US5085755A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Sputtering apparatus for forming thin films
Assignee: Hitachi Ltd
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Filing: 1989-12-14
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Granted: 1992-02-04
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Expires: 2009-12-14
Abstract
Abstract An apparatus for forming a thin film of a given material on one or more substrates comprises a vacuum vessel, a first electrode which is provided in the vacuum vessel for holding a target plate of the given material thereon, a second electrode which is provided opposite to the first electrode in the vacuum vessel to form a discharge space between the first and second electrodes and holds the substrate(s) thereon, a gas conduit for supplying a sputtering gas into the discharge space, power sources for applying a discharge voltage between the first and second electrodes to generate a discharge plasma of the sputtering gas, and a magnetic field generating device which is provided to surround the discharge space and generates a magnetic field effective to prevent the discharge plasma from diffusing to the outside of the discharge space.
Inventors
- 👤 Eiji Setoyama
- 👤 Mitsuhiro Kamei
- 👤 Yasunori Ohno
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 18:09
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/35
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
193 words
An apparatus for forming a thin film of a given material on a substrate, comprising: a vacuum vessel; a first electrode provided in said vacuum vessel being adapted to support a target plate of said given material; a second electrode provided opposite to said first electrode in said vacuum vessel to form a discharge space between said first and second electrodes, said second electrode being adapted to support said substrate; gas supplying means for supplying a sputtering gas into said discharge space; power source means for applying a discharge voltage between said first and second electrodes to generate a discharge plasma from said sputtering gas; and magnetic field generating means including a plurality of magnetic elements disposed at predetermined intervals around a periphery of said discharge space, said magnetic elements producing respective static magnetic fields and having respective magnetization directions lying on respective axes, said axes extending towards said discharge space, said magnetization directions of said magnetic elements being alternately reversed around said periphery of said discharge space, thereby producing static magnetic fields between adjacent ones of said magnetic elements, said static magnetic fields extending substantially along said periphery of said discharge space.
Claim 2
Independent Claim
193 words
An apparatus for forming a thin film of a given material on a substrate, comprising: a vacuum vessel; a first electrode provided in said vacuum vessel being adapted to support a target plate of said given material; a second electrode provided opposite to said first electrode in said vacuum vessel to form a discharge space between said first and second electrodes, said second electrode being adapted to support said substrate; gas supplying means for supplying a sputtering gas into said discharge space; power source means for applying a discharge voltage between said first and second electrodes to generate a discharge plasma from said sputtering gas; and magnetic field generating means including a plurality of magnetic elements disposed at predetermined intervals around a periphery of said discharge space, said magnetic elements producing respective static magnetic fields and having respective magnetization directions lying on respective axes, said axes extending towards said discharge space, said magnetization directions of said magnetic elements being alternately reversed around said periphery of said discharge space, thereby producing static magnetic fields between adjacent ones of said magnetic elements, said static magnetic fields extending substantially along said periphery of said discharge space.
Claim 3
Independent Claim
213 words
An apparatus for forming a thin film of a given material on a substrate, comprising: a vacuum vessel; a first electrode provided in said vacuum vessel being adapted to support a target plate of said given material; a second electrode provided opposite to said first electrode in said vacuum vessel to form a discharge space enclosed by said first and second electrodes and an imaginary wall surface defined by peripheral edges of said first and second electrodes, said second electrode being adapted to support said substrate; gas supplying means for supplying a sputtering gas into said discharge space; power source means for applying a discharge voltage between said first and second electrodes to generate a discharge plasma from said sputtering gas; and magnetic field generating means including a plurality of magnetic elements disposed at predetermined intervals around a periphery of said imaginary wall surface, said magnetic elements producing respective static magnetic fields and having respective magnetization directions lying on respective axes, said axes extending towards said imaginary wall surface, said magnetization directions of said magnetic elements being alternately reversed around said periphery of said imaginary wall surface, thereby producing static magnetic fields between adjacent ones of said magnetic elements, said static magnetic fields extending substantially along said periphery of said imaginary wall surface.
Claim 4
Independent Claim
213 words
An apparatus for forming a thin film of a given material on a substrate, comprising: a vacuum vessel; a first electrode provided in said vacuum vessel being adapted to support a target plate of said given material; a second electrode provided opposite to said first electrode in said vacuum vessel to form a discharge space enclosed by said first and second electrodes and an imaginary wall surface defined by peripheral edges of said first and second electrodes, said second electrode being adapted to support said substrate; gas supplying means for supplying a sputtering gas into said discharge space; power source means for applying a discharge voltage between said first and second electrodes to generate a discharge plasma from said sputtering gas; and magnetic field generating means including a plurality of magnetic elements disposed at predetermined intervals around a periphery of said imaginary wall surface, said magnetic elements producing respective static magnetic fields and having respective magnetization directions lying on respective axes, said axes extending towards said imaginary wall surface, said magnetization directions of said magnetic elements being alternately reversed around said periphery of said imaginary wall surface, thereby producing static magnetic fields between adjacent ones of said magnetic elements, said static magnetic fields extending substantially along said periphery of said imaginary wall surface.
Claim 5
Dependent Claim
64 words
An apparatus according to claim 2, wherein each of said first and second electrodes is a circular electrode, said discharge space is a circular cylindrical discharge space having a central axis joining centers of the first and second circular electrodes, and said axes on which said magnetization directions of said magnetic elements lie extend towards said central axis of said circular cylindrical discharge space.
Claim 6
Dependent Claim
16 words
An apparatus according to claim 3, wherein each of said magnetic elements includes a permanent magnet.
Claim 7
Dependent Claim
34 words
An apparatus according to claim 3, wherein each of said magnetic elements includes a coil adapted to be energized by a current to generate a respective static magnetic field having a respective magnetization direction.
Claim 8
Dependent Claim
16 words
An apparatus according to claim 2, wherein each of said magnetic elements includes a protective cover.
Claim 9
Dependent Claim
34 words
An apparatus according to claim 2, wherein said magnetic field generating means is provided with gas-transmitting portions which enable said sputtering gas supplied from said gas supplying means to flow into said discharge space.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-02-03 | 1995-08-05 | 1996-02-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-02-03 | 1999-08-05 | 2000-02-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-02-03 | 2003-08-05 | 2004-02-04 | $7700.00 | Window Closed / Lapsed |