Patterned thin film and process for preparing the same

Abstract

Abstract A patterned thin film suitable for use in electric and electronic devices, prepared from a polymer or a mixture of the polymer and other known compounds capable of forming a thin film by LB technique, said polymer having linear recurring units wherein an organic group R 1 having at least 2 carbon atoms and a valence of at least 2 is combined alternately with an organic group R 2 having at least 2 carbon atoms and a valence of at least 2 through a bivalent group formed by a reaction of an acid group A containing a hetero atom and a basic group B containing a hetero atom, and wherein a hydrocarbon-containing group R 3 having 10 to 30 carbon atoms which may contain a substituent group, is linked by covalent or ionic bond to said recurring units, the number of groups R 3 being at least 2 per 10 recurring units. The patterned thin film is prepared by building up a layer or layers of the polymer or a mixture of the polymer and a compound capable of forming a film by LB technique onto a substrate according to the LB technique, irradiating patternwise the built-up film with high energy rays, and developing the irradiated film, or by forming the built-up film in the same manner as above on a patterned, removal film formed on a substrate, and removing the patterned film from the substrate, and if desired, by further subjecting the obtained pattern to a reaction to convert the polymer, when it has a structure as a precursor, into a polymer having a 5-membered or 6-membered heterocyclic structure.

Inventors

• 👤 Masakazu Uekita
• 👤 Hiroshi Awaji
• 👤 Makoto Murata
• 👤 Satoshi Mizunuma

Bibliographic Details