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US5031571A
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Apparatus for forming a thin film on a substrate
Assignee: Mitsui Chemicals Inc
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Filing: 1989-01-25
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Granted: 1991-07-16
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Expires: 2009-01-25
Abstract
Abstract A film-forming apparatus comprising a high-frequency application electrode and an earth electrode. The high-frequency applying electrode has an uneven surface with projections and recesses. An amorphous silicon film is formed uniformly on a substrate at a high speed by feeding a silicon-based gas into this apparatus and generating a glow discharge between the high-frequency application electrode and the earth electrode, and positioning the substrate in an atmosphere of the generated glow discharge.
Inventors
- 👤 Takashi Igarashi
- 👤 Nobuhiro Fukuda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 07:38
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/513; H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H10; H10F; H10F71/00; H10F77/00; H10F77/10; H10F77/16; H10F77/162; H10F77/166; H10F77/169; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02E10/548
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
80 words
An apparatus for forming a thin film on a substrate, comprising a high frequency application electrode, an earth electrode and the substrate positioned between these electrodes, said high-frequency application electrode having an uneven surface with at least two projections and at least one recess, each of the distance D between the apex of each of said at least two projections and said substrate being 20 mm≦D≦500 mm, the projections having different widths so that the film forming speed becomes uniform.
Claim 2
Independent Claim
80 words
An apparatus for forming a thin film on a substrate, comprising a high frequency application electrode, an earth electrode and the substrate positioned between these electrodes, said high-frequency application electrode having an uneven surface with at least two projections and at least one recess, each of the distance D between the apex of each of said at least two projections and said substrate being 20 mm≦D≦500 mm, the projections having different widths so that the film forming speed becomes uniform.
Claim 3
Independent Claim
92 words
An apparatus for forming a thin film on a substrate, comprising a high frequency application electrode, an earth electrode and the substrate positioned between these electrodes, said high-frequency application electrode having an uneven surface with at least two projections and at least one recess, each of the distance D between the apex of each of said at least two projections and said substrate being 20 mm≦D≦500 mm, the projections having different widths according to their positions on the surface of the high frequency application electrode so that the film-forming speed becomes uniform.
Claim 4
Independent Claim
92 words
An apparatus for forming a thin film on a substrate, comprising a high frequency application electrode, an earth electrode and the substrate positioned between these electrodes, said high-frequency application electrode having an uneven surface with at least two projections and at least one recess, each of the distance D between the apex of each of said at least two projections and said substrate being 20 mm≦D≦500 mm, the projections having different widths according to their positions on the surface of the high frequency application electrode so that the film-forming speed becomes uniform.
Claim 5
Independent Claim
91 words
An apparatus for forming a thin film on a substrate, comprising a high-frequency application electrode, an earth electrode and the substrate positioned between these electrodes, said high-frequency application electrode having an uneven surface with at least one projection and at least two recesses, each of the distance D between the apex of each of said at least one projection and said substrate being 20 mm≦D≦500 mm, the recesses having different widths according to their positions on the surface of the high frequency application electrode so that the film-forming speed becomes uniform.
Claim 6
Independent Claim
91 words
An apparatus for forming a thin film on a substrate, comprising a high-frequency application electrode, an earth electrode and the substrate positioned between these electrodes, said high-frequency application electrode having an uneven surface with at least one projection and at least two recesses, each of the distance D between the apex of each of said at least one projection and said substrate being 20 mm≦D≦500 mm, the recesses having different widths according to their positions on the surface of the high frequency application electrode so that the film-forming speed becomes uniform.
Claim 7
Independent Claim
92 words
An apparatus for forming a thin film on a substrate, comprising a high frequency application electrode, an earth electrode and the substrate positioned between these electrodes, said high-frequency application electrode having an uneven surface with at least two projections and at least one recess, each of the distance D between the apex of each of said at least two projections and said substrate being 20 mm≦D≦500 mm, the projections having different heights according to their positions on the surface of the high frequency application electrode so that the film-forming speed becomes uniform.
Claim 8
Independent Claim
92 words
An apparatus for forming a thin film on a substrate, comprising a high frequency application electrode, an earth electrode and the substrate positioned between these electrodes, said high-frequency application electrode having an uneven surface with at least two projections and at least one recess, each of the distance D between the apex of each of said at least two projections and said substrate being 20 mm≦D≦500 mm, the projections having different heights according to their positions on the surface of the high frequency application electrode so that the film-forming speed becomes uniform.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-07-15 | 1995-01-14 | 1995-07-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-07-15 | 1999-01-14 | 1999-07-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-07-15 | 2003-01-14 | 2003-07-16 | $7700.00 | Window Closed / Lapsed |