Abstract A plasma processing apparatus includes a vacuum vessel defining a discharge chamber is provided at least a source gas supply for supplying a processing gas into the discharge chamber a magnetic field creating device, a microwave introducing device. The microwave introducing device employs a microwave radiating member having the shape of a flat plate and provided with a cut. The plasma processing apparatus is capable of uniformly processing a work with a plasma and efficiently applying a microwave only to the work. The periphery of a microwave transmission window is tapered, so that the microwave transmission window can be attached adhesively and hermetically to a microwave launcher in a simple construction, whereby the reliability of the adhesive attachment of the microwave transmission window to the microwave launcher is enhanced.
A plasma processing apparatus comprising: a vacuum vessel defining a discharge chamber, provided at least with source gas supply means for supplying a source gas for processing a work, magnetic field creating means, and microwave introducing means; characterized in that the microwave introducing means comprises a microwave radiating member having the shape of a flat plate and provided with a cut.
Claim 2
Dependent Claim
61 words
A plasma processing apparatus comprising: a vacuum vessel defining a discharge chamber, provided at least with source gas supply means for supplying a source gas for processing a work, magnetic field creating means, and microwave introducing means; characterized in that the microwave introducing means comprises a microwave radiating member having the shape of a flat plate and provided with a cut.
Claim 3
Dependent Claim
26 words
A plasma processing apparatus according to claim 1, wherein said microwave radiating member is joined to a coaxial tube or a waveguide for guiding a microwave.
Claim 4
Dependent Claim
29 words
A plasma processing apparatus according to claim 1, wherein work holding means for holding a work, disposed within said vacuum vessel is connected to a high-frequency power supply means.
Claim 5
Dependent Claim
43 words
A plasma processing apparatus according to claim 1, wherein high-frequency cut-off means is provided in a portion of microwave guide means for guiding a microwave to said microwave introducing means so that a high-frequency wave can be applied to said microwave radiating member.
Claim 6
Dependent Claim
53 words
A plasma processing apparatus according to claim 1, wherein said discharge chamber is divided by conductive ion drawing electrode means into a plasma producing space and a processing space for processing a work, and ions are drawn selectively from the plasma produced in the plasma producing space by the ion drawing electrode means.
Claim 7
Dependent Claim
31 words
A plasma processing apparatus according to claim 5, wherein said ion drawing electrode means comprises one or a plurality of members arranged at intervals and each having a plurality of openings.