US5028563A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for making low tuning rate single mode PbTe/PbEuSeTe buried heterostructure tunable diode lasers and arrays
Assignee: Laser Photonics Inc
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Filing: 1990-01-23
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Granted: 1991-07-02
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Expires: 2010-01-23
Abstract
Abstract A PbTe/PbEuSeTe buried heterostructure tunable diode laser and array and the method for making the same. The active region layer is buried between two lead salt semiconductor layers containing europium and selenium that are mutually of opposite conductivity type and have substantially the same lattice constant as the active region layer. In addition, the europium and selenium containing lead chalcogenide layers have an energy band gap greater than the active buried layer and an index of refraction less than the active layer. The buried structure enhances electrical and optical confinement, reduces threshold currents, and provides a stable single mode laser. Strontium, calcium or tin may be used in place of the europium. The buried laser and array are produced using a two-step molecular beam epitaxy method.
Inventors
- 👤 Zeev Feit
- 👤 Douglas Kostyk
- 👤 Robert J. Woods
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 02:33
CPC Classifications
H; H10; H10H; H10H20/00; H10H20/01; H10H20/011; H01; H01S; H01S5/00; H01S5/30; H01S5/32; H01S5/3222; H01S5/20; H01S5/22; H01S5/227; H01S5/2275; H01S5/40; H01S5/4025; H01S5/4031; Y; Y10; Y10S; Y10S148/00; Y10S148/063; Y10S148/095
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
128 words
The method of producing a buried heterojunction semiconductor laser diode comprising: placing an element comprising a monocrystalline semiconductor substrate into a molecular beam epitaxy chamber; depositing a first cladding and an active layer monocrystalline lead salt on said substrate by means of a molecular beam epitaxy process; removing said element with said first cladding and active layer from said epitaxy process; etching away a portion of said active layer from said substrate to create an etched surface thereon having a least one active region suitable for use as a waveguide; treating said etched surface with a surface preparation solution; replacing said element into said molecular beam epitaxy chamber; depositing a second cladding layer onto said element; and placing ohmic contacts on the top and bottom of said element.
Claim 2
Independent Claim
128 words
The method of producing a buried heterojunction semiconductor laser diode comprising: placing an element comprising a monocrystalline semiconductor substrate into a molecular beam epitaxy chamber; depositing a first cladding and an active layer monocrystalline lead salt on said substrate by means of a molecular beam epitaxy process; removing said element with said first cladding and active layer from said epitaxy process; etching away a portion of said active layer from said substrate to create an etched surface thereon having a least one active region suitable for use as a waveguide; treating said etched surface with a surface preparation solution; replacing said element into said molecular beam epitaxy chamber; depositing a second cladding layer onto said element; and placing ohmic contacts on the top and bottom of said element.
Claim 3
Dependent Claim
63 words
The method of claim 1, wherein said first and second cladding layers comprise semiconductive monocrystalline lead salt layers of mutually opposite conductivity type containing europium and selenium and having an energy band gap significantly higher than, an index of refraction significantly lower than, a crystal structure the same as, and a lattice constant substantially equal to said quantities in said active region layer.
Claim 4
Independent Claim
128 words
The method of producing a buried heterojunction semiconductor laser diode array comprising: placing an element comprising a monocrystalline semiconductor substrate into a molecular beam epitaxy chamber; depositing a first cladding and an active layer monocrystalline lead salt on said substrate by means of a molecular beam epitaxy process; removing said element with said first cladding and active layer from said epitaxy process; etching away a portion of said active layer from said substrate to create an etched surface thereon having a plurality of active regions suitable for use as waveguides; treating said etched surface with a surface preparation solution; replacing said element into said molecular beam epitaxy chamber; depositing a second cladding layer onto said element; and placing ohmic contacts on the top and bottom of said element.
Claim 5
Independent Claim
128 words
The method of producing a buried heterojunction semiconductor laser diode array comprising: placing an element comprising a monocrystalline semiconductor substrate into a molecular beam epitaxy chamber; depositing a first cladding and an active layer monocrystalline lead salt on said substrate by means of a molecular beam epitaxy process; removing said element with said first cladding and active layer from said epitaxy process; etching away a portion of said active layer from said substrate to create an etched surface thereon having a plurality of active regions suitable for use as waveguides; treating said etched surface with a surface preparation solution; replacing said element into said molecular beam epitaxy chamber; depositing a second cladding layer onto said element; and placing ohmic contacts on the top and bottom of said element.
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