US4761199A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Shutter device for ion beam etching apparatus and such etching apparatus using same
Assignee: Canon Inc
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Filing: 1986-04-08
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Granted: 1988-08-02
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Expires: 2006-04-08
Abstract
Abstract A shutter device for use in an etching apparatus using charged particles, which includes at least one sheet-like electrode having an aperture for passage of the charged particles; and a voltage source for selectively applying to the electrode an electric voltage so as to establish at the electrode an electric potential higher than that of the charged particles; wherein the passage of the charged particles through the aperture of said electrode is prevented when the electric potential which is higher than that of the charged particles is established at the electrode by the voltage application by the voltage source.
Inventors
- 👤 Yasue Sato
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 23:15
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/3002; H01J37/02; H01J37/04; H01J37/045
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
147 words
An etching apparatus using charged particles, said apparatus comprising: generating means for generating charged particles; electrode means for operating on said charged particles, said electrode means functioning as (1) beam forming means for operating on the charged particles generated by said generating means to form a beam of charged particles directed toward an object having a surface to be etched and (2) shutter means for blocking substantially all flow of said charged particles toward the surface of the object; voltage producing means operable to produce an electric voltage, applied to said electrode means, that is effective to create an electric potential that either functions to block substantially all flow of charged particles toward the surface of the object or functions to form said beam of charged particles; and control means for controlling said voltage producing means such that the electrode means will function as said shutter means.
Claim 2
Dependent Claim
147 words
An etching apparatus using charged particles, said apparatus comprising: generating means for generating charged particles; electrode means for operating on said charged particles, said electrode means functioning as (1) beam forming means for operating on the charged particles generated by said generating means to form a beam of charged particles directed toward an object having a surface to be etched and (2) shutter means for blocking substantially all flow of said charged particles toward the surface of the object; voltage producing means operable to produce an electric voltage, applied to said electrode means, that is effective to create an electric potential that either functions to block substantially all flow of charged particles toward the surface of the object or functions to form said beam of charged particles; and control means for controlling said voltage producing means such that the electrode means will function as said shutter means.
Claim 3
Dependent Claim
111 words
An apparatus according to claim 1, wherein said electrode means includes a plurality of electrodes, said voltage producing means applying electric voltages respectively to said electrodes, and wherein said control means controls said voltage producing means so as to control the electric voltages to be applied respectively to said electrodes, wherein said electrodes function as said beam forming means when they are supplied with predetermined electric voltages by said voltage producing means under the control of said control means, and wherein said electrodes function as said shutter means when they are supplied with another set of predetermined electric voltages by said voltage producing means under the control of said control means.
Claim 4
Dependent Claim
27 words
An apparatus according to claim 1, wherein said generating means is a means for providing positive ions as the charged particles to be formed into the beam.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-08-02 | 1992-02-01 | 1992-08-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-08-02 | 1996-02-01 | 1996-08-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-08-02 | 2000-02-01 | 2000-08-02 | $7700.00 | Window Closed / Lapsed |