Semiconductor wafer carrier design

Claim 1

A semiconductor wafer carrier-susceptor for use in a continuous chemical vapor deposition reactor, comprising a generally rectangular body of a high temperature material having two major faces, first and second ends, and two sides, one major face having a recess formed in and extending across said one major face, two sides of said recess having lips extending out from the sides of the recess forming two tracks in the sides of the recess such that a semiconductor wafer may be placed in the tracks in the recess and held therein when the carrier-susceptor is positioned with the recess and said one major face in a downward position, said carrier-susceptor also having circular grooves, one each groove extending across a respective one of said first and second ends, said grooves formed in said one major face and its respective end,; and wherein the tracks are open at two sides of the carrier-susceptor to allow loading of the semiconductor wafer into either side of the carrier-susceptor.