US5026655A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process of fabricating a heterojunction field effect transistor
Assignee: NEC Corp
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Filing: 1989-09-21
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Granted: 1991-06-25
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Expires: 2009-09-21
Abstract
Abstract For improvement in a transit time of electrons, there is disclosed a heterojunction field effect transistor fabricated on a semi-insulating GaAs substrate, comprising a first layer overlying the semi-insulating substrate and formed of a high-purity GaAs, a second layer overlying the first layer and formed of an n-type AlGaAs which is smaller in electron affinity than the high-purity GaAs, a source region penetrating from the first layer into the second layer so as to be in contact with the active channel layer formed in the first layer and formed of an gallium-rich AlGaAs, a drain region, and a gate electrode formed on the second layer, an energy gap takes place between the source region and the first layer due to a lower edge of the conduction band thereof higher in energy level than that of the high-purity GaAs, thereby accelerating electrons supplied from the source region to the active channel layer.
Inventors
- 👤 Keiichi Ohata
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 01:40
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/01; H10D30/051; H10D30/40; H10D30/47; H10D30/471; H10D30/475; H10D30/4755; H10D62/00; H10D62/10; H10D62/13; H10D62/149; H10D62/80; H10D62/82; H10D62/824; Y; Y10; Y10S; Y10S148/00; Y10S148/029; Y10S148/072; Y10S148/169
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
196 words
A process of fabricating a heterojunction field effect transistor, comprising the steps of: a) preparing a semi-insulating substrate having a major surface; b) removing a portion of said semi-insulating substrate to form a side wall substantially perpendicular to said major surface; c) growing a first layer of a first compound semiconductor material on said semi-insulating substrate; d) growing a second layer of a second compound semiconductor material on said first layer, said second compound semiconductor material containing at least first and second elements the former of which is obliquely supplied to said second layer with respect to said major surface and the latter of which is perpendicularly supplied to the second layer with respect to the major surface, said second layer having a portion over said side wall different in composition than the remaining portion of said second layer; e) growing a third layer of a third compound semiconductor material on said second layer; f) removing a part of said third layer to expose a part of said second layer; g) forming electrodes, one of which is formed on the part of said second layer and the others of which are provided on said third layer.
Claim 2
Dependent Claim
196 words
A process of fabricating a heterojunction field effect transistor, comprising the steps of: a) preparing a semi-insulating substrate having a major surface; b) removing a portion of said semi-insulating substrate to form a side wall substantially perpendicular to said major surface; c) growing a first layer of a first compound semiconductor material on said semi-insulating substrate; d) growing a second layer of a second compound semiconductor material on said first layer, said second compound semiconductor material containing at least first and second elements the former of which is obliquely supplied to said second layer with respect to said major surface and the latter of which is perpendicularly supplied to the second layer with respect to the major surface, said second layer having a portion over said side wall different in composition than the remaining portion of said second layer; e) growing a third layer of a third compound semiconductor material on said second layer; f) removing a part of said third layer to expose a part of said second layer; g) forming electrodes, one of which is formed on the part of said second layer and the others of which are provided on said third layer.
Claim 3
Dependent Claim
25 words
A process of fabricating a heterojunction field effect transistor as set forth in claim 1, in which said semi-insulating substrate is formed of a gallium-arsenide.
Claim 4
Dependent Claim
27 words
A process of fabricating a heterojunction field effect transistor as set forth in claim 2, in which said first compound semiconductor material is of an undoped gallium-arsenide.
Claim 5
Dependent Claim
25 words
A process of fabricating a heterojunction field effect transistor as set forth in claim 3, in which said second semiconductor material is formed of aluminum-gallium-arsenides.
Claim 6
Dependent Claim
31 words
A process of fabricating a heterojunction field effect transistor as set forth in claim 4, in which said first, second and third layers are grown by using molecular beam epitaxy techniques.
Claim 7
Dependent Claim
31 words
A process of fabricating a heterojunction field effect transistor as set forth in claim 5, in which said first and second elements are formed by gallium atoms and aluminum atoms, respectively.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-06-24 | 1994-12-24 | 1995-06-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-06-24 | 1998-12-24 | 1999-06-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-06-24 | 2002-12-24 | 2003-06-25 | $7700.00 | Window Closed / Lapsed |