Semiconductor wafer carrier design

Claim 2

A semiconductor wafer carrier for use in a continuous chemical vapor deposition reactor, comprising: a generally rectangular body of a high temperature material having first and second major faces, said first major face having a recess formed in and extending across said first major face, said body defining a generally circular opening extending from a lower surface defining, in part, said recess through the carrier and opening through the second of said major faces of the carrier, a lip extending from sides defining the generally circular opening for holding a semiconductor wafer, a lip shaped to fit in the recess formed in and extending across said first major face to cover a semiconductor wafer residing in said generally circular opening; and generally circular grooves on two sides of the carrier on which the carrier is to be moved through the reactor.

Claim 3

The carrier according to claim 1, wherein the carrier is made of silicon carbide coated graphite.

Claim 4

The carrier according to claim 1, wherein the lip extending from the sides defining the generally circular opening extend from the sides of the opening adjacent said second major face.

Claim 5

The carrier according to claim 1, wherein the surfaces defining generally circular opening have a flat edge region to correspond with a flat edge on a semiconductor wafer.

Claim 6

A semiconductor wafer carrier for use in a continuous chemical vapor deposition reactor, comprising; a generally rectangular body of a high temperature material, said body having two major surfaces and defining, an opening through the carrier corresponding to the shape of a semiconductor wafer to be mounted in the carrier; means for mounting a semiconductor wafer having a flat orientation edge in said opening through said carrier; means for mounting a semiconductor wafer having a flat orientation edge in said opening through said carrier; a recess in one side of said carrier; a lip extending from sides defining the opening through the carrier for holding a semiconductor wafer; a lid having a shape corresponding to the recess in said carrier for covering and transmitting heat to said semiconductor wafer; and generally circular grooves on two sides of the carrier on which the carrier is to be moved through the reactor.

Claim 7

A semiconductor wafer carrier for use in a continuous chemical vapor deposition reactor, comprising; a generally rectangular body of a high temperature material, said body having two major surfaces and defining, an opening through the carrier corresponding to the shape of a semiconductor wafer to be mounted in the carrier; means for mounting a semiconductor wafer having a flat orientation edge in said opening through said carrier; means for mounting a semiconductor wafer having a flat orientation edge in said opening through said carrier; a recess in one side of said carrier; a lip extending from sides defining the opening through the carrier for holding a semiconductor wafer; a lid having a shape corresponding to the recess in said carrier for covering and transmitting heat to said semiconductor wafer; and generally circular grooves on two sides of the carrier on which the carrier is to be moved through the reactor.

Claim 8

The carrier according to claim 5, wherein the carrier is made of graphite coated with silicon carbide.

Claim 9

The carrier according to claim 5, wherein the lip extending from the sides defining the generally circular opening extends from the sides of the opening adjacent said second major face.

Claim 10

The carrier according to claim 5, wherein surfaces defining the generally circular opening in the carriage have a flat edge region partially defining the opening.

Claim 11

The carrier according to claim 5, wherein the lid and carrier have matching tapers to facilitate lid alignment on the carrier.

Claim 12

The carrier according to claim 5, wherein the lid and carrier have rounded corners to prevent stress due to the heating of the lid and carrier during processing of the semiconductor device during processing.

Claim 13

A semiconductor wafer carrier, having an under side and an upper side, for use in a continuous chemical vapor deposition reactor, comprising: a generally rectangular body of a high temperature material having two major faces; an opening through the carrier corresponding to the shape of a semiconductor wafer to be mounted in the carrier; means for mounting a semiconductor wafer having a flat orientation edge in said opening through said carrier; a recess in the upper side of said carrier; a lip extending from sides defining the opening through the carrier for holding a semiconductor wafer; a lid having a shape corresponding to the recess in the upper side of said carrier for covering and transmitting heat to said semiconductor wafer, said lid and carrier having matching tapers to facilitate lid alignment on the carrier; and said carrier having generally circular grooves extend along two sides of said carrier.

Claim 14

A semiconductor wafer carrier, having an under side and an upper side, for use in a continuous chemical vapor deposition reactor, comprising: a generally rectangular body of a high temperature material having two major faces; an opening through the carrier corresponding to the shape of a semiconductor wafer to be mounted in the carrier; means for mounting a semiconductor wafer having a flat orientation edge in said opening through said carrier; a recess in the upper side of said carrier; a lip extending from sides defining the opening through the carrier for holding a semiconductor wafer; a lid having a shape corresponding to the recess in the upper side of said carrier for covering and transmitting heat to said semiconductor wafer, said lid and carrier having matching tapers to facilitate lid alignment on the carrier; and said carrier having generally circular grooves extend along two sides of said carrier.

Claim 15

The carrier according to claim 11, wherein surfaces defining the generally circular opening in the carriage have a flat edge region partially defining the opening.

Claim 16

The carrier according to claim 11, wherein the carrier and lid are made of graphite coated with silicon carbide.

Claim 17

The carrier according to claim 13, wherein the lip extending from the sides defining the opening through the carrier extends from the sides of the opening adjacent said second major face.