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US5041397A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of fabricating a semiconductor device

Assignee: Samsung Electronics Co Ltd
•
Filing: 1989-02-03
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Granted: 1991-08-20
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Expires: 2009-02-03
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Abstract

Abstract A method of forming a PSG layer on a semiconductor substrate containing semiconductor elements by chemical vapor deposition is characterized in that the concentration of the PSG layer is gradually increased from the substrate surface toward the uppermost surface of the PSG layer.

Inventors

  • 👤 Nam-Yoon Kim
  • 👤 Si-Choon Park

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 19:27
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/66; H10P14/662; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P50/00; H10P50/20; H10P50/28; H10P50/282; H10P50/283; H10W; H10W20/00; H10W20/01; H10W20/071; H10W20/081; H10W20/082; H10P14/69; H10P14/692; H10P14/6921; H10P14/6922; H10P14/6923; Y; Y10; Y10S; Y10S148/00; Y10S148/042; Y10S148/161

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 58 words
A method of fabricating a semiconductor device, comprising: forming a PSG layer on a semiconductor substrate containing semiconductor elements, by chemical vapor deposition, while varying the concentration of phosphorous in the PSG layer to gradually increase from the substrate surface toward the uppermost surface of the PSG layer; and redistributing the concentration of phosphorous in the PSG layer.
Claim 2
Independent Claim 58 words
A method of fabricating a semiconductor device, comprising: forming a PSG layer on a semiconductor substrate containing semiconductor elements, by chemical vapor deposition, while varying the concentration of phosphorous in the PSG layer to gradually increase from the substrate surface toward the uppermost surface of the PSG layer; and redistributing the concentration of phosphorous in the PSG layer.

References Cited (Backward Citations)

US3793070A Cited
US4066481A Cited
US3969743A Cited
DE2538947A1 Cited
US4154631A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-08-19 1995-02-18 1995-08-20 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-08-19 1999-02-18 1999-08-20 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-08-19 2003-02-18 2003-08-20 $7700.00 Window Closed / Lapsed

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