber to combine a reference voltage and an output voltage of a modulating function generator to transform said input electrical energy from fixed current to variable current; and varying the combined output voltage.
Claim 2
Independent Claim
60 words
A method for modulating a plasma generating apparatus comprising: modulating a voltage waveform of input electrical energy applied to a coil surrounding an electron cyclotron resonance plasma chamber to combine a reference voltage and an output voltage of a modulating function generator to transform said input electrical energy from fixed current to variable current; and varying the combined output voltage.
Claim 3
Dependent Claim
33 words
The method according to claim 1 wherein said modulating function generator has a duty cycle in the range of 0.1 to 0.9 and a frequency in the range of 1/10 to 10 Hz.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-02-10 | 1995-08-12 | 1996-02-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-02-10 | 1999-08-12 | 2000-02-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-02-10 | 2003-08-12 | 2004-02-11 | $7700.00 | Window Closed / Lapsed |